公开(公告)号：EP1227344A4

公开(公告)日：2005-08-31

申请号：EP00971745

申请日：2000-11-02

Applicant: ASAHI GLASS CO LTD

Inventor： TAKAKI SATORU ,  OKADA KANAME ,  KIKUGAWA SHINYA

IPC: G02B1/10 ,  G02B1/11 ,  G03F1/00 ,  G03F1/46 ,  G03F1/62 ,  G03F7/20 ,  G02B1/00 ,  G03F1/14 ,  G21K5/00

CPC classification number: G03F1/62 ,  G02B1/11 ,  G02B1/115 ,  G03F1/46 ,  G03F1/50 ,  G03F7/70958 ,  G03F7/70983

Abstract: An antireflection base having a base which is transparent to ultraviolet radiation and vacuum ultraviolet radiation in the wavelength region from 155 nm to 200 nm and has an antireflection film of one, two, or three layers formed on at least one side of the base, wherein the antireflection film has a refractive index and a geometrical thickness both satisfying a specific condition at the central wavelength μ0 in the ultraviolet and vacuum ultraviolet wavelength regions where antireflection is needed. An optical member for a semiconductor manufacturing system comprising such an antireflection base and a base for low-reflection pellicle are also disclosed.

Abstract translation: 一种防反射基板，包括对在155nm至200nm的波长范围内的紫外线和真空紫外线透明的基板和形成在所述基板的至少一侧上的单层，双层或三层抗反射膜，其中， 需要抗反射的紫外线或真空紫外线的波长区域的中心波长λ0处的抗反射膜的折射率和物理厚度满足特定条件，以及用于半导体制造装置的光学部件和用于低反射的基板 防紫外线是紫外线和真空紫外线防反射基板。

公开(公告)号：EP1088795A4

公开(公告)日：2004-03-31

申请号：EP00911387

申请日：2000-03-27

Applicant: ASAHI GLASS CO LTD

Inventor： KIKUGAWA SHINYA ,  IKUTA YOSHIAKI ,  MASUI AKIO ,  SHIMODAIRA NORIAKI ,  YOSHIZAWA SHUHEI

IPC: B08B7/00 ,  C03B19/14 ,  C03C3/06 ,  C03C23/00 ,  C03C4/00

CPC classification number: C03C23/002 ,  B08B7/0057 ,  C03B19/1453 ,  C03B19/1469 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03C3/06 ,  C03C2201/23 ,  C03C2203/50 ,  Y02P40/57

Abstract: A process for producing a synthetic quartz glass for optical members, which comprises the step of irradiating a synthetic quartz glass having an OH group content of 50 ppm or lower with vacuum ultraviolet having a wavelength of 180 nm or shorter to improve the transmittance in a region of wavelengths not longer than 165 nm.

公开(公告)号：EP1125897A4

公开(公告)日：2004-03-31

申请号：EP00937201

申请日：2000-06-09

Applicant: ASAHI GLASS CO LTD

Inventor： IKUTA YOSHIAKI ,  KIKUGAWA SHINYA ,  MASUI AKIO ,  SIMODAIRA NORIAKI ,  YOSHIZAWA SHUHEI

IPC: C03B8/04 ,  C03B19/14 ,  C03C3/06

CPC classification number: C03B19/1415 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2207/30 ,  C03B2207/32 ,  C03B2207/36 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/54 ,  Y02P40/57

Abstract: A synthetic quartz glass being used for a light having a wavelength of 150 to 200 nm, which has a concentration of OH group of 100 ppm or less, a concentration of hydrogen molecules of 1 x 10 molecules/cm or less and defects of reducing type of 1 x 10 /cm or less, and exhibits a relationship of DELTA K163 and DELTA K190 before and after irradiation of ultraviolet rays which satisfies 0

Abstract translation: 用于波长为150〜200nm的光的合成石英玻璃，OH基浓度为100ppm以下，氢分子浓度为1×10 17分子/ cm 3以下，还原型 缺陷至多为1×10 15个缺陷/ cm 3，并且在紫外线照射之前和之后，DELTA k163与DELTA k190之间的关系满足0

公开(公告)号：EP1043282A4

公开(公告)日：2004-03-31

申请号：EP99951132

申请日：1999-10-28

Applicant: ASAHI GLASS CO LTD

Inventor： IKUTA YOSHIAKI ,  KIKUGAWA SHINYA ,  SHIMODAIRA NORIAKI ,  MASUI AKIO ,  YOSHIZAWA SHUHEI

IPC: C03B8/04 ,  C03B19/14 ,  C03C3/06 ,  C03C23/00 ,  C03B37/014 ,  C03B37/018

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C23/002 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/44 ,  C03C2203/54 ,  Y02P40/57 ,  Y10S65/16 ,  Y10S501/90 ,  Y10S501/905

Abstract: A synthetic quartz glass for optical use which is used through irradiation of rays of light from the ultraviolet region to the vacuum ultraviolet region, characterized in that the quartz glass contains fluorine and has a ratio of the intensity of a scattering peak at 2250 cm (I 2250) to that of a scattering peak at 800 cm (I 800), that is I 2250/I 800, in a laser Raman spectrum of 1 x 10 or less and an absorption coefficient of the light having a wave length of 245 nm of 2 x 10 cm or less.

公开(公告)号：EP1164431A4

公开(公告)日：2003-04-09

申请号：EP00961001

申请日：2000-09-13

Applicant: ASAHI GLASS CO LTD

Inventor： IKUTA YOSHIAKI ,  KIKUGAWA SHINYA ,  MISHIRO HITOSHI ,  ARISHIMA HIROSHI ,  OKADA KANAME ,  MATSUMOTO KATSUHIRO

IPC: C03B33/08 ,  G03F1/62 ,  G03F1/14 ,  B24B7/24

CPC classification number: G03F1/62 ,  C03B33/082 ,  C03B2201/04

Abstract: A pellicle, characterized as having a pellicle sheet comprising a synthetic quartz glass which has an OH group concentration of 100 ppm or less and is substantially free from the presence of the defect of a reduced form. In particular, it is preferred that the synthetic quartz glass has an OH group concentration of 10 ppm or less and an internal transmittance at a wavelength of 157 nm of 80 %/cm or more.

Abstract translation: 其特征在于，具有由OH基浓度为100ppm以下且基本上不含缺氧缺陷的合成石英玻璃制成的防护薄片。 特别优选OH基浓度为10ppm以下，内部透射率为157nm以上至少80％/ cm 3。

公开(公告)号：EP1164629A4

公开(公告)日：2002-05-08

申请号：EP00911386

申请日：2000-03-27

Applicant: ASAHI GLASS CO LTD ,  SEMICONDUCTOR LEADING EDGE TEC

Inventor： OGAWA TOHRU ,  HOSONO HIDEO ,  KIKUGAWA SHINYA ,  IKUTA YOSHIAKI ,  MASUI AKIO ,  SHIMODAIRA NORIAKI ,  YOSHIZAWA SHUHEI

IPC: H01L21/027 ,  C03B20/00 ,  C03C3/06 ,  G03F1/60 ,  G03F7/20 ,  C03B8/04 ,  G03F1/14

CPC classification number: G03F7/70058 ,  G03F7/70241 ,  G03F7/70958

Abstract: An exposure apparatus including synthesis quartz glass for optical members, in which at least one of optical members constituting an exposure light source system, an illuminating optical system, a photomask, and a projection optical system has an absorption coefficient of 0.70 cm -1 or less at a wavelength of 157 nm and an infrared absorption peak at about 3640 cm-1 attributed to SiOH stretching vibration.