公开(公告)号：US20200278614A1

公开(公告)日：2020-09-03

申请号：US16762982

申请日：2018-11-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Roy WERKMAN ,  Bijoy RAJASEKHARAN ,  Lydia Marianna VERGAIJ-HUIZER ,  Jochem Sebastiaan WILDENBERG ,  Ronald VAN ITTERSUM ,  Pieter Gerardus Jacobus SMORENBERG ,  Robertus Wilhelmus VAN DER HEIJDEN ,  Xiuhong WEI ,  Hadi YAGUBIZADE

IPC: G03F7/20

Abstract: A method for determining a plurality of corrections for control of at least one manufacturing apparatus used in a manufacturing process for providing product structures to a substrate in a plurality of layers, the method including: determining the plurality of corrections including a correction for each layer, based on an actuation potential of the applicable manufacturing apparatus used in the formation of each layer, wherein the determining includes determining corrections for each layer simultaneously in terms of a matching parameter.

公开(公告)号：US20200026200A1

公开(公告)日：2020-01-23

申请号：US16495119

申请日：2018-03-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Jochem Sebastiaan WILDENBERG ,  Marinus JOCHEMSEN ,  Erik JENSEN ,  Erik Johannes Maria WALLERBOS ,  Cornelis Johannes RIJNIERSE ,  Bijoy RAJASEKHARAN ,  Roy WERKMAN ,  Jurgen Johannes Henerikus Maria SCHOONUS

IPC: G03F7/20

Abstract: A method for optimizing a sequence of processes for manufacturing of product units, includes: associating measurement results of performance parameters (e.g., fingerprints) with the recorded process characteristics (e.g., context); obtaining a characteristic (e.g., context) of a previous process (e.g. deposition) in the sequence already performed on a product unit; obtaining a characteristic (e.g., context) of a subsequent process (e.g., exposure) in the sequence to be performed on the product unit; determining a predicted performance parameter (e.g., fingerprint) of the product unit associated with the sequence of previous and subsequent processes by using the obtained characteristics to retrieve measurement results of the performance parameters (e.g., fingerprints) corresponding to the recorded characteristics; and determining corrections to be applied to future processes (e.g. exposure, etch) in the sequence to be performed on the product unit, based on the determined predicted performance parameter.

公开(公告)号：US20190285992A1

公开(公告)日：2019-09-19

申请号：US16463057

申请日：2017-11-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Richard Johannes Franciscus VAN HAREN ,  Victor Emanuel CALADO ,  Leon Paul VAN DIJK ,  Roy WERKMAN ,  Everhardus Cornelis MOS ,  Jochem Sebastiaan WILDENBERG ,  Marinus JOCHEMSEN ,  Bijoy RAJASEKHARAN ,  Erik JENSEN ,  Adam Jan URBANCZYK

IPC: G03F7/20

Abstract: A method to change an etch parameter of a substrate etching process, the method including: making a first measurement of a first metric associated with a structure on a substrate before being etched; making a second measurement of a second metric associated with a structure on a substrate after being etched; and changing the etch parameter based on a difference between the first measurement and the second measurement.

公开(公告)号：US20180067900A1

公开(公告)日：2018-03-08

申请号：US15558186

申请日：2016-03-25

Applicant: ASML Netherlands B.V.

Inventor： Everhardus Cornelis MOS ,  Velislava IGNATOVA ,  Erik JENSEN ,  Michael KUBIS ,  Hubertus Johannes Gertrudus SIMONS ,  Peter TEN BERGE ,  Erik Johannes Maria WALLERBOS ,  Jochem Sebastiaan WILDENBERG

IPC: G06F17/18 ,  G06F17/50 ,  G03F7/20

CPC classification number: G06F17/18 ,  G03F7/705 ,  G03F7/70508 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7003 ,  G06F17/5009 ,  H01L22/12 ,  H01L22/20

Abstract: A method including evaluating, with respect to a parameter representing remaining uncertainty of a mathematical model fitting measured data, one or more mathematical models for fitting measured data and one or more measurement sampling schemes for measuring data, against measurement data across a substrate, and identifying one or more mathematical models and/or one or more measurement sampling schemes, for which the parameter crosses a threshold.

公开(公告)号：US20180011398A1

公开(公告)日：2018-01-11

申请号：US15546583

申请日：2016-01-20

Applicant: ASML Netherlands B.V.

Inventor： Wim Tjibbo TEL ,  Marinus JOCHEMSEN ,  Frank STAALS ,  Christopher PRENTICE ,  Laurent Michel Marcel DEPRE ,  Johannes Marcus Maria BELTMAN ,  Roy WERKMAN ,  Jochem Sebastiaan WILDENBERG ,  Everhardus Cornelis MOS

IPC: G03F1/70 ,  G03F1/22 ,  G06T7/00

Abstract: A method includes determining topographic information of a substrate for use in a lithographic imaging system, determining or estimating, based on the topographic information, imaging error information for a plurality of points in an image field of the lithographic imaging system, adapting a design for a patterning device based on the imaging error information. In an embodiment, a plurality of locations for metrology targets is optimized based on imaging error information for a plurality of points in an image field of a lithographic imaging system, wherein the optimizing involves minimizing a cost function that describes the imaging error information. In an embodiment, locations are weighted based on differences in imaging requirements across the image field.

公开(公告)号：US20160334717A1

公开(公告)日：2016-11-17

申请号：US15111763

申请日：2014-11-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Jochem Sebastiaan WILDENBERG ,  Everhardus Cornelis MOS

IPC: G03F7/20 ,  G01B11/27

CPC classification number: G03F7/70775 ,  G01B11/272 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7003 ,  G03F9/7046

Abstract: A method of determining a measurement subset of metrology point locations which includes a subset of potential metrology point locations on a substrate. The method including identifying a plurality of candidate metrology point locations from the potential metrology point locations. A change in the level of informativity imparted by the measurement subset of metrology point locations which is attributable to the inclusion of that candidate metrology point location into the measurement subset of metrology point locations is evaluated for each of the candidate metrology point locations. The candidate metrology point locations which have the greatest increase in the level of informativity attributed thereto are selected for inclusion into the measurement subset of metrology point locations.

Abstract translation: 一种确定测量点位置的测量子集的方法，其包括衬底上的潜在测量点位置的子集。 该方法包括从潜在测量点位置识别多个候选测量点位置。 对于候选计量点位置中的每一个，评估归因于将该候选计量点位置包括在计量点位置的测量子集中的度量点位置的测量子集所赋予的信息水平的变化。 选择归因于其的信息水平增加最大的候选计量点位置以包含在度量点位置的测量子集中。