公开(公告)号：WO2019219737A1

公开(公告)日：2019-11-21

申请号：PCT/EP2019/062453

申请日：2019-05-15

Applicant: XENOCS SAS

Inventor： HØGHØJ, Peter ,  LANTZ, Blandine ,  JOENSEN, Karsten ,  NIELSEN, Søren

IPC: G01N23/201

Abstract: The invention relates to a method for X-Ray Scattering material analysis, in particular Small Angle X-ray Scattering material analysis, comprising: - generating and directing an incident X-ray beam along a propagation direction (X) to a sample held in a sample environment; - executing a sample measurement process comprising the following steps: o determining a distribution of X rays scattered from said sample by means of a area detector (10) arranged downstream of said sample environment; and o determining an intensity (It) of a beam of X rays transmitted through said sample by means of said detector (10); - executing a sample data treatment process comprising the following step: o determining a corrected scattered X-ray distribution by applying to said scattered X-ray distribution a correction which depends on said transmitted intensity; and - executing a data analysis process comprising the following step: o determining at least one structural characteristic of said sample on the basis of said corrected scattered X-ray distribution; characterized in that - acquisition of said scattered and said transmitted X-rays is divided into a plurality of acquisition periods, wherein each acquisition period (T acq ) is shorter than or equal to a previously determined maximum acquisition time (T max ) in such a way that said detector (10) operates in a linear range; - said detector (10) measures individual detector image frames containing signals of said scattered and said transmitted X-rays, wherein each individual detector image frame is measured during one among said plurality of acquisition periods; - said individual detector image frames are added up to a total detector image frame in a computer connected to said detector (10); and - said determination of said at least one structural characteristic of said sample is realized based on an absolute scattered X-ray distribution obtained on the basis of said total detector image frame. The invention furthermore relates to an apparatus adapted to cany out such a method.

公开(公告)号：WO2010004122A3

公开(公告)日：2010-03-04

申请号：PCT/FR2009000794

申请日：2009-06-26

Applicant: XENOCS SA ,  HOGHOJ PETER

Inventor： HOGHOJ PETER

IPC: G01N23/20 ,  G01N23/223

CPC classification number: G01N23/2076

Abstract: The invention relates to an energy-dispersive X-ray reflectometry system for analyzing a specimen, comprising: a source (1) for emitting an X-ray beam, said source (1) being coupled to an optical collection device (2) comprising means for focusing the beam emitted by the source (1) with a spot size measured in two directions of less than 100 µm and at a given angle of incidence to the specimen; a detection device (3) for measuring the intensity of the X-ray beam reflected by the specimen as a function of the energy of the X-rays over a predetermined measurement energy range, characterized in that the source (1) includes means for emitting an X-ray beam with a polychromatic spectrum of energies below 3 keV and in that the optical collection device (2) is placed relative to the specimen so as to focus the beam at a fixed angle of incidence in order for the projection of the spot on the specimen to have an elongation factor of less than 10.

Abstract translation: 本发明涉及用于分析样本的能量色散X射线反射测量系统，包括：用于发射X射线束的源（1），所述源（1）耦合到光学收集装置（2） 用于将由源（1）发射的光束聚焦成在小于100μm的两个方向上测量的光斑尺寸并且以给定的入射角对样本进行测量; 检测装置（3），用于根据在预定测量能量范围内的X射线的能量来测量由样本反射的X射线束的强度，其特征在于，源（1）包括用于发射 具有低于3keV能量的多色谱的X射线束，并且所述光学收集装置（2）相对于所述样本放置，以便以固定入射角聚焦所述束以便投射所述点 在样品上具有小于10的延伸系数。

公开(公告)号：WO2008012419A3

公开(公告)日：2008-01-31

申请号：PCT/FR2007/001252

申请日：2007-07-20

Applicant: XENOCS ,  BOULEE, Pascal ,  CENDA, Dan Mihai ,  HOGHOJ, Peter

Inventor： BOULEE, Pascal ,  CENDA, Dan Mihai ,  HOGHOJ, Peter

IPC: G21K1/04 ,  H05G1/02 ,  G01N23/223

Abstract: L'invention concerne un système (1) de délivrance de faisceau de rayons X comprenant un bloc source (100) émettant un faisceau source de rayons X, des moyens de conditionnement (500) permettant de conditionner le faisceau source en direction d'un échantillon. Le système (1) comporte des moyens de stabilisation (800) agencés de manière à stabiliser thermiquement une zone du système (1) située en aval du bloc source (100), pour limiter des transferts thermiques vers les moyens de conditionnement en vue de prévenir des perturbations thermiques au niveau des moyens de conditionnement (500).

公开(公告)号：WO2006040613A1

公开(公告)日：2006-04-20

申请号：PCT/IB2004/003574

申请日：2004-10-13

Applicant: XENOCS ,  HOGHOJ, Peter ,  PARASKEVI, Dova ,  MONTCALM, Claude ,  RODRIGUES, Sergio

Inventor： HOGHOJ, Peter ,  PARASKEVI, Dova ,  MONTCALM, Claude ,  RODRIGUES, Sergio

IPC: C23C14/46

CPC classification number: C23C14/46 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/68

Abstract: The invention relates to a dual Ion Beam Sputtering method for depositing onto a substrate (S) material generated by the sputtering of a target (121-123) by a sputtering ion beam (110), said method comprising the operation of an assistance ion beam (130) directed onto said substrate in order to assist the deposition of material, said method being characterized in that during the operation of said assistance beam said sputtering beam is also operated in association with said assistance beam, and during said operation of the sputtering beam in association with the assistance beam the sputtering beam crosses a desired part of the assistance beam in order to transport contaminants associated to said desired part of the assistance beam away from said substrate.

Abstract translation: 本发明涉及一种用于沉积到通过溅射离子束（110）溅射靶（121-123）而产生的衬底（S）上的双离子束溅射方法，所述方法包括辅助离子束 （130），以便辅助沉积材料，所述方法的特征在于，在所述辅助束的操作期间，所述溅射束还与所述辅助光束相关联地操作，并且在溅射束的所述操作期间 与辅助束相关联，溅射束与辅助光束的期望部分交叉，以便将与所述辅助光束的所需部分相关联的污染物输送离开所述衬底。

公开(公告)号：WO2010004122A2

公开(公告)日：2010-01-14

申请号：PCT/FR2009/000794

申请日：2009-06-26

Applicant: XENOCS SA ,  HOGHOJ, Peter

Inventor： HOGHOJ, Peter

IPC: G01N23/20 ,  G01N23/223

CPC classification number: G01N23/2076

Abstract: L'invention concerne un système de réflectométrie rayons X dispersif en énergie pour analyser un échantillon, comprenant : une source (1) pour émettre un faisceau de rayons X, ladite source (1) étant couplée à un dispositif optique de collection (2) comprenant des moyens pour focaliser le faisceau émis par la source (1) avec une taille de spot inférieure à 100 μm dans les deux dimensions et selon un angle d'incidence donné par rapport à l'échantillon, un dispositif de détection (3) permettant de mesurer l'intensité du faisceau de rayons X réfléchi par l'échantillon en fonction de l'énergie des rayons X sur une plage d'énergie de mesure prédéfinie, caractérisé en ce que la source (1 ) comprend des moyens pour émettre un faisceau de rayons X selon un spectre polychromatique d'énergies inférieures à 3 keV, et en ce le dispositif optique de collection (2) est agencé par rapport à l'échantillon pour focaliser le faisceau selon un angle d'incidence fixé pour que la projection du spot sur l'échantillon ait un facteur d'élongation inférieur à 10.

Abstract translation: 本发明涉及一种用于分析样本的能量色散X射线反射测量系统，包括：用于发射X射线束的源（1），所述源（1）耦合到光学收集装置（2），包括装置 用于将源（1）发射的光束以在小于100μm的两个方向上测量的光斑尺寸以给定的入射角聚焦到样品; 检测装置（3），用于根据所述X射线在预定测量能量范围内的能量来测量由所述样本反射的X射线束的强度，其特征在于，所述源（1）包括用于发射的装置 具有低于3keV的能量的多色光谱的X射线束，并且相对于样本放置光学收集装置（2），以便以固定的入射角将光束聚焦以便点的投影 在样品上具有小于10的伸长率。

公开(公告)号：WO2009083605A1

公开(公告)日：2009-07-09

申请号：PCT/EP2009/050001

申请日：2009-01-02

Applicant: XENOCS S.A. ,  LANTZ, Blandine ,  HOGHOJ, Peter

Inventor： LANTZ, Blandine ,  HOGHOJ, Peter

IPC: G01N23/20

CPC classification number: G01N23/20008 ,  G21K2201/062

Abstract: The invention refers to an X-ray beam device for X-ray anaiytical applications, comprising an X-ray source designed such as to emit a divergent beam of X-rays; and an optical assembly designed such as to focus said beam onto a focal spot, wherein said optical assembly comprises a first reflecting optical element, a monochromator device and a second reflecting optical element sequentially arranged between said source and said focal spot, wherein said first optical element is designed such as to collimate said beam in two dimensions towards said monochromator device, and wherein said second optical element is designed such as to focus the beam coming from said monochromator device in two dimensions onto said focal spot.

Abstract translation: 本发明涉及一种用于X射线分析应用的X射线束装置，包括设计成发射X射线发散束的X射线源; 以及设计成将所述光束聚焦到焦斑上的光学组件，其中所述光学组件包括顺序地布置在所述光源和所述焦点之间的第一反射光学元件，单色仪器件和第二反射光学元件，其中所述第一光学 元件被设计成使得所述光束在二维朝向所述单色仪装置准直，并且其中所述第二光学元件被设计成将来自所述单色仪装置的光束二维聚焦在所述焦斑上。

公开(公告)号：WO2008012419A2

公开(公告)日：2008-01-31

申请号：PCT/FR2007001252

申请日：2007-07-20

Applicant: XENOCS ,  BOULEE PASCAL ,  CENDA DAN MIHAI ,  HOGHOJ PETER

Inventor： BOULEE PASCAL ,  CENDA DAN MIHAI ,  HOGHOJ PETER

CPC classification number: H05G1/02 ,  G21K1/04

Abstract: The invention relates to a system (1) for delivering an X-ray beam, comprising a source block (100) that emits a source X-ray beam and conditioning means (500) for conditioning the source beam sent towards a specimen. The system (1) includes stabilization means (800) designed to thermally stabilize a region of the system (1) lying downstream of the source block (100), in order to limit heat transfer towards the conditioning means for the purpose of preventing thermal perturbations in the conditioning means (500).

Abstract translation: 本发明涉及一种用于传送X射线束的系统（1），其包括发射源X射线束的源块（100）和用于调节朝向样本发送的源束的调节装置（500）。 系统（1）包括稳定装置（800），其被设计成热稳定位于源块（100）下游的系统（1）的区域，以限制向调节装置传热，以防止热扰动 在调节装置（500）中。

公开(公告)号：WO2004001769A1

公开(公告)日：2003-12-31

申请号：PCT/FR2003/001879

申请日：2003-06-19

Applicant: XENOCS ,  HOGHOJ, Peter ,  DARIEL, Aurélien ,  RODRIGUES, Sergio

Inventor： HOGHOJ, Peter ,  DARIEL, Aurélien ,  RODRIGUES, Sergio

IPC: G21K1/06

CPC classification number: B82Y10/00 ,  G21K1/06 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064

Abstract: L'invention concerne un dispositif optique destiné à traiter un faisceau incident de rayons X, ledit dispositif comprenant : un monochromateur et un élément optique de conditionnement du faisceau incident dont la surface réfléchissante est apte à produire un effet optique bidimensionnel pour adapter un faisceau à destination du monochromateur, ledit élément optique comprenant une surface réfléchissante aux rayons X de type structure multicouche,caractérisé par le fait que ladite surface réfléchissante est constituée d'une surface unique, ladite surface réfléchissante étant conformée selon deux courbures correspondant à deux directions différentes.

Abstract translation: 本发明涉及一种旨在处理入射的X射线束的光学装置。 本发明的装置包括：单色仪; 以及具有能够产生二维光学效果的反射面的光入射光束调节元件，以适应朝向单色仪的光束，上述光学元件包括多层的X射线反射表面。 本发明的特征在于，反射表面包括单个表面，所述反射表面在两个不同的方向上弯曲。

公开(公告)号：WO2002097486A3

公开(公告)日：2002-12-05

申请号：PCT/FR2002/001831

申请日：2002-05-31

Applicant: XENOCS ,  HOGHOJ, Peter

Inventor： HOGHOJ, Peter

IPC: G21K1/06

Abstract: L'invention concerne selon un premier aspect un ensemble optique réflectif multicouche destiné à réfléchir des rayons X sous faible angle d'incidence en produisant un effet optique bidimensionnel, l'ensemble optique comportant: . un composant présentant une surface réféchissante conformée de manière à produire un premier effet optique selon une première direction de l'espace, . ansi que des moyens permettant de produire un deuxième effet optique selon une deuxième direction de l'espace, différente de la première direction, caractérisé en ce que lesdits moyens permettant de produire un deuxième effet optique sont portés par ladite surface réfléchissante. L'invention propose selon un second aspect un procédé de fabrication d'un tel ensemble optique.

公开(公告)号：US11835474B2

公开(公告)日：2023-12-05

申请号：US17783183

申请日：2020-12-29

Applicant: XENOCS SAS

Inventor： Karsten Joensen ,  Peter Hoghoj ,  Ronan Mahe

IPC: G01N23/201 ,  G01N23/041 ,  G01N23/207

CPC classification number: G01N23/041 ,  G01N23/201 ,  G01N23/207 ,  G01N2223/054 ,  G21K2201/067

Abstract: An X-ray scattering apparatus having a sample holder for aligning and/or orienting a sample to be analyzed by X-ray scattering, a first X-ray beam delivery system having a first X-ray source, and a first monochromator being arranged upstream of the sample holder for generating and directing a first X-ray beam along a beam path in a propagation direction towards the sample holder is disclosed. A distal X-ray detector arranged downstream of the sample holder and being movable, in particular in a motorized way, along the propagation direction as to detect the first X-ray beam and X-rays scattered at different scattering angles from the sample as the first X-ray beam delivery system is configured to focus the first X-ray beam onto a focal spot on or near the distal X-ray detector when placed at its largest distance from the sample holder is also disclosed.