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公开(公告)号:KR1020160042570A
公开(公告)日:2016-04-20
申请号:KR1020140136652
申请日:2014-10-10
Applicant: 삼성전자주식회사
IPC: H01L21/203 , H05H1/46 , H01L21/8247
CPC classification number: C23C14/541 , C23C14/0623 , C23C14/50 , C23C14/542 , C23C14/548 , H01J37/32522 , H01J37/32623 , H01J37/32724 , H01J37/34
Abstract: 물리기상증착장치및 이를이용한박막형성방법에있어서, 증착대상기판을로딩하는로딩챔버와상기판상에상변화물질을증착하는증착챔버를구비하는공정챔버, 증착챔버의상부에배치되고플라즈마상태의공정가스와반응하여상변화물질의이온입자를공급하는타겟, 증착챔버의내부로공급된공정가스를플라즈마상태로여기하는플라즈마발생부, 타겟에대응하여증착챔버의하부에배치되고상면에기판을고정하며, 기판을가열하는히터및 상변화물질의이온입자를기판으로유도하는적어도하나의전극을구비하는기판지지부, 및공정챔버의내부에배치되어기판의주변부로복사열을공급하는보조열원(supplementary heat source)을포함한다. 기판의주변부와중심부에서균일한조성과두께를갖는물질막을증착할수 있다.
Abstract translation: 提供了一种物理气相沉积设备和使用该物理气相沉积设备的相变材料的沉积方法。 物理气相沉积包括处理室,该处理室包括用于加载要沉积的基底的加载室和沉积室,以将相变材料沉积在基底上; 设置在所述沉积室的上部并与等离子体状态的处理气体反应以提供所述相变材料的离子颗粒的靶; 等离子体发生器,用于在处理气体处于等离子体状态时激发供应到沉积室中的工艺气体; 设置在与靶对应的沉积室的下部的衬底支撑件,将衬底固定到其顶表面上,并且包括加热器以加热衬底和至少一个电极以诱导相变材料的离子颗粒 到基材; 以及设置在处理室中的辅助热源,并将辐射热传递到基板的周边区域。 具有均匀组成和厚度的材料层可以沉积在基板的外围区域和中心区域中。
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公开(公告)号:KR1020140052729A
公开(公告)日:2014-05-07
申请号:KR1020120119206
申请日:2012-10-25
Applicant: 삼성전자주식회사
IPC: H01L27/108 , H01L21/8242
CPC classification number: H01L29/0649 , H01L21/76831 , H01L21/76897 , H01L27/10855 , H01L27/10876 , H01L27/10888 , H01L29/4236
Abstract: The present invention relates to a semiconductor device having a recessed active region and a method for manufacturing the same, wherein the semiconductor device comprises: a substrate including a device isolating film which defines a first junction region and a second junction region; a word line embedded in the substrate; a bit line intersecting with the word line on the substrate; a first electrical connection part which is disposed between the substrate and the bit line and is electrically connected with the first junction region; and a second electrical connection part which is disposed on a side of the bit line and is electrically connected with the second junction region. The substrate includes a contact hole in which the first junction region and the device isolation film are recessed to be defined and the first electrical connection part is placed. The upper surface of the first junction region is recessed to below of the bottom surface of the contact hole.
Abstract translation: 本发明涉及具有凹陷有源区的半导体器件及其制造方法,其中半导体器件包括:衬底,其包括限定第一接合区域和第二接合区域的器件隔离膜; 嵌入基板中的字线; 与基板上的字线相交的位线; 第一电连接部,其设置在所述基板和所述位线之间并且与所述第一接合区域电连接; 以及第二电连接部,其设置在所述位线的一侧并与所述第二接合区电连接。 基板包括接触孔,第一接合区域和器件隔离膜凹入以限定第一电连接部件和第一电连接部件。 第一接合区域的上表面凹入到接触孔的底表面的下方。
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公开(公告)号:KR1020130007759A
公开(公告)日:2013-01-21
申请号:KR1020110068279
申请日:2011-07-11
Applicant: 삼성전자주식회사
IPC: H01L21/8247 , H01L27/115
CPC classification number: H01L45/06 , H01L45/141 , H01L45/1683 , H01L45/1233
Abstract: PURPOSE: A method for manufacturing a phase change memory device is provided to prevent the generation of an oxide film by performing a reflow process. CONSTITUTION: An opening(115) is formed in an interlayer insulating film(110). The opening is buried to form a phase change material layer. A plasma process is performed on the phase change material layer. And then, an oxide film is removed on the surface of the change material layer. A thermal process is performed on the phase change material layer.
