公开(公告)号：KR1020050029420A

公开(公告)日：2005-03-28

申请号：KR1020030065675

申请日：2003-09-22

Applicant: 한국과학기술연구원

Inventor： 안광덕 ,  한동근 ,  강종희

IPC: G03F7/004

Abstract: Provided are a polymer, its preparation method, an organic bottom antireflective coating layer composition containing the polymer, and an antireflective coating layer to prevent the reflection of a substrate layer below a photoresist layer for forming a hyperfine circuit during the exposure process using a deep UV of 250 nm or less in the photolithography of a highly integrated semiconductor prepared from the composition. The polymer is represented by the formula 1, wherein R is a benzoin ether, acetophenone or anthracene derivative of an aromatic carbonyl; R1 is H, a C1-C6 alkyl group, a C1-C6 alkoxyalkyl group or a C1-C6 hydroxyalkyl group; R2 is a protected maleimide or furyl group; X is H, a carboxyl group, a hydroxyl group, a furoyl group or a cyanato group; Y is a C1-C6 alkyl group or a phenyl group; x is 0.1-0.5; y is 0-0.6; z is 0-0.3; p is 0.01-0.3; x+y+z+p = 1; and q is an integer of 1-6. Preferably the polymer has a weight average molecular weight of 10,000-100,000.

Abstract translation: 提供聚合物，其制备方法，含有该聚合物的有机底部抗反射涂层组合物和防反射涂层，以防止在使用深紫外线的曝光过程中形成超精细电路的光致抗蚀剂层下方的基底层反射 在由组合物制备的高度集成的半导体的光刻中为250nm以下。 聚合物由式1表示，其中R是芳族羰基的苯偶姻醚，苯乙酮或蒽衍生物; R1是H，C1-C6烷基，C1-C6烷氧基烷基或C1-C6羟烷基; R2是受保护的马来酰亚胺或呋喃基; X是H，羧基，羟基，糠酰基或氰基; Y是C1-C6烷基或苯基; x为0.1-0.5; y为0-0.6; z为0-0.3; p为0.01-0.3; x + y + z + p = 1; q为1-6的整数。 优选地，聚合物的重均分子量为10,000-100,000。

公开(公告)号：KR1020030070417A

公开(公告)日：2003-08-30

申请号：KR1020020009950

申请日：2002-02-25

Applicant: 한국과학기술연구원

Inventor： 안광덕 ,  강종희 ,  김준우

IPC: C08F220/52

CPC classification number: C08F222/40 ,  C08F2/06 ,  C08F2/44 ,  C08F216/14 ,  C08F216/1408 ,  C08F216/1416 ,  C08F220/06 ,  C08F220/14 ,  C08F220/18 ,  C08F220/22 ,  C08F2220/281 ,  G03F7/70025

Abstract: PURPOSE: An N-hydroxyphenylmaleimide-containing polymer, an antireflection film composition containing the polymer, an organic antireflection film containing the polymer and its preparation, and a semiconductor device prepared by using the composition are provided, to inhibit the diffused reflection of the exposed light during the processing of micro pattern and the generation of standing wave, thereby improving the production yield of a semiconductor having a super high resolution of 70-120 nm. CONSTITUTION: The N-hydroxyphenylmaleimide-containing polymer is represented by the formula 1, wherein R is H, tetrahydropyranyl, -COOR3, (SiR4)3 or t-butyl group; R3 and R4 are methyl, t-butyl or an alkyl group of C2-C3, respectively; R1 and R2 which are independently each other represent H, an alkyl group of C1-C6, an alkoxyalkyl group of C1-C6, a hydroxyalkyl group of C1-C6 or a halogenated alkyl group of C1-C6; and the mole fraction, x is 0.1-0.7, y is 0-0.8, z is 0-0.55 and p is 0-0.5 based on the total mol of x+y+z+p.

Abstract translation: 目的：提供含有N-羟基苯基马来酰亚胺的聚合物，含有聚合物的防反射膜组合物，含有该聚合物的有机抗反射膜及其制备方法以及使用该组合物制备的半导体装置，以抑制曝光的扩散反射 在微图案的处理和驻波的产生中，由此提高70〜120nm的超高分辨率的半导体的制造成品率。 构成：含有N-羟基苯基马来酰亚胺的聚合物由式1表示，其中R为H，四氢吡喃基，-COOR 3，（SiR 4）3或叔丁基; R3和R4分别是甲基，叔丁基或C2-C3的烷基; R 1和R 2彼此独立地表示H，C 1 -C 6烷基，C 1 -C 6烷氧基烷基，C 1 -C 6羟基烷基或C 1 -C 6卤代烷基; 摩尔分数x为0.1-0.7，y为0-0.8，z为0-0.55，p为0-0.5，基于x + y + z + p的总摩尔数。

