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1.发明公开
公开(公告)号：KR1020140096673A
公开(公告)日：2014-08-06
申请号：KR1020130009528
申请日：2013-01-28
Applicant: 한국과학기술연구원
IPC: C07D233/56 , C09D5/14 , A01N43/28
CPC classification number: A01N43/50 , C07D233/58 , A01N25/10 , A01N25/34
Abstract: An antibacterial imidazolium compound, a photocurable coating composition, and an antibacterial coating of the present invention comprise a compound represented by chemical formula 1 or derivatives of the same compound. Explanation about the X^-, R^1, and R^2 in chemical formula 1 is the same as stated in the detail description of the present invention. The antibacterial imidazolium compound has an excellent antibacterial effect against various strains so that the antibacterial coating can be provided by simply being added to the photocurable coating composition. Additionally, the antibacterial coating comprises a monomeric antibacterial imidazolium compound that exists by being chemically bonded to a polymer chain so that antibacterial effect is maintained for a long time. A manufacturing process of the antibacterial coating is simple by inducing a thiol N bond using light irradiation, and a use of toxic organic solvents is unnecessary, thereby providing an eco-friendly antibacterial coating.
Abstract translation: 本发明的抗菌咪唑化合物，光固化性涂料组合物和抗菌涂层含有化学式1表示的化合物或相同化合物的衍生物。 关于化学式1中的X 1 - ，R 1'和R 2'的解释与本发明的详细描述中所述相同。 抗菌咪唑化合物对各种菌株具有优异的抗菌作用，因此通过简单地加入到光固化性涂料组合物中可提供抗菌涂层。 此外，抗菌涂层包括通过与聚合物链化学键合而存在的单体抗菌咪唑化合物，使得长时间保持抗菌效果。 通过使用光照射诱导硫醇N键，抗菌涂层的制造工艺简单，并且不需要使用有毒有机溶剂，从而提供环保的抗菌涂层。
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公开(公告)号：KR100367042B1
公开(公告)日：2003-01-15
申请号：KR1019990046512
申请日：1999-10-26
Applicant: 한국과학기술연구원
IPC: C07C50/18
CPC classification number: Y02P20/55
Abstract: PURPOSE: A method for forming a fine fluorescent image by using protected hydroxy group-containing anthraquinone derivatives or naphthacenequinone derivatives is provided. Thereby the obtained protected hydroxy group-containing compound can be applied to recording material and censor material because it can easily form a fine fluorescent image of micrometer units under the condition of a chemically amplified fine image forming process. CONSTITUTION: This method comprises the steps of: preparing a transparent solution by dissolving protected hydroxy group-containing anthraquinone derivatives of formula 1 or naphthacenequinone derivatives of formula 2 and a soluble polymer in an organic solvent; forming a thin film by coating the solution on a substrate; prebaking the thin film coated substrate; and removing a hydroxy protecting group of the anthraquinone derivatives or naphthacenequinone derivatives by treating under the condition of a chemically amplified fine image forming process.
Abstract translation: 目的：提供一种通过使用被保护的含羟基蒽醌衍生物或并四苯醌衍生物来形成精细荧光图像的方法。 因此，所获得的被保护的含羟基化合物可以应用于记录材料和传感材料，因为它可以在化学放大的精细图像形成过程的条件下容易地形成微米单位的精细荧光图像。 构成：该方法包括以下步骤：通过将式1的受保护的含羟基蒽醌衍生物或式2的萘并萘醌衍生物和可溶性聚合物溶解在有机溶剂中制备透明溶液; 通过将溶液涂覆在基底上形成薄膜; 预烘烤薄膜涂覆的基材; 并通过在化学放大的精细图像形成过程的条件下处理除去蒽醌衍生物或萘并萘醌衍生物的羟基保护基。
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公开(公告)号：KR100351074B1
公开(公告)日：2002-09-05
申请号：KR1020000038132
申请日：2000-07-05
IPC: A61K6/00
Abstract: 본 발명은 종래 치과수복용 프리폴리머로 사용되고 있는 2,2-비스-(4-(2-히드록시-3-메타크릴로일옥시프로폭시)페닐)프로판 [이하, "Bis-GMA"라 명명함]에, 이 Bis-GMA 분자 중의 히드록시기의 수소 원자를 메타크릴레이트기로 치환한 멀티메타크릴레이트기 함유 다관능성 프리폴리머를 혼합한 프리폴리머 혼합물을 기재로 하고, 희석제, 무기 충전제, 광개시계 및 기타 첨가제를 포함하는 치과수복용 광중합성 복합레진 조성물에 관한 것이다. 다관능성 프리폴리머 혼합물을 기재로 하는 본 발명의 치과수복용 광중합성 복합레진 조성물은 기재로서 Bis-GMA 자체만을 포함하는 종래의 것보다 우수한 물리적, 기계적 특성과 생체 적합성을 나타낸다.