Abstract translation: 目的:提供一种用于制造相变存储器件的方法,以通过进行回流处理来防止产生氧化膜。 构成:在层间绝缘膜(110)中形成开口(115)。 将开口埋入以形成相变材料层。 对相变材料层进行等离子体处理。 然后,在改变材料层的表面上除去氧化膜。 在相变材料层上进行热处理。
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公开(公告)号:KR1020120017547A
公开(公告)日:2012-02-29
申请号:KR1020100080201
申请日:2010-08-19
Applicant: 삼성전자주식회사
IPC: H01L21/027
CPC classification number: H01L21/31144 , H01L21/0337 , H01L21/0338 , H01L21/3086 , H01L21/3088 , H01L21/76816 , H01L21/0274
Abstract: PURPOSE: A method for forming a line pattern structure is provided to reduce the fault of a semiconductor device and to reduce process steps which are required for line pattern structure formation. CONSTITUTION: A line pattern structure comprises a first line pattern(114a) and two second line patterns(114b). A first line pattern has a line shape including a cut site. The second line pattern comprises an extension line and a protrusion pattern. The extension line is adjoining with the first line pattern which is located in the outermost side and is parallel to the first line pattern. The protrusion pattern is projected from the extension line in order to face to the first line pattern.
Abstract translation: 目的:提供一种用于形成线图案结构的方法,以减少半导体器件的故障并减少线图案结构形成所需的工艺步骤。 构成:线图案结构包括第一线图案(114a)和两个第二线图案(114b)。 第一线图形具有切割部位的线状。 第二线图案包括延伸线和突起图案。 延伸线与第一线图案相邻,该第一线图案位于最外侧并且平行于第一线图案。 突起图案从延伸线突出以面对第一线图案。
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公开(公告)号:KR1020120008641A
公开(公告)日:2012-02-01
申请号:KR1020100069501
申请日:2010-07-19
Applicant: 삼성전자주식회사
CPC classification number: H05B37/0272 , H05B37/0218 , H05B37/0227 , Y02B20/44 , Y02B20/46 , H05B37/0245 , H04L12/12 , H04L12/28
Abstract: PURPOSE: A wireless sensing module, a wireless lighting controller, and a wireless lighting system are provided to automatically perform preset control by the location of a monitoring target and lighting intensity. CONSTITUTION: A motion sensor(110) senses a motion. An illumination sensor detects illumination. A first wireless communication unit(130) generates wireless signal. The first wireless communication unit transmits the wireless signal. The wireless signal comprises a motion sensing signal of the motion sensor and the illumination sensing signal of the illumination sensor.
Abstract translation: 目的:提供无线传感模块,无线照明控制器和无线照明系统,通过监控目标的位置和照明强度自动执行预设控制。 构成:运动传感器(110)感测运动。 照明传感器检测照明。 第一无线通信单元(130)产生无线信号。 第一无线通信单元发送无线信号。 无线信号包括运动传感器的运动感测信号和照明传感器的照明感测信号。
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公开(公告)号:KR1020110124747A
公开(公告)日:2011-11-17
申请号:KR1020110114328
申请日:2011-11-04
Applicant: 삼성전자주식회사
IPC: H05B37/02
CPC classification number: H05B37/0272 , F21S8/04 , F21V23/004 , F21Y2101/00
Abstract: PURPOSE: A wireless lighting controller and a method thereof are provided to control a lamp in wireless through a Zigbee communication. CONSTITUTION: In a wireless lighting controller and a method thereof, at least one illumination module(110) has network information and radiates light. A control module(120) receives network information and forms a wireless network to control the operation of the illumination module.
Abstract translation: 目的:提供无线照明控制器及其方法,以通过Zigbee通信无线控制灯。 构成:在无线照明控制器及其方法中,至少一个照明模块(110)具有网络信息并辐射光。 控制模块(120)接收网络信息并形成无线网络以控制照明模块的操作。
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公开(公告)号:KR1020110096412A
公开(公告)日:2011-08-30
申请号:KR1020100015841
申请日:2010-02-22
Applicant: 삼성전자주식회사
IPC: H01L21/8247 , H01L27/115
CPC classification number: H01L27/11529 , H01L27/11526 , H01L27/11573 , H01L28/20 , H01L21/02362 , H01L21/31051
Abstract: 반도체 소자 및 그 제조 방법이 제공된다. 이 방법에 따르면, 기판 상에 패턴을 형성하고, 패턴 상에 캡핑 유전막을 형성하고, 상기 캡핑 유전막에 질소를 공급하는 질화 공정을 수행하여 확산 베리어막이 형성된다.