公开(公告)号：KR100145353B1

公开(公告)日：1998-07-15

申请号：KR1019940020036

申请日：1994-08-13

Applicant: 한국과학기술연구원

Inventor： 안광덕 ,  정찬문 ,  구덕일 ,  강종희

IPC: C08F220/52 ,  C07D207/24 ,  C07D207/46 ,  C08F20/00

Abstract: NP-톨루엔술폰일옥시말레이미드(TsOMI), N-메탄술폰일옥시말레이미드(MsOMI), N-트리플로로메탄술폰일옥시말레이미드(TfOMI) 중에서 선택한 광산 발생형 단량체 X-OMI와 Nt-부틸옥시카보닐말레이미드(t-BOCMI), 말레이미드(MI), N-히드록시말레이미드(HOMI) 중에서 선택한 말레이미드 단량체 Y-MI와 스티렌(St), 히드록시스티렌(HOSt), t-부틸옥시카보닐옥시스티렌(t-BOCSt) 중에서 선택한 스티렌 유도체(Z-St)를 라디칼공중합시켜 X-OMI:Y-MI:Z-St=0.7∼1.5:0.7∼1.5:1.5∼2.5 (몰%)의 조성을 가진 N-치환된 술폰일옥시말레이미드 단량체를 이용한 삼원공중합체 P(X-OMI/Y-MI/Z-St)의 제조방법 및 이를 이용한 내열성 레지스트 화상형성방법.

公开(公告)号：KR100124966B1

公开(公告)日：1997-11-26

申请号：KR1019940000150

申请日：1994-01-06

Applicant: 한국과학기술연구원

Inventor： 안광덕 ,  강종희 ,  정찬문

IPC: G03F7/028 ,  G03F7/004

CPC classification number: C08F2/50

Abstract: The present invention relates a new photo initiator compound and a sensitive polymer composition having the new photo initiator compound which a benzoin alkyl ether is combined with an epoxy phlepolymer or acryl acid ester phlepolymer. The photo initiator compound according to the present invention has a good storing stability. The photo initiator compound may be easily reacted with other components of a photo hardening composition to thereby improve a photo reactive performance. The photo initiator compound improves mechanical features of the photo hardening composition. The photo initiator compound may solve problems such as a poisonous feature, a bad smell, and a color breakdown.

Abstract translation: 本发明涉及一种新的光引发剂化合物和具有新的光引发剂化合物的敏化聚合物组合物，其中苯偶姻烷基醚与环氧聚合物或丙烯酸酯类聚合物组合。 根据本发明的光引发剂化合物具有良好的储存稳定性。 光引发剂化合物可以容易地与光硬化组合物的其它组分反应，从而提高光反应性能。 光引发剂化合物改善了光硬化组合物的机械特征。 光引发剂化合物可以解决诸如毒物特征，难闻气味和颜色分解等问题。

公开(公告)号：KR1019960007651A

公开(公告)日：1996-03-22

申请号：KR1019940020036

申请日：1994-08-13

Applicant: 한국과학기술연구원

Inventor： 안광덕 ,  정찬문 ,  구덕일 ,  강종희

IPC: C08F220/52 ,  C07D207/24 ,  C07D207/46 ,  C08F20/00

Abstract: NP-톨루엔술폰일옥시말레이미드(TsOMI), N-메탄술론일옥시말레이미드(MsOMI), N-트리플로로메탄술폰일옥시말레이미드(TfOMI) 중에서 선택한 광산 발생형 단량체 X-OMI와 Nt-부틸옥시카보닐말레이미드(t-BOCMI), 말레이미드(MI), N-히드록시말레이미드(HOMI) 중에서 선택한 말레이미드 단량체 Y-MI와 스티렌(St), 히드록시스티렌(HOSt), t-부틸옥시카보닐옥시스티렌(t-BOCSt) 중에서 선택한 스티렌 유도체(Z-St)를 라디칼공중합시켜 X-OMI : Y-MI : Z-St = 0.7∼1.5 : 0.7∼1.5 : 1.5∼2.5 (몰%)의 조성을 가진 N-치환된 술폰일옥시말레이미드 단량체를 이용한 삼원공중합체P(X0OMI/Y-MI/Z∼St)의 제조방법 및 이를 이용한 내열성 레지스트 화상형성방법.

