公开(公告)号：NL2004787A

公开(公告)日：2011-01-04

申请号：NL2004787

申请日：2010-05-31

Applicant: ASML NETHERLANDS BV

Inventor： JAK MARTIN ,  SOER WOUTER

IPC: G02B5/20 ,  G03F7/20

公开(公告)号：NL2004417A

公开(公告)日：2010-10-26

申请号：NL2004417

申请日：2010-03-17

Applicant: ASML NETHERLANDS BV

Inventor： SOER WOUTER ,  JAK MARTIN

IPC: G03F7/20

Abstract: A collector assembly for use in a laser-produced plasma extreme ultraviolet radiation source for use in lithography has a collector body having a collector mirror and a window in the collector body. The window is transmissive to excitation radiation, which may be an infrared laser beam, so that it can pass through the window to excite the plasma, and the window has an EUV minor on its surface which is also transmissive to the excitation beam but which can reflect EUV generated by the plasma to the collector location of the collector mirror. The window may improve the collection efficiency and reduce non-uniformity in the image at the collector location. Radiation sources, lithographic apparatus and device manufacturing methods may make use of the collector.

公开(公告)号：NL2003303A

公开(公告)日：2010-03-11

申请号：NL2003303

申请日：2009-07-29

Applicant: ASML NETHERLANDS BV

Inventor： SOER WOUTER ,  HERPEN MAARTEN ,  JAK MARTIN

IPC: G03F7/20 ,  G21K1/06

Abstract: A spectral purity filter includes an aperture. The spectral purity filter is configured to enhance the spectral purity of a radiation beam by being configured to absorb radiation of a first wavelength and allow at least a portion of radiation of a second wavelength to transmit through the aperture. The first wavelength is larger than the second wavelength. The spectral purity filter may be used to improve the spectral purity of an Extreme Ultra-Violet (EUV) radiation beam.

公开(公告)号：NL2003158A1

公开(公告)日：2010-01-12

申请号：NL2003158

申请日：2009-07-09

Applicant: ASML NETHERLANDS BV

Inventor： SOER WOUTER ,  HERPEN MAARTEN VAN ,  BANINE VADIM ,  YAKUNIN ANDREY ,  JAK MARTIN

IPC: G03F7/20 ,  G02B5/20