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公开(公告)号:KR100472555B1
公开(公告)日:2005-06-07
申请号:KR1019970079901
申请日:1997-12-31
Applicant: 삼성전자주식회사
IPC: G02F1/13
Abstract: 본 발명은 진공 시스템의 진공압 형성 방법에 관한 것으로, 오일 회전 펌프를 사용하는 진공 시스템에서 공정 프로그램을 가동시키기 전 오일 펌프 및 제 1 개폐 밸브 사이의 압력과 제 1 및 제 2 개폐 밸브 사이의 압력을 동등하게 유지시킨 상태에서 공정 프로그램을 가동시킴으로써, 오일 펌프 내의 오일 및 오일 증기가 역류되는 것을 방지할 수 있어 LCD 패널의 수율을 향상시킬 수 있다.
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公开(公告)号:KR1020000004474A
公开(公告)日:2000-01-25
申请号:KR1019980025910
申请日:1998-06-30
Applicant: 삼성전자주식회사
IPC: A61D7/04
CPC classification number: A61D7/04
Abstract: PURPOSE: A handy inhalation anesthetic machine for small animals is provided to reduce the manufacture cost, to simply operate the machine and to protect a tester by decreasing the leakage of the anesthetic gas. CONSTITUTION: The handy inhalation anesthetic machine installs:a first chamber(7) having a first opening for inserting the head of an anesthetic target(9); a second chamber(6) having a second opening; cotton(2) used as an evaporation medium; an injector(1) and a feed pipe(8) of the anesthetic for dropping the anesthetic on the cotton(2); and an exhaust pipe(5) of the anesthetic gas provided in an oxygen feed pipe(4) for feeding oxygen and the second chamber(6) to exhaust the anesthetic gas to outside.
Abstract translation: 目的:为小型动物提供方便的吸入麻醉机,以降低制造成本,简单地操作机器,并通过减少麻醉气体的泄漏来保护测试仪。 构成:方便的吸入麻醉机安装:具有用于插入麻醉靶(9)的头部的第一开口的第一腔室(7); 具有第二开口的第二腔室(6) 棉花(2)用作蒸发介质; 用于将麻醉剂放在棉花(2)上的麻醉剂的注射器(1)和进料管(8); 以及设置在用于输送氧的氧气供给管(4)中的麻醉气体的排气管(5)和用于将麻醉气体排出到外部的第二室(6)。
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公开(公告)号:KR1020150144191A
公开(公告)日:2015-12-24
申请号:KR1020140073013
申请日:2014-06-16
Applicant: 삼성전자주식회사
IPC: H01L21/8247 , H01L21/20 , H01L21/31
CPC classification number: H01L45/06 , H01L27/2409 , H01L27/2463 , H01L45/1233 , H01L45/1253 , H01L45/141 , H01L45/144 , H01L45/1616 , H01L45/1625 , H01L45/1641 , H01L45/1666 , H01L45/1683
Abstract: 상변화메모리소자의제조방법에있어서, 기판상에개구를갖는층간절연막을형성한다. 개구의내벽상에제1 조성을갖는제1 상변화물질막패턴을형성한다. 제1 상변화물질막패턴상에제2 조성을갖고개구의나머지부분을채우는제2 상변화물질막패턴을형성한다. 제1 및제2 상변화물질막패턴들에에너지를가하여이들이적어도부분적으로혼합됨으로써제3 조성을갖는제3 상변화물질막패턴을형성한다.
Abstract translation: 本发明涉及一种相变存储器件的制造方法,包括以下步骤:在衬底上形成具有开口的绝缘中间层; 在具有第一组成的开口的内壁上形成第一相变材料层图案; 形成具有第二组成并在第一相变材料层图案上填充开口的其余部分的第二相变材料层图案; 以及通过将能量放入所述第一和第二相变材料层图案中使所述图案至少部分地混合而形成具有第三组成的第三相变材料层。
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