公开(公告)号：KR1019950024015A

公开(公告)日：1995-08-21

申请号：KR1019940000150

申请日：1994-01-06

Applicant: 한국과학기술연구원

Inventor： 안광덕 ,  강종희 ,  정찬문

IPC: G03F7/028 ,  G03F7/004

Abstract: 본 발명은 벤조인알킬에테르가 에폭시 프레폴리머 또는 아크릴산 에스테르 프레폴리머에 화학적으로 결합된 신규의 광개시제 화합물 및 이를 함유하는 광경화 조성물에 관한 것이다. 본 발명에 따른 광개시제 화합물은 저장 안정성이 뛰어나고, 광경화 조성물 중의 다른 성분들과의 상용성이 우수하여 광반응 효율을 향상시킬 수 있으며, 또한, 광경화된 조성물의 기계적 성질을 향상시킬 뿐만 아니라, 독성, 악취, 탈색 등의 문제도 해결할 수 있다.

公开(公告)号：KR1020130117546A

公开(公告)日：2013-10-28

申请号：KR1020120040480

申请日：2012-04-18

Applicant: 한국과학기술연구원

Inventor： 한동근 ,  정윤기 ,  강종희 ,  최지연 ,  금창헌

IPC: A61L27/10 ,  A61L27/14 ,  C08L101/16

CPC classification number: A61L17/145 ,  A61L27/306 ,  A61L27/34 ,  A61L27/446 ,  A61L27/58 ,  A61L31/088 ,  A61L31/10 ,  A61L31/128 ,  A61L31/148 ,  A61L2420/04 ,  B82Y5/00 ,  C08L67/04

Abstract: PURPOSE: A biomedical implant, use thereof, and a preparation method thereof are provided to suppress inflammation due to the decomposition of biodegradable polymers. CONSTITUTION: A biomedical implant includes basic ceramic particles of which surface is reformed with first biodegradable polymers and second biodegradable polymers which are combined with the first biodegradable polymers and form a stereo complex. The basic ceramic particles neutralize acid materials during the decomposition of polymers and have biocompatibility. The polymers are selected from first biodegradable polymers, second biodegradable polymers, and their combination. A ceramic composite forms a coating layer on the surface of the biomedical implant.

Abstract translation: 目的：提供生物医学植入物，其用途及其制备方法，以抑制由于可生物降解聚合物的分解引起的炎症。 构成：生物医学植入物包括基本陶瓷颗粒，其表面与第一可生物降解聚合物和第二可生物降解聚合物重整，其与第一可生物降解聚合物组合并形成立体络合物。 碱性陶瓷颗粒在聚合物分解过程中中和酸性物质，具有生物相容性。 聚合物选自第一可生物降解聚合物，第二可生物降解聚合物及其组合。 陶瓷复合材料在生物医学植入物的表面上形成涂层。

公开(公告)号：KR1020120117169A

公开(公告)日：2012-10-24

申请号：KR1020110034761

申请日：2011-04-14

Applicant: 한국과학기술연구원

Inventor： 한동근 ,  박귀덕 ,  강종희 ,  최지연 ,  장부남

IPC: A61F2/82 ,  A61L27/34 ,  B05B17/06 ,  A61L27/04

CPC classification number: A61F2/82 ,  A61F2240/001 ,  A61F2250/0067 ,  A61F2310/0097 ,  A61L31/022 ,  A61L31/10 ,  B05B17/06

Abstract: PURPOSE: A method for reforming the surface of a stent is provided to flatten the surface of a stent coated with biodegradable polymers. CONSTITUTION: A method for reforming the surface of a stent includes the following steps: a coating layer is formed by ultrasonic wave-spraying the mixture of a first biodegradable polymer and chemicals to the surface of a stent; the stent with the coating layer is contacted with a solvent; and the solvent is evaporated at a temperature between 20 and 80 deg C. The stent is made of a metal selected from a group including stainless steel, cobalt-chromium, platinum-chromium, tantalum, titanium, nitinol, gold, platinum, silver, and the alloy of the same. The biodegradable polymer is selected from a group including poly(glycolic acid), poly-L-lactic acid, poly-D-lactic acid, poly-D,L-lactic acid, poly-e-caprolactone, poly lactic acid-glycolic acid copolymer, poly-L-lactic acid-e-caprolactone copolymer, poly(ethylene glycol), poly(amino acid), polyanhydride, poly ortho ester, polydioxanone, polyphosphazene, cellulose acetate butylate, cellulose triacetate, and the copolymer of the same.