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公开(公告)号：KR100341426B1
公开(公告)日：2002-06-21
申请号：KR1019990046511
申请日：1999-10-26
Applicant: 한국과학기술연구원
IPC: C07C50/16
CPC classification number: Y02P20/55
Abstract: 본발명은미세형광화상형성용재료의전구물질로서유용한히드록시보호된 1,4-디히드록시안트라퀴논유도체및 그의공중합체와, 이공중합체를이용한미세형광화상형성방법에관한것이다. 본발명의히드록시보호된 1,4-디히드록시안트라퀴논공중합체는히드록시기의분자내수소결합을한시적으로차단한다음, 산, 열또는광 등에의해탈보호되어색 및형광의변화를일으키기때문에, 화학증폭성미세화상형성공정조건에서쉽게미크론미터단위의미세형광화상을형성할수 있어서, 색화상및 형광화상물질과같은기록용재료, 그리고센서재료로응용될수 있다.
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公开(公告)号：KR100324644B1
公开(公告)日：2002-02-27
申请号：KR1019990046513
申请日：1999-10-26
Applicant: 한국과학기술연구원
IPC: C07C15/28
Abstract: 본발명은미세형광화상형성용재료의전구물질로서유용한, α-아미노안트라센유도체및 그의공중합체와, 이공중합체를이용한미세형광화상형성방법에관한것이다. 본발명의α-아미노안트라센함유공중합체는유기산또는무기산에의해형광이변하고, 광산발생제와혼합하여박막상태에서노광할경우쉽게미크론미터단위의미세형광화상을형성할수 있으며, 용액, 필름및 입자상태에서센서기능이우수하여기록용재료및 센서재료로응용될수 있다.
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Patent Agency Ranking
公开(公告)号：KR100321563B1
公开(公告)日：2002-01-23
申请号：KR1019990046514
申请日：1999-10-26
Applicant: 한국과학기술연구원
IPC: C07D263/54
Abstract: 본발명은미세형광화상형성용재료의전구물질로서유용한, 피리딜벤족사졸유도체및 그의공중합체와, 이공중합체를이용한미세형광화상형성방법에관한것이다. 본발명의피리딜벤족사졸함유공중합체는유기산또는무기산, 또는금속이온에의해형광이변하고, 광산발생제와혼합하여박막상태에서노광할경우쉽게미크론미터단위의미세형광화상을형성할수 있으며, 용액, 필름및 입자상태에서센서기능이우수하여기록용재료및 센서재료로응용될수 있다.
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公开(公告)号：KR1020010038525A
公开(公告)日：2001-05-15
申请号：KR1019990046512
申请日：1999-10-26
Applicant: 한국과학기술연구원
IPC: C07C50/18
CPC classification number: Y02P20/55
Abstract: PURPOSE: A method for forming a fine fluorescent image by using protected hydroxy group-containing anthraquinone derivatives or naphthacenequinone derivatives is provided. Thereby the obtained protected hydroxy group-containing compound can be applied to recording material and censor material because it can easily form a fine fluorescent image of micrometer units under the condition of a chemically amplified fine image forming process. CONSTITUTION: This method comprises the steps of: preparing a transparent solution by dissolving protected hydroxy group-containing anthraquinone derivatives of formula 1 or naphthacenequinone derivatives of formula 2 and a soluble polymer in an organic solvent; forming a thin film by coating the solution on a substrate; prebaking the thin film coated substrate; and removing a hydroxy protecting group of the anthraquinone derivatives or naphthacenequinone derivatives by treating under the condition of a chemically amplified fine image forming process.
