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Patent Agency Ranking
公开(公告)号：PL3729554T3
公开(公告)日：2022-07-11
申请号：PL18812182
申请日：2018-12-10
Applicant: BASF SE
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公开(公告)号：AU2018391413A1
公开(公告)日：2020-06-11
申请号：AU2018391413
申请日：2018-12-10
Applicant: BASF SE
Inventor： ROHDE WOLFGANG , ZEILINGER MICHAEL , ADERMANN TORBEN , WEIGUNY SABINE , SEELER FABIAN , SCHIERLE-ARNDT KERSTIN , RYLL THOMAS MICHAEL
Abstract: Process for the recovery of transition metal from cathode active materials containing nickel and lithium, wherein said process comprises the steps of (a) treating a lithium containing transition metal oxide material with a leaching agent (preferably an acid selected from sulfuric acid, hydrochloric acid, nitric acid, methanesulfonic acid, oxalic acid and citric acid), (b) adjusting the pH value to 2.5 to 8, and (c) treating the solution obtained in step (b)with