Abstract translation: 目的：提供一种用于重整支架表面的方法，以使涂覆有可生物降解的聚合物的支架的表面变平。 构成：用于重整支架表面的方法包括以下步骤：通过将第一可生物降解的聚合物和化学品的混合物超声波喷涂到支架的表面上来形成涂层; 将具有涂层的支架与溶剂接触; 并且溶剂在20和80℃之间的温度下蒸发。支架由选自不锈钢，钴铬，铂铬，钽，钛，镍钛诺，金，铂，银， 和合金相同。 生物降解性聚合物选自聚（乙醇酸），聚-L-乳酸，聚-D-乳酸，聚-D，L-乳酸，聚ε-己内酯，聚乳酸 - 乙醇酸 共聚物，聚-L-乳酸-ε-己内酯共聚物，聚（乙二醇），聚（氨基酸），聚酐，聚原酸酯，聚二恶烷酮，聚磷腈，乙酸纤维素丁酸酯，三乙酸纤维素及其共聚物。

公开(公告)号：KR100528454B1

公开(公告)日：2005-11-15

申请号：KR1020030065675

申请日：2003-09-22

Applicant: 한국과학기술연구원

Inventor： 안광덕 ,  한동근 ,  강종희

IPC: G03F7/004

Abstract: 본 발명은 250 nm 이하의 단파장의 원자외선을 이용한 고집적 반도체의 광미세 회로 가공기술(photolithography)에서의 노광 시에 포토레지스트 층 밑의 기질 층에서 일어나는 반사를 방지함으로써 포토레지스트 미세 화상에 발생하는 정재파(standing wave) 효과를 제거할 수 있으며, 가교 결합 기능을 갖는, 아래의 화학식 1로 표시되는 바닥 반사 방지막(bottom antireflective coating layer) 재료용 유기 고분자, 이를 이용한 바닥 반사 방지막 제조용 조성물 및 이들의 제조방법에 관한 것이다.
[화학식 1]

公开(公告)号：KR1020010038526A

公开(公告)日：2001-05-15

申请号：KR1019990046513

申请日：1999-10-26

Applicant: 한국과학기술연구원

Inventor： 안광덕 ,  김종만 ,  한동근 ,  강종희

IPC: C07C15/28

Abstract: PURPOSE: Provided are an alpha-aminoanthracene derivative useful as a precursor of material for forming fine fluorescent image, a copolymer thereof applied to material for recording and a sensor, and a method for forming the fine fluorescent image by using the copolymer. CONSTITUTION: The alpha-aminoanthracene derivative is represented by the formula 1 and the copolymer represented by the formula 2 is produced by radical polymerizing the alpha-aminoanthracene derivative and comonomers selected from the group consisting of styrene, maleimide, and methacrylate in the presence of a polymerization initiator. And the method for forming the fine fluorescent image comprises the steps of: dissolving the copolymer containing the alpha-aminoanthracene derivative, a photoacid generator, an organic acid, and an inorganic acid in an organic solvent; spreading the solution on a substrate and drying to form a thin film; prebaking the thin film coated substrate; exposing by photomask; post-exposure baking. In the formula, R1 is alkyl or phenyl, R2 is O or NH, R3 is vinyl, acryl, allyl, alpha-methylvinyl or 4-vinylphenyl, m is an integer of 0-20, R4 is hydrogen or methyl, R5 is methyloxycarbonyl or phenyl, x and y are an integer of 10-5000.

Abstract translation: 目的：提供可用作形成细荧光图像的材料的前体的α-氨基蒽衍生物，其用于记录材料的共聚物和传感器，以及通过使用共聚物形成微细荧光图像的方法。 构成：α-氨基蒽衍生物由式1表示，由通式2表示的共聚物是通过使α-氨基蒽衍生物和选自苯乙烯，马来酰亚胺和甲基丙烯酸酯的共聚单体在 聚合引发剂。 形成微细荧光图像的方法包括以下步骤：将含有α-氨基蒽衍生物，光致酸发生剂，有机酸和无机酸的共聚物溶解在有机溶剂中; 将溶液铺展在基材上并干燥以形成薄膜; 预烘烤薄膜涂布基材; 用光掩模曝光; 曝光后烘烤。 式中R 1为烷基或苯基，R 2为O或NH，R 3为乙烯基，丙烯酰基，烯丙基，α-甲基乙烯基或4-乙烯基苯基，m为0-20的整数，R4为氢或甲基，R5为甲氧基羰基 或苯基，x和y为10-5000的整数。