公开(公告)号：US20160272664A1

公开(公告)日：2016-09-22

申请号：US15032230

申请日：2014-11-07

Applicant: ADEKA CORPORATION

Inventor： Masako HATASE ,  Masaki ENZU ,  Atsushi SAKURAI ,  Tomoharu YOSHINO

IPC: C07F15/00 ,  C23C16/455

CPC classification number: C07F15/0046 ,  C07C225/14 ,  C23C16/16 ,  C23C16/18 ,  C23C16/45553

Abstract: Disclosed is a ruthenium compound useful as a precursor in chemical vapor growth, particularly ALD. The compound has good reactivity with a reactive gas, a high vapor pressure, and a low melting point. The compound is represented by general formula (I), wherein R1, R2, and R3 each independently represent a straight or branched chain alkyl group having 1 to 5 carbon atoms, provided that the total number of the carbon atoms of R1 and R2 is 3 to 10. In formula (I), R1 and R2 are each preferably ethyl or isopropyl.

Abstract translation: 公开了可用作化学气相生长中的前体的钌化合物，特别是ALD。 该化合物与反应性气体具有良好的反应性，高蒸气压和低熔点。 该化合物由通式（I）表示，其中R 1，R 2和R 3各自独立地表示具有1至5个碳原子的直链或支链烷基，条件是R 1和R 2的总碳原子数为3 式（I）中，R 1和R 2各自优选为乙基或异丙基。