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1.
公开(公告)号:NL2011762A
公开(公告)日:2014-01-13
申请号:NL2011762
申请日:2013-11-08
Applicant: ASML NETHERLANDS BV
Inventor: SCHOOT JAN , EURLINGS MARKUS , KREUWEL HERMANUS
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公开(公告)号:NL2009352A
公开(公告)日:2013-03-25
申请号:NL2009352
申请日:2012-08-23
Applicant: ASML NETHERLANDS BV
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公开(公告)号:NL2007629A
公开(公告)日:2011-11-23
申请号:NL2007629
申请日:2011-10-20
Applicant: ASML NETHERLANDS BV
Inventor: VRIES GOSSE , SCHOOT JAN , JANSSEN FRANCISCUS , AERLE NICOLAAS
IPC: G03F7/20
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公开(公告)号:NL2006604A
公开(公告)日:2011-06-09
申请号:NL2006604
申请日:2011-04-14
Applicant: ASML NETHERLANDS BV
Inventor: BANINE VADIM , BOEIJ WILHELMUS , DIJSSELDONK ANTONIUS , LOOPSTRA ERIK , MOORS ROEL , SCHOOT JAN , SWINKELS GERARDUS , YAKUNIN ANDREI
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公开(公告)号:NL2008250A
公开(公告)日:2012-09-11
申请号:NL2008250
申请日:2012-02-07
Applicant: ASML NETHERLANDS BV
Inventor: NIENHUYS HAN-KWANG , CUIJPERS MARTINUS , LEVASIER LEON , SCHOOT JAN , VIJVER YURI , VOZNYI OLEG , JANSSEN FRANCISCUS , PHILIPS DANNY , MIRANDA MARCIO , GALAKTIONOV OLEKSIY , BAL KURSAT , SCHMITZ ROGER , LEROUX ALAIN , RANJAN MANISH , RIJPMA ALBERT
IPC: G03F7/20
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公开(公告)号:NL2005771A
公开(公告)日:2011-06-30
申请号:NL2005771
申请日:2010-11-29
Applicant: ASML NETHERLANDS BV
Inventor: BOEIJ WILHELMUS , LOOPSTRA ERIK , MICKAN UWE , SCHOOT JAN , VRIES GOSSE
IPC: G03F7/20
Abstract: An illumination system includes a field-facet mirror-device and a pupil mirror configured to condition a beam of radiation incident on the field-facet mirror-device. The field-facet mirror-device includes reflective field facets movable between first and second orientations relative to the incident beam. The field facets in their first orientations are effective to reflect the incident radiation towards respective reflective pupil facets so as to form part of a conditioned beam reflected from the pupil-facet mirror-device. The field facets in their second orientations are effective to reflect the incident radiation onto respective areas of the pupil-facet mirror-device designated as beam dump areas. The areas are arranged to prevent radiation incident on the areas from forming part of the conditioned beam and are arranged between the limits of an annular area on the pupil-facet mirror-device effective to define the inner and outer regions of the conditioned beam reflected from the pupil-facet mirror-device.
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公开(公告)号:NL2003223A
公开(公告)日:2010-03-31
申请号:NL2003223
申请日:2009-07-17
Applicant: ASML NETHERLANDS BV
Inventor: LOOPSTRA ERIK , BOEIJ WILHELMUS , BUTLER HANS , JONGH ROBERTUS , SCHOOT JAN , SENGERS TIMOTHEUS , WIJCKMANS MAURICE , JANSSEN FRANCISCUS
IPC: G03F7/20
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公开(公告)号:NL2011580A
公开(公告)日:2014-05-08
申请号:NL2011580
申请日:2013-10-10
Applicant: ASML NETHERLANDS BV
Inventor: LOOPSTRA ERIK , YAKUNIN ANDREI , BANINE VADIM , NIKIPELOV ANDREY , OSORIO OLIVEROS EDGAR , STRUYCKEN ALEXANDER , DRIE NHUIZEN BERT , SCHOOT JAN
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公开(公告)号:NL2010108A
公开(公告)日:2013-07-22
申请号:NL2010108
申请日:2013-01-10
Applicant: ASML NETHERLANDS BV
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10.
公开(公告)号:NL2004429A
公开(公告)日:2011-02-28
申请号:NL2004429
申请日:2010-03-18
Applicant: ASML NETHERLANDS BV
Inventor: VRIES GOSSE , BUIS EDWIN , DAM MARINUS , SCHOOT JAN , BOON FIDELUS , KREUWEL HERMANUS
IPC: G03F7/20
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