Abstract translation: 目的：提供通过使用保护的含羟基蒽醌衍生物或并四苯醌衍生物形成精细荧光图像的方法。 由此，可以在化学放大精细图像形成工序的条件下容易地形成微米单位的微细荧光图像，将得到的保护的含羟基化合物施加到记录材料和检查材料上。 构成：该方法包括以下步骤：通过将保护的含羟基的式1的蒽醌衍生物或式2的并四苯醌衍生物和可溶性聚合物溶解在有机溶剂中来制备透明溶液; 通过将溶液涂布在基材上形成薄膜; 预烘烤薄膜涂布基材; 并通过在化学放大的精细成像方法的条件下处理除去蒽醌衍生物或萘并醌衍生物的羟基保护基。
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公开(公告)号：KR100178332B1
公开(公告)日：1999-05-15
申请号：KR1019960002773
申请日：1996-02-06
Applicant: 한국과학기술연구원
IPC: C08F234/00
Abstract: 본 발명은 공중합체의 단위로서 N-캠퍼술폰일옥시말레이미드와 말레이미드계 화합물, 스티렌계 화합물, 및 메타크릴산에스테르계 화합물 중에서 선택된 한가지 또는 두가지를 교대 구조로 가진 공중합체 및 그의 제조방법에 관한 것이다. 본 발명의 공중합체는 양호한 필름 형성능과 낮은 광흡수율을 나타내며 레지스트 응용에 매우 적절한 고분자이다.
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公开(公告)号：KR100153175B1
公开(公告)日：1998-12-01
申请号：KR1019950029615
申请日：1995-09-12
Applicant: 한국과학기술연구원
IPC: C07C317/22
Abstract: 본 발명은 치과용 재료로서 사용되는 하기 일반식(I)의 화합물을 제공한다.
식 중, R
1 , R
2 , R
3 및 R
4 는 각각 독립적으로 -OH, -OCOCH=CH
2 , 또는 -OCOCCH
3 =CH
2 이다. 다만, R
1 및 R
2 중 적어도 하나는 -OH가 아니고, 동시에 R
3 및 R
4 중 적어도 하나는 -OH가 아니다.-
公开(公告)号：KR1019950004198B1
公开(公告)日：1995-04-27
申请号：KR1019920015242
申请日：1992-08-25
Applicant: 한국과학기술연구원
IPC: G03F7/004
Abstract: The three component photosensitive resin compsn. used in the formation of a micropattern for the mfr of semiconductor devices is composed of 100 wt. pts. of an alkali-soluble resin i.e. novolac resin contg. an aromatic ring, 5˜40 wt. pts. of a phosphagen cpd. of formula (I) [R=-COO(CCH3)3; x=3 or 4 protected with a t-butoxy carbonyl (t-BOC) gp. as a disslution inhibitor, and 1˜20 wt. pts. of an onium salt of formula ArnX+Y- [Ar=aromatic hydrocarbon gp.; n=1˜3; X=halogen or S; Y=BF4, PF6, AsF6, SbF6, CF3 or SO3 , an organic sulfonic ester or a pyrogallol sulfonic ester cpd. as a photoacid generator.
Abstract translation: 三组分感光树脂组合物。 用于半导体器件制造的微图案的形成由100重量％ 点。 的碱溶性树脂，即酚醛清漆树脂。 芳香环，5〜40重量％ 点。 的磷酸酯cpd。 的式（I）[R = -COO（CCH 3）3; x = 3或4用叔丁氧基羰基（t-BOC）gp保护。 作为消毒抑制剂，和1〜20重量％ 点。 的式ArnX + Y- [Ar =芳烃gp; N = 1〜3; X =卤素或S; Y = BF 4，PF 6，AsF 6，SbF 6，CF 3或SO 3，有机磺酸酯或连苯三酚磺酸酯cpd。 作为光致酸发生器。
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