-
公开(公告)号：US09785055B2
公开(公告)日：2017-10-10
申请号：US14399137
申请日：2013-05-07
Applicant: ASML Netherlands B.V.
Inventor： Thibault Simon Mathieu Laurent , Johannes Henricus Wilhelmus Jacobs , Wilhelmus Franciscus Johannes Simons , Martijn Houben , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Han Henricus Aldegonda Lempens , Rogier Hendrikus Magdalena Cortie , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Siegfried Alexander Tromp , Theodorus Wilhelmus Polet , Jim Vincent Overkamp , Van Vuong Vy
CPC classification number: G03F7/70341 , G03F7/70716 , G03F7/70875 , G03F7/7095 , H01L21/682
Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.
-
公开(公告)号：US09753382B2
公开(公告)日：2017-09-05
申请号：US14397126
申请日：2013-03-19
Applicant: ASML Netherlands B.V.
Inventor： Thibault Simon Mathieu Laurent , Johannes Henricus Wilhelmus Jacobs , Haico Victor Kok , Yuri Johannes Gabriël Van De Vijver , Johannes Antonius Maria Van De Wal , Bastiaan Andreas Wilhelmus Hubertus Knarren , Robbert Jan Voogd , Jan Steven Christiaan Westerlaken , Johannes Hubertus Antonius Van De Rijdt , Allard Eelco Kooiker , Wilhelmina Margareta Jozef Hurkens-Mertens , Yohann Bruno Yvon Teillet
CPC classification number: G03F7/7085 , G03F7/70341 , G03F7/70666 , G03F7/70858 , G03F7/70891
Abstract: A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.
-
公开(公告)号：US20150077728A1
公开(公告)日：2015-03-19
申请号：US14397126
申请日：2013-03-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Thibault Simon Mathieu Laurent , Johannes Henricus Wilhelmus Jacobs , Haico Victor Kok , Yuri Johannes Gabriël Van De Vijver , Johannes Antonius Maria Van De Wal , Bastiaan Andreas Wilhelmus Hubertus Knarren , Robbert Jan Voogd , Jan Steven Christiaan Westerlaken , Johannes Hubertus Antonius Van De Rijdt , Allard Eelco Kooiker , Wilhelmina Margareta Jozef Hurkens-Mertens , Yohann Bruno Yvon Teillet
IPC: G03F7/20
CPC classification number: G03F7/7085 , G03F7/70341 , G03F7/70666 , G03F7/70858 , G03F7/70891
Abstract: A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.
Abstract translation: 用于浸没式光刻设备的传感器，并且在使用中与浸入液体接触的布置使得从传感器的换能器到温度调节装置的第一热路的热阻小于 从换能器到浸液的第二热流路的热阻。 因此，热流优先朝向温度调节装置，而不是浸没液体，使得浸没液体中的温度引起的干扰减小或最小化。
-
24.发明公开公开(公告)号：US20230280663A1
公开(公告)日：2023-09-07
申请号：US18316262
申请日：2023-05-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Johan Gertrudis Cornelis KUNNEN , Martijn Houben , Thibault Simon Mathieu Laurent , Hendrikus Johannes Marinus Van Abeelen , Armand Rosa Jozef Dassen , Sander Catharina Reinier Derks
IPC: G03F7/20 , H01L21/68 , H01L21/687
CPC classification number: G03F7/70716 , G03F7/70875 , H01L21/68 , G03F7/707 , H01L21/6875
Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
-
25.发明授权公开(公告)号：US11650511B2
公开(公告)日：2023-05-16
申请号：US16993896
申请日：2020-08-14
Applicant: ASML NETHERLANDS B.V.
Inventor： Johan Gertrudis Cornelis Kunnen , Martijn Houben , Thibault Simon Mathieu Laurent , Hendrikus Johannes Marinus Van Abeelen , Armand Rosa Jozef Dassen , Sander Catharina Reinier Derks
IPC: G03F7/20 , H01L21/68 , H01L21/687
CPC classification number: G03F7/70716 , G03F7/707 , G03F7/70875 , H01L21/68 , H01L21/6875
Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
-
Patent Agency Ranking
公开(公告)号：US11630399B2
公开(公告)日：2023-04-18
申请号：US17698100
申请日：2022-03-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas Ten Kate , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Robbert Jan Voogd , Giovanni Francisco Nino , Marinus Jan Remie , Johannes Henricus Wilhelmus Jacobs , Thibault Simon Mathieu Laurent , Johan Gertrudis Cornelis Kunnen
IPC: G03F7/20
Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
-
27.发明授权公开(公告)号：US11300890B2
公开(公告)日：2022-04-12
申请号：US16722924
申请日：2019-12-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Johan Gertrudis Cornelis Kunnen , Johannes Henricus Wilhelmus Jacobs , Coen Cornelis Wilhelmus Verspaget , Ronald Van Der Ham , Ivo Adam Johannes Thomas , Martijn Houben , Thibault Simon Mathieu Laurent , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Pieter Lein Joseph Gunter , Marinus Jan Remie , Sander Catharina Reinier Derks
IPC: G03F7/20
Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.
-
公开(公告)号：US11175594B2
公开(公告)日：2021-11-16
申请号：US16617242
申请日：2018-05-03
Applicant: ASML NETHERLANDS B.V.
Inventor： Giovanna De Simone , Marco Adrianus Peter Van Den Heuvel , Thibault Simon Mathieu Laurent , Ruud Hendrikus Martinus Johannes Bloks , Niek Jacobus Johannes Roset , Justin Johannes Hermanus Gerritzen
IPC: G03F7/20
Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.
-
公开(公告)号：US10203611B2
公开(公告)日：2019-02-12
申请号：US15818232
申请日：2017-11-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Thibault Simon Mathieu Laurent , Gerardus Adrianus Antonius Maria Kusters , Bastiaan Andreas Wilhelmus Hubertus Knarren , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Takeshi Kaneko , Robbert Jan Voogd , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Johan Gertrudis Cornelis Kunnen , Ramin Badie
IPC: G03F7/20
Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
-
公开(公告)号：US10114295B2
公开(公告)日：2018-10-30
申请号：US15520193
申请日：2015-10-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Günes Nakiboglu , Jan Steven Christiaan Westerlaken , Frank Johannes Jacobus Van Boxtel , Maria del Carmen Mercado , Thibault Simon Mathieu Laurent
Abstract: A lithographic apparatus including: a projection system to project radiation onto a substrate supported on a substrate stage, during an exposure phase; a sensing system to sense a property of the substrate on the stage during a sensing phase; and a positioning system to determine a position of the stage relative to a reference system via a radiation path between the stage and the reference system, wherein the apparatus is configured to control stage movement relative to the reference system in the sensing phase and to control other movement relative to the reference system during the exposure phase; the stage or reference system having an outlet to provide a gas curtain to reduce ingress of ambient gas into the path; and the apparatus is operative such that a characteristic of the gas curtain is different in at least part of the sensing phase compared to in the exposure phase.
-
-
-
-
-
-
-
-
-
Search Results
40
records
(took 0.049 seconds)
