公开(公告)号：NL2007439A

公开(公告)日：2012-04-23

申请号：NL2007439

申请日：2011-09-19

Applicant: ASML NETHERLANDS BV

Inventor： BOXTEL FRANK ,  DAM MARINUS ,  JASPER JOHANNES ,  HAM RONALD ,  SHULEPOV SERGEI ,  PIETERSE GERBEN ,  BARAGONA MARCO ,  DEBRAUWER PIETER ,  STEEN ANTONIUS

IPC: G03F7/20

Abstract: A gas manifold to direct a gas flow between two plates of an optical component of a lithographic apparatus, the gas manifold having an inlet, a diffuser downstream of the inlet, a flow straightener downstream of the inlet, a contractor downstream of the flow straightener, and an outlet downstream of the contractor.

公开(公告)号：NL2004429A

公开(公告)日：2011-02-28

申请号：NL2004429

申请日：2010-03-18

Applicant: ASML NETHERLANDS BV

Inventor： VRIES GOSSE ,  BUIS EDWIN ,  DAM MARINUS ,  SCHOOT JAN ,  BOON FIDELUS ,  KREUWEL HERMANUS

IPC: G03F7/20

公开(公告)号：NL2011457A

公开(公告)日：2014-04-16

申请号：NL2011457

申请日：2013-09-17

Applicant: ASML NETHERLANDS BV

Inventor： SCHOOT JAN ,  BOTMA HAKO ,  DAM MARINUS ,  HOL SVEN ANTOIN JOHAN ,  BUIS EDWIN ,  VRIES GOSSE ,  REKKERS ERIK

IPC: G03F7/20 ,  H01L21/68