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    Methods and apparatuses for the automated production, collection, handling, and imaging of large numbers of serial tissue sections
    271.
    发明申请
    Methods and apparatuses for the automated production, collection, handling, and imaging of large numbers of serial tissue sections 有权
    用于自动化生产，收集，处理和成像大量连续组织切片的方法和装置

    公开(公告)号：US20060008790A1

    公开(公告)日：2006-01-12

    申请号：US10886799

    申请日：2004-07-08

    Applicant: Kenneth Hayworth ,  Amy Hayworth

    Inventor： Kenneth Hayworth ,  Amy Hayworth

    IPC: A01N1/00 ,  G01N33/48

    CPC classification number: G01N1/06 ,  G01N1/286 ,  G01N1/312 ,  G01N2001/066 ,  G01N2001/362 ,  H01J2237/201 ,  H01J2237/202 ,  H01J2237/26 ,  Y10T156/1052 ,  Y10T156/1056 ,  Y10T156/1057 ,  Y10T156/1059 ,  Y10T156/1062 ,  Y10T156/12 ,  Y10T156/1322 ,  Y10T156/1712

    Abstract: An automatic taping lathe-microtome that produces a continuous ribbon of tissue by lathing an extremely thin strip off the surface of a cylindrical block containing a multitude of embedded tissue samples. Mechanisms are included for sandwiching this fragile ribbon of tissue between a pair of support tapes. Viewing holes are cut in the support tapes above and below each tissue slice such that the tapes act as slot grids allowing for direct viewing of each tissue slice in a transmission electron microscope (TEM). The resulting tissue-tape is placed on a spooling mechanism and fed into the beam of a TEM much like the film in a movie projector. This allows for random-access imaging of any section on the tape without requiring the TEM's vacuum be broken. This system is intended to give neuroscientists a tool to ultrastructure image large volumes of neural tissue and to trace multi-scale synaptic circuits.

    Abstract translation: 一种自动贴片车床切片机，通过从包含大量嵌入的组织样本的圆柱形块体的表面上铺下极薄的条带，产生连续的组织带。 包括将这种脆弱的组织带夹在一对支撑带之间的机制。 在每个组织切片上方和下方的支撑带上切割观察孔，使得带作为狭槽网格，允许在透射电子显微镜（TEM）中直接观察每个组织切片。 所得到的纸巾带放置在卷绕机构上，并与电影放映机中的胶片一样进给到TEM的束中。 这允许对磁带上任何部分进行随机访问成像，而不需要断开TEM的真空。 该系统旨在给予神经科学家超微结构图像大量的神经组织和跟踪多尺度突触电路的工具。

    プラズマ処理装置及びプラズマ処理方法
    274.
    发明专利
    プラズマ処理装置及びプラズマ処理方法 有权
    等离子体处理装置和等离子体处理方法

    公开(公告)号：JPWO2013014860A1

    公开(公告)日：2015-02-23

    申请号：JP2013525555

    申请日：2012-06-29

    Applicant: パナソニック株式会社

    Inventor： 尚吾 置田 ,  尚吾 置田 ,  渡邉　彰三 ,  彰三 渡邉

    IPC: H01L21/683 ,  H01L21/3065 ,  H01L21/673 ,  H01L31/04

    CPC classification number: H01L31/18 ,  H01J37/32715 ,  H01J37/32724 ,  H01J2237/201 ,  H01L21/67069 ,  H01L21/68764 ,  H01L21/68785

    Abstract: ドライエッチング装置1は基板5を搬送するトレイ3を備える。トレイ3には3枚の基板5を収容可能な貫通孔である基板収容孔4A〜4Cが設けられている。基板5は基板収容孔4A〜4Cの孔壁から突出する基板支持部11により支持される。プラズマを発生させるチャンバ2内にはステージ21が設けられている。ステージ21はトレイ3の下面から基板収容孔4A〜4Cに挿入され、かつその上端面である基板載置面28に基板支持部11から受け渡された基板の5下面が載置される基板載置部27A〜27Cを備える。角型基板に対する高い形状制御性と良好な生産性の両方を、装置の大型化を抑制しつつ実現できる。

    Abstract translation: 干式蚀刻装置1中设置有用于输送基板5的托盘3。 基板收纳孔4A〜4C中的托盘3能够容纳设置三个5所述基板的通孔中。 基板5由基板支撑部11从基板收容孔4A-4C的孔壁突出支撑。 台21在腔室2，用于产生等离子体提供。 台21从基板收容孔4A-4C在托盘3的下侧插入，并且所述基板的所述安装架5的下表面被放置在从基板的基板载置面28上支撑单元11，其是其上端表面转印的基板 它设置有一个部27A〜27C。 兼具高的形状控制性和方形基板良好的生产率，能够在抑制装置的大型化而实现。

    Substrate processing apparatus
    278.
    发明专利
    Substrate processing apparatus 有权
    基板加工设备

