公开(公告)号：EP3449312A1

公开(公告)日：2019-03-06

申请号：EP17717149.3

申请日：2017-04-12

Applicant: ASML Netherlands B.V.

Inventor： NASALEVICH, Maxim, Aleksandrovich ,  ABEGG, Erik, Achilles ,  BANERJEE, Nirupam ,  BLAUW, Michiel, Alexander ,  BROUNS, Derk, Servatius, Gertruda ,  JANSSEN, Paul ,  KRUIZINGA, Matthias ,  LENDERINK, Egbert ,  MAXIM, Nicolae ,  NIKIPELOV, Andrey ,  NOTENBOOM, Arnoud, Willem ,  PILIEGO, Claudia ,  PÉTER, Mária ,  RISPENS, Gijsbert ,  SCHUH, Nadja ,  VAN DE KERKHOF, Marcus, Adrianus ,  VAN DER ZANDE, Willem, Joan ,  VAN ZWOL, Pieter-Jan ,  VERBURG, Antonius, Willem ,  VERMEULEN, Johannes, Petrus, Martinus, Bernardus ,  VLES, David, Ferdinand ,  VOORTHUIJZEN, Willem-Pieter ,  ZDRAVKOV, Alexandar, Nikolov

IPC: G03F1/24 ,  G03F1/62 ,  G03F7/20

公开(公告)号：EP3391139A1

公开(公告)日：2018-10-24

申请号：EP16806058.0

申请日：2016-12-02

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： VLES, David, Ferdinand ,  ABEGG, Erik, Achilles ,  BENDIKSEN, Aage ,  BROUNS, Derk, Servatius, Gertruda ,  GOVIL, Pradeep K. ,  JANSSEN, Paul ,  NASALEVICH, Maxim, Aleksandrovich ,  NOTENBOOM, Arnoud, Willem ,  PÉTER, Mária ,  VAN DE KERKHOF, Marcus, Adrianus ,  VAN DER ZANDE, Willem, Joan ,  VAN ZWOL, Pieter-Jan ,  VERMEULEN, Johannes, Petrus, Martinus, Bernardus ,  VOORTHUIJZEN, Willem-Pieter ,  WILEY, James, Norman

IPC: G03F1/62 ,  G03F7/20 ,  G03F1/22

CPC classification number: G03F1/64 ,  G03F1/22 ,  G03F1/62 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70983

Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle includes at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle.

公开(公告)号：EP3701331A1

公开(公告)日：2020-09-02

申请号：EP18759321.5

申请日：2018-08-28

Applicant: ASML Netherlands B.V.

Inventor： DUYS, Anton Wilhelmus ,  NASALEVICH, Maxim Aleksandrovich ,  NOTENBOOM, Arnoud Willem ,  PÉTER, Mária ,  VAN ZWOL, Pieter-Jan ,  VLES, David, Ferdinand

IPC: G03F1/64 ,  G03F1/00

公开(公告)号：EP4022392A1

公开(公告)日：2022-07-06

申请号：EP20765216.5

申请日：2020-08-20

Applicant: ASML Netherlands B.V.

Inventor： NIKIPELOV, Andrey ,  BALTUSSEN, Sander ,  BANINE, Vadim, Yevgenyevich ,  DOLGOV, Alexandr ,  DONMEZ NOYAN, Inci ,  HOUWELING, Zomer, Silvester ,  NOTENBOOM, Arnoud, Willem ,  VAN DE KERKHOF, Marcus, Adrianus ,  VAN DER WOORD, Ties, Wouter ,  VERMEULEN, Paul, Alexander ,  VLES, David, Ferdinand ,  VORONINA, Victoria ,  YEGEN, Halil, Gökay

IPC: G03F1/62 ,  G03F7/20 ,  C01B32/158 ,  D01F9/12 ,  D01F11/12

公开(公告)号：EP3811151A1

公开(公告)日：2021-04-28

申请号：EP19728916.8

申请日：2019-05-29

Applicant: ASML Netherlands B.V.

Inventor： NASALEVICH, Maxim, Aleksandrovich ,  KLEIN, Alexander, Ludwig ,  KURGANOVA, Evgenia ,  NOTENBOOM, Arnoud, Willem ,  VAN ZWOL, Pieter-Jan ,  VLES, David, Ferdinand

IPC: G03F1/62 ,  G03F1/22 ,  G03F7/20

公开(公告)号：EP3365730A2

公开(公告)日：2018-08-29

申请号：EP16788043.4

申请日：2016-10-11

Applicant: ASML Netherlands B.V.

Inventor： PÉTER, Mária ,  ABEGG, Erik Achilles ,  GIESBERS, Adrianus Johannes Maria ,  KLOOTWIJK, Johan Hendrik ,  NASALEVICH, Maxim Aleksandrovich ,  VAN DEN EINDEN, Wilhelmus Theodorus Anthonius Johannes ,  VAN DER ZANDE, Willem Joan ,  VAN ZWOL, Pieter-Jan ,  VERMEULEN, Johannes Petrus Martinus Bernardus ,  VLES, David, Ferdinand ,  VOORTHUIJZEN, Willem-Pieter

IPC: G03F7/20 ,  B01D67/00 ,  G03F1/62 ,  G21K1/06

CPC classification number: G03F7/70958 ,  G03F1/62 ,  G03F7/70983 ,  G21K2201/067

Abstract: Methods of manufacturing a pellicle for a lithographic apparatus are disclosed. In one arrangement the method comprises depositing at least one graphene layer on a planar surface of a substrate. The substrate comprises a first substrate portion and a second substrate portion. The method further comprises removing the first substrate portion to form a freestanding membrane from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.

公开(公告)号：EP4202545A1

公开(公告)日：2023-06-28

申请号：EP23157200.9

申请日：2017-04-12

Applicant: ASML Netherlands B.V.

Inventor： NASALEVICH, Maxim, Aleksandrovich ,  ABEGG, Erik, Achilles ,  BROUNS, Derk, Servatius, Gertruda ,  JANSSEN, Paul ,  KRUIZINGA, Matthias ,  NIKIPELOV, Andrey, ,  PÉTER, Mária ,  SCHUH, Nadja ,  VAN DE KERKHOF, Marcus, Adrianus ,  VAN DER ZANDE, Willem, Joan ,  VAN ZWOL, Pieter-Jan ,  VERBURG, Antonius, Willem ,  VERMEULEN, Johannes, Petrus, Martinus, Bernardus ,  VLES, David, Ferdinand ,  VOORTHUIJZEN, Willem-Pieter ,  BANERJEE, Nirupam ,  BLAUW, Michiel, Alexander ,  LENDERINK, Egbert ,  MAXIM, Nicolae ,  NOTENBOOM, Arnoud, Willem ,  PILIEGO, Claudia ,  RISPENS, Gijsbert ,  ZDRAVKOV, Alexandar, Nikolov

IPC: G03F1/24 ,  G03F1/62 ,  G03F7/20 ,  G02B5/20 ,  G03B27/72 ,  G03F1/82

Abstract: The invention concerns a membrane for EUV lithography. The membrane comprises a base layer. The base layer comprises one or more of the following: a stable stoichiometry of Mo and Si, a stable stoichiometry of Ru and Si, a stable stoichiometry of Zr and Si, a stable stoichiometry of La and Si, a stable stoichiometry of Y and Si, and a stable stoichiometry of Nb and Si. The membrane further comprises a capping layer providing an outer surface of the membrane. The invention further concerns a pellicle assembly comprising the membrane of the invention, a patterning device assembly comprising the pellicle assembly of the invention, and a dynamic gas lock assembly comprising the membrane of the invention.

公开(公告)号：EP3639091A2

公开(公告)日：2020-04-22

申请号：EP18728409.6

申请日：2018-06-08

Applicant: ASML Netherlands B.V.

Inventor： VLES, David, Ferdinand ,  ANDE, Chaitanya Krishna ,  DE GROOT, Antonius, Franciscus, Johannes ,  GIESBERS, Adrianus, Johannes, Maria ,  JANSSEN, Johannes, Joseph ,  JANSSEN, Paul ,  KLOOTWIJK, Johan, Hendrik ,  KNAPEN, Peter, Simon, Antonius ,  KURGANOVA, Evgenia ,  MEIJER, Marcel, Peter ,  MEIJERINK, Wouter, Rogier ,  NASALEVICH, Maxim, Aleksandrovich ,  NOTENBOOM, Arnoud, Willem ,  OLSMAN, Raymond ,  PATEL, Hrishikesh ,  PETER, Maria ,  VAN DEN BOSCH, Gerrit ,  VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes ,  VAN DER ZANDE, Willem, Joan ,  VAN ZWOL, Pieter-Jan ,  VERMEULEN, Johannes, Petrus, Martinus, Bernardus ,  VOORTHUIJZEN, Willem-Pieter ,  WONDERGEM, Hendrikus, Jan ,  ZDRAVKOV, Alexandar, Nikolov

IPC: G03F1/62 ,  G03F1/64

公开(公告)号：EP3345053A1

公开(公告)日：2018-07-11

申请号：EP16757252.8

申请日：2016-08-26

Applicant: ASML Netherlands B.V.

Inventor： HOUWELING, Zomer, Silvester ,  CASIMIRI, Eric, Willem, Felix ,  DRUZHININA, Tamara ,  JANSSEN, Paul ,  KUIJKEN, Michael, Alfred, Josephus ,  LEENDERS, Martinus, Hendrikus, Antonius ,  OOSTERHOFF, Sicco ,  PÉTER, Mária ,  VAN DER ZANDE, Willem, Joan ,  VAN ZWOL, Pieter-Jan ,  VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien ,  VERMEULEN, Johannes, Petrus, Martinus, Bernardus ,  VLES, David, Ferdinand ,  VOORTHUIJZEN, Willem-Pieter

IPC: G03F1/62

CPC classification number: G03F1/62 ,  G03F7/70983

Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.