USE OF AN ORGANIC DIELECTRIC AS A SACRIFICIAL LAYER
    273.
    发明申请
    USE OF AN ORGANIC DIELECTRIC AS A SACRIFICIAL LAYER 审中-公开
    有机电介质作为一个有意义的层使用

    公开(公告)号:WO2004007349A1

    公开(公告)日:2004-01-22

    申请号:PCT/US2002/022251

    申请日:2002-07-11

    CPC classification number: B81C1/00476 B81C2201/0108

    Abstract: A method for using an organic dielectric as a sacrificial layer for forming suspended or otherwise spaced structures. The use of an organic dielectric has a number of advantages, including allowing use of an organic solvent or etch to remove the sacrificial layer. Organic solvents only remove organic materials, and thus do not affect or otherwise damage non-organic layers such as metal layers. This may reduce or eliminate the need for the rinsing and drying steps often associated with the use of acidic etchants such as Hydrofluoric Acid.

    Abstract translation: 一种使用有机电介质作为牺牲层的方法,用于形成悬浮或其它间隔结构。 有机电介质的使用具有许多优点,包括允许使用有机溶剂或蚀刻去除牺牲层。 有机溶剂仅除去有机物质,因此不会影响或以其他方式损坏金属层等非有机层。 这可以减少或消除与使用酸性蚀刻剂如氢氟酸常常相关的漂洗和干燥步骤的需要。

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