    公开(公告)号：JP2012015286A

    公开(公告)日：2012-01-19

    申请号：JP2010149656

    申请日：2010-06-30

    Applicant: Tokyo Electron Ltd ,  東京エレクトロン株式会社

    Inventor： ODAGIRI MASAYA ,  MURAKI YUSUKE ,  FUJIWARA HITOSHI

    IPC: H01L21/3065 ,  C23C14/50 ,  H01L21/304

    CPC classification number: H01L21/67248 ,  C23C16/4586 ,  C23C16/463 ,  H01J37/20 ,  H01J37/32724 ,  H01J37/32779 ,  H01J2237/2001 ,  H01J2237/201 ,  H01L21/68771

    Abstract: PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of precisely performing temperature management and temperature control of the peripheral part and the central part of a substrate independently and simplifying a piping structure.SOLUTION: A substrate processing apparatus for processing substrates in a vacuum processing space includes a substrate mounting table for mounting at least two substrates thereon. The substrate mounting table includes substrate mounting units whose number corresponds to the number of the substrates mounted on the substrate mounting table. Each of the substrate mounting units includes a central temperature control flow path for cooling a central portion of the substrates to be mounted and a peripheral temperature control flow path for cooling a peripheral portion of the substrates, and the central temperature control flow path and the peripheral temperature control flow path are formed independently of each other. The substrate mounting table includes one temperature control medium inlet port for introducing a temperature control medium into the peripheral temperature control flow path, and temperature control medium outlet ports for discharging the temperature control medium from the peripheral temperature control flow path. The number of the temperature control medium outlet ports corresponds to the number of substrates to be mounted.

    Abstract translation: 要解决的问题：提供能够独立地精确地进行基板的周边部分和中心部分的温度管理和温度控制的基板处理装置，并且简化管道结构。 解决方案：用于在真空处理空间中处理基板的基板处理装置包括用于在其上安装至少两个基板的基板安装台。 基板安装台包括基板安装单元，其数量对应于安装在基板安装台上的基板的数量。 每个基板安装单元包括用于冷却要安装的基板的中心部分的中央温度控制流动路径和用于冷却基板的周边部分的周边温度控制流动路径，以及中央温度控制流路和周边 温度控制流路彼此独立地形成。 基板安装台包括一个用于将温度控制介质引入外围温度控制流路的温度控制介质入口和用于从温度控制流路径排出温度控制介质的温度控制介质出口。 温度控制介质出口的数量对应于要安装的基板的数量。 版权所有（C）2012，JPO＆INPIT

    Electron beam observation device using pre-specimen magnetic field as image-forming lens and specimen observation method
    280.
    发明专利
    Electron beam observation device using pre-specimen magnetic field as image-forming lens and specimen observation method 有权
    使用预制磁场作为图像形成透镜和样本观察方法的电子束观测装置

    公开(公告)号：JP2009193833A

    公开(公告)日：2009-08-27

    申请号：JP2008033945

    申请日：2008-02-15

    Applicant: Hitachi Ltd ,  株式会社日立製作所

    Inventor： KASAI HIROTO ,  HARADA KEN

    IPC: H01J37/26 ,  H01J37/20

    CPC classification number: H01J37/26 ,  H01J37/141 ,  H01J37/20 ,  H01J2237/14 ,  H01J2237/20 ,  H01J2237/201 ,  H01J2237/2802

    Abstract: PROBLEM TO BE SOLVED: To solve a problem that, since an objective lens having the most important role in electromagnetic lenses used for an electron microscope achieves a short focal length by a large exciting current to perform high spatial resolution, on the other hand, in case if it is used for dimension instrumentation, reproducibility of image forming condition is insufficient due to magnetic hysteresis, as well as observation in a low magnification of about 200 to 2,000 times is difficult, and also, since the specimen is disposed in a magnetic field generated in the objective lens, the specimen is observed in a state of being always immersed in a magnetic field. SOLUTION: The electron beam observation device includes a mechanism which disposes a specimen at an upstream side in an electron beam traveling direction outside an objective lens, from which an image is transferred under a magnification of 1/5 to 1/30, in addition to an inside of the objective lens in which a specimen is disposed at a time of ordinary observation. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题为了解决由于在电子显微镜中使用的电磁透镜中具有最重要作用的物镜通过大的激励电流实现短焦距以执行高空间分辨率的问题，另一方面 手，如果用于尺寸仪器，则由于磁滞而导致图像形成条件的再现性不足，并且难以在约200至2,000倍的低倍率下观察，并且由于将样品置于 在物镜中产生的磁场，在始终浸没在磁场中的状态下观察样本。 解决方案：电子束观察装置包括将物镜放置在物镜外侧的电子束行进方向上游侧的试样，以1/5〜1/30的倍率进行图像转印的机构， 除了在普通观察时在其中放置样本的物镜的内部。 版权所有（C）2009，JPO＆INPIT

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