公开(公告)号：FI873805A0

公开(公告)日：1987-09-02

申请号：FI873805

申请日：1987-09-02

Applicant: BASF AG

Inventor： KURTZ KARL-RUDOLF ,  KOCH HORST ,  SCHULZ GUENTHER

IPC: C08F291/02 ,  C08F291/00 ,  C08K5/00 ,  C08K5/01 ,  C08L21/00 ,  G03F7/00 ,  G03F7/004 ,  G03F7/027 ,  G03F

公开(公告)号：DK555086A

公开(公告)日：1987-05-22

申请号：DK555086

申请日：1986-11-20

Applicant: BASF AG

Inventor： HOFFMANN GERHARD ,  KOCH HORST ,  SCHULZ GUENTHER

IPC: G03F7/032 ,  C08G65/32 ,  G03F7/00 ,  G03F7/033 ,  G03C1/00

Abstract: The invention relates to a novel photosensitive recording material which can be developed in aqueous solvents after its imagewise irradiation with actinic light and which consists essentially of a dimensionally stable base (A) and of a photosensitive recording layer (B). The said photosensitive recording layer (B) contains from about 48 to about 85% by weight, based on the photosensitive recording layer (B) of one or more elastomeric graft copolymers (B1) which are selected from the group consisting of polyalkylene oxide - vinyl ester - graft copolymers whose vinyl ester structural units have been hydrolyzed to a degree of not less 50 mol.-% from about 0.01 to about 10% by weight, based on the photosensitive recording layer (B), of one or more photoinitiators (B2), and from about 5 to about 30% by weight, based on the photosensitive recording layer (B), of one or more photopolymerizable monomers (B3). In addition to these components, the photosensitive recording layer (B) might contain further assistants or additives. The novel photosensitive recording material is especially well suited for the production of lithographic printing plates, resists and relief plates, in particular relief printing plates. The invention is furthermore related to a process for preparing the novel photosensitive recording material by polymerizing vinylesters in the presence of polyalkylene oxides to yield polyalkylene oxide - vinylester - graft copolymers, hydrolyzing or transesterifying said polyalkylene oxide - vinylester - graft copolymers to yield the said elastomeric graft copolymer (B1), mixing the said elastomeric graft copolymers (B1) with the other components of the photosensitive recording layer (B), and forming the said photosensitive recording layer (B) from the mixture consisting of its components on the dimensionally stable base (A).

公开(公告)号：AU6079486A

公开(公告)日：1987-02-05

申请号：AU6079486

申请日：1986-08-01

Applicant: BASF AG

Inventor： KOCH HORST ,  LOERZER THOMAS ,  BOETTCHER ANDREAS ,  SCHULZ GUENTHER ,  SCHWALM REINHOLD

IPC: C07D213/89 ,  C07D405/12 ,  C08F2/48 ,  C08F2/50 ,  G03F7/004 ,  G03F7/025 ,  G03F7/027 ,  G03F7/038 ,  C07D221/08 ,  C07D241/12 ,  C07D417/06 ,  C07F9/58 ,  G03C1/70

公开(公告)号：DK555086D0

公开(公告)日：1986-11-20

申请号：DK555086

申请日：1986-11-20

Applicant: BASF AG

Inventor： HOFFMANN GERHARD ,  KOCH HORST ,  SCHULZ GUENTHER

IPC: G03F7/032 ,  C08G65/32 ,  G03F7/00 ,  G03F7/033 ,  G03C

Abstract: The invention relates to a novel photosensitive recording material which can be developed in aqueous solvents after its imagewise irradiation with actinic light and which consists essentially of a dimensionally stable base (A) and of a photosensitive recording layer (B). The said photosensitive recording layer (B) contains from about 48 to about 85% by weight, based on the photosensitive recording layer (B) of one or more elastomeric graft copolymers (B1) which are selected from the group consisting of polyalkylene oxide - vinyl ester - graft copolymers whose vinyl ester structural units have been hydrolyzed to a degree of not less 50 mol.-% from about 0.01 to about 10% by weight, based on the photosensitive recording layer (B), of one or more photoinitiators (B2), and from about 5 to about 30% by weight, based on the photosensitive recording layer (B), of one or more photopolymerizable monomers (B3). In addition to these components, the photosensitive recording layer (B) might contain further assistants or additives. The novel photosensitive recording material is especially well suited for the production of lithographic printing plates, resists and relief plates, in particular relief printing plates. The invention is furthermore related to a process for preparing the novel photosensitive recording material by polymerizing vinylesters in the presence of polyalkylene oxides to yield polyalkylene oxide - vinylester - graft copolymers, hydrolyzing or transesterifying said polyalkylene oxide - vinylester - graft copolymers to yield the said elastomeric graft copolymer (B1), mixing the said elastomeric graft copolymers (B1) with the other components of the photosensitive recording layer (B), and forming the said photosensitive recording layer (B) from the mixture consisting of its components on the dimensionally stable base (A).

公开(公告)号：PL312809A1

公开(公告)日：1996-08-19

申请号：PL31280996

申请日：1996-02-14

Applicant: BASF AG

Inventor： SCHLARB BERNARD ,  SCHUPO EBERHARD ,  RAU MARIA GYOPAR ,  SCHULZ GUENTHER ,  WIESE HARM

IPC: C08F2/22 ,  C08F2/30 ,  C08F220/06 ,  C08F220/12 ,  C08F222/02 ,  C09D109/00 ,  C09D123/00 ,  C09D125/02 ,  C09D127/00 ,  C09D131/02 ,  C09D133/06 ,  C09D133/18 ,  C09D157/00 ,  C09J157/00 ,  D06M15/00

Abstract: Aq. polymer dispersions, obtd. by radical polymerisation of monomers in aq. emulsion in presence of a polymeric protective colloid (A) with an average mol. wt. (Mw) of >20,000. Colloid (A) is a copolymer of 5-50 wt. % unsatd. monomer(s) with acid or acid anhydride gp(s). (monomers I), 0.1-80 wt.% (meth)acrylate ester(s) of at least 10C aliphatic alcohols (monomers II), 0-94.9 wt.% "principal monomers", comprising 1-9C alkyl (meth)acrylates, vinyl esters of 1-20C carboxylic acids, up to 20C vinylaromatics, unsatd. nitriles, vinyl halides and/or 2-8C aliphatic hydrocarbons with 1 or 2 double bonds (monomers III) and 0-60 wt.% other monomers (IV). Also claimed is the above process for the prodn. of aq. polymer dispersions.

公开(公告)号：DK160907B

公开(公告)日：1991-04-29

申请号：DK555086

申请日：1986-11-20

Applicant: BASF AG

Inventor： HOFFMANN GERHARD ,  KOCH HORST ,  SCHULZ GUENTHER

IPC: G03F7/032 ,  C08G65/32 ,  G03F7/00 ,  G03F7/033

Abstract: The invention relates to a novel photosensitive recording material which can be developed in aqueous solvents after its imagewise irradiation with actinic light and which consists essentially of a dimensionally stable base (A) and of a photosensitive recording layer (B). The said photosensitive recording layer (B) contains from about 48 to about 85% by weight, based on the photosensitive recording layer (B) of one or more elastomeric graft copolymers (B1) which are selected from the group consisting of polyalkylene oxide - vinyl ester - graft copolymers whose vinyl ester structural units have been hydrolyzed to a degree of not less 50 mol.-% from about 0.01 to about 10% by weight, based on the photosensitive recording layer (B), of one or more photoinitiators (B2), and from about 5 to about 30% by weight, based on the photosensitive recording layer (B), of one or more photopolymerizable monomers (B3). In addition to these components, the photosensitive recording layer (B) might contain further assistants or additives. The novel photosensitive recording material is especially well suited for the production of lithographic printing plates, resists and relief plates, in particular relief printing plates. The invention is furthermore related to a process for preparing the novel photosensitive recording material by polymerizing vinylesters in the presence of polyalkylene oxides to yield polyalkylene oxide - vinylester - graft copolymers, hydrolyzing or transesterifying said polyalkylene oxide - vinylester - graft copolymers to yield the said elastomeric graft copolymer (B1), mixing the said elastomeric graft copolymers (B1) with the other components of the photosensitive recording layer (B), and forming the said photosensitive recording layer (B) from the mixture consisting of its components on the dimensionally stable base (A).

公开(公告)号：AU6117690A

公开(公告)日：1991-02-28

申请号：AU6117690

申请日：1990-08-21

Applicant: BASF AG

Inventor： SEITZ FRIEDRICH ,  BECK ERICH ,  ROSER JOACHIM ,  BUESCHGES ELEONORE ,  SCHULZ GUENTHER ,  ZWEZ THOMAS

IPC: C08F2/46 ,  C08F2/54 ,  C08F290/00 ,  C08F299/00 ,  C08G18/67 ,  G03F7/027 ,  G03F7/038 ,  G03F7/039

Abstract: The invention relates to a photosensitive positive-working mixture which consists of (a) an ethylenically unsaturated reaction product containing urea and urethane groups, (b) at least one organic compound containing one or more carboxyl groups, (c) optionally, a photoinitiator or photoinitiator system, and (d) optionally, further additives and auxiliaries. w

公开(公告)号：ES2014962B3

公开(公告)日：1990-08-01

申请号：ES86113884

申请日：1986-10-07

Applicant: BASF AG

Inventor： KUD ALEXANDER ,  SCHULZ GUENTHER ,  TRIESELT WOLFGANG ,  HARTMANN HEINRICH

IPC: D06L1/12 ,  C11D3/00 ,  C11D3/37 ,  D06M13/02 ,  D06M13/224 ,  D06M15/53 ,  D06M101/00 ,  D06M101/16

公开(公告)号：FI892010A

公开(公告)日：1989-10-28

申请号：FI892010

申请日：1989-04-27

Applicant: BASF AG

Inventor： NICK BERNHARD ,  SCHULZ GUENTHER

IPC: G03F7/00 ,  G03F7/021 ,  B41C

公开(公告)号：FI892821A0

公开(公告)日：1989-06-08

申请号：FI892821

申请日：1989-06-08

Applicant: BASF AG

Inventor： BOTT KASPAR ,  NICK BERNHARD ,  SCHULZ GUENTHER

IPC: C07D231/12 ,  C07D261/08 ,  C08F20/60 ,  C07D

Abstract: The invention relates to novel 4-[(meth)acrylamidomethyl]pyrazoles and isoxazoles of the general formula (I) in which R denotes a hydrogen atom or a methyl group; R denotes a hydrogen atom, a methyl group or an ethyl group; R and R denotes an alkyl group having 1 to 6 C atoms or an unsubstituted or substituted aryl group having 6 to 20 C atoms, where R and R can be identical to or different from one another; X denotes an oxygen atom or an NR group in which R stands for a hydrogen atom or a radical having the meaning of R or R . The invention in addition relates to a process for the preparation of the 4-[(meth)acrylamidomethyl]pyrazoles and -isoxazoles of the general formula (I) and the use of these compounds, in particular for polymerisation and preparation of homo- and copolymers.