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    Container for a mask, method of transferring lithographic masks therein and method of scanning a mask in a container
    22.
    发明专利
    Container for a mask, method of transferring lithographic masks therein and method of scanning a mask in a container 未知

    公开(公告)号：SG121854A1

    公开(公告)日：2006-05-26

    申请号：SG200307732

    申请日：2003-12-26

    Applicant: ASML NETHERLANDS BV

    Inventor： BOTMA HAKO

    IPC: B65D85/38 ,  B65G49/06 ,  G03F1/66 ,  G03F7/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/673 ,  H01L21/677

    Abstract: A mask transport system is configured to transport a mask into and out of a lithographic apparatus. The mask transport system includes a first container configured to shield a top side and a bottom side of the mask. At least a portion of the container is at least partially translucent for radiation having a predetermined wavelength used to detect contamination on the top side or the bottom side of the mask when the mask is shielded by the first container. The mask transport system also includes a second container configured to enclose the first container. The second container includes a first part defining a first opening and an openable cover that covers the first opening. The cover is configured to open and release the first container within the lithographic apparatus or at an interface with the lithographic apparatus.

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