Abstract:
반도체 기판, 이를 이용한 발광소자 및 그 제조방법이 개시된다. 개시된 반도체 기판은 기판; 상기 기판 상에 형성된 것으로, 상기 기판 표면을 노출하는 다수의 결함을 가지는 데미지 그래핀층(damaged graphene layer); 상기 데미지 그래핀층 상에 형성된 반도체 박막층;을 포함한다.
Abstract:
PURPOSE: A method for manufacturing a protection layer for a semiconductor quantum dot using graphene is provided to prevent the deformation of the semiconductor quantum dot by preventing the semiconductor quantum dot from being directly exposed to the atmosphere. CONSTITUTION: A plurality of semiconductor quantum dots(20) are dispersed in a first dispersed solution. Graphene(21) is dispersed in a second dispersed solution. A mixture is made by mixing the first dispersed solution with the second dispersed solution in one container. The graphene is attached to the surface of the semiconductor quantum dot in the mixture to form a protection layer for the semiconductor quantum dot.
Abstract:
PURPOSE: A light emitting device which improves a luminous property by using surface plasmon resonance is provided to improve a heat radiation property by arranging a graphene layer with high intensity. CONSTITUTION: An active layer(300) is formed on a first conductive semiconductor layer. A second conductive semiconductor layer is formed on the active layer. A plurality of graphene layers(G) are formed on the second conductive semiconductor layer. The graphene layer transmits light from the active layer. A metal particle layer(M) arranges a plurality of metal particles between the graphene layers.
Abstract:
PURPOSE: A semiconductor substrate, a light emitting device using the same, and a manufacturing method thereof are provided to reduce stress between a substrate and a semiconductor thin film by using the flexibility and the thermal expansion coefficient of graphene between the substrate and the semiconductor thin film. CONSTITUTION: A damage graphene layer(130) is formed on a substrate(110) and is made of graphene with a plurality of damages to expose the substrate. A semiconductor thin film layer(140) is formed on the damage graphene layer. The semiconductor thin film layer includes GaN and is doped with preset impurities to have conductivity.
Abstract:
PURPOSE: A quantum dot light emitting device and a manufacturing method thereof are provided to improve the luminous efficiency of a light emitting device by accumulating electrons and holes in a buffer layer with boron nitride. CONSTITUTION: An n-type graphene layer(110) includes at least one graphene sheet. A p-type graphene layer(150) is separated from the n-type graphene layer. A buffer layer(130) is formed between the n-type graphene layer and the p-type graphene layer. The buffer layer includes boron nitride. A quantum dot layer is formed between the n-type graphene layer and the p-type graphene layer and includes an n-type quantum layer(120) and a p-type quantum layer(140). An n-type electrode pad(115) and a p-type electrode pad are formed on the n-type graphene layer and the p-type graphene layer respectively.
Abstract:
PURPOSE: A graphene quantum dot light emitting and a manufacturing method thereof are provided to form a band gap of a graphene quantum dot layer small by controlling size and shape of a graphene quantum dot. CONSTITUTION: First graphene(20) is n-type graphene. Second graphene(40) is p-type graphene. A graphene quantum dot layer(30) is located on the first graphene. The graphene quantum dot layer comprises a plurality of graphene quantum dots. The graphene quantum dot layer contain organic solvents. The second grapheme is located on the graphene quantum dot layer. An electron transport layer is located between the n-type grapheme and the graphene quantum dot layer. A hole transport layer is located between the graphene quantum dot layer and the p-type graphene.
Abstract:
Disclosed is a semiconductor light emitting device including a contact layer to form reflective electrodes. The semiconductor light emitting device forms a region including an Al element in the contact layer. Therefore the semiconductor light emitting device may improve light extraction efficiency of the light emitted from an active layer and facilitate the formation of the reflective electrode.
Abstract:
개시된 양자점 발광 소자는 n형 그래핀층, p형 그래핀층, n형 및 p형 그래핀층 사이에 마련된 보론 나이트라이드(boron nitride, BN)를 포함하는 버퍼층 및 n형 및 p형 그래핀층 사이에 마련된 양자점층을 포함할 수 있다. 그리고, 개시된 양자점 발광 소자의 제조 방법은 n형 그래핀층을 형성하는 단계, n형 그래핀층 상에 보론 나이트라이드(boron nitride, BN)를 포함하는 버퍼층을 형성하는 단계와 n형 그래핀층 상에 양자점층을 형성하는 단계 및 버퍼층과 양자점층 상에 p형 그래핀층을 형성하는 단계를 포함할 수 있다.
Abstract:
PURPOSE: A light emitting diode for emitting ultraviolet is provided to reduce constant resistance and maximize ultraviolet transmittance by forming a p-type graphene layer on the upper part of a p-type semiconductor layer. CONSTITUTION: An active layer (400) is formed on the upper part of an n-type semiconductor layer (300). A p-type semiconductor layer (500) consisting of a p-type AlGaN is formed on the upper part of the active layer. A p-type graphene layer (600) is formed on the upper part of the p-type semiconductor layer. The p-type graphene layer consists of graphene doped with a p-type dopant. The p-type graphene layer lowers constant resistance and maximizes ultraviolet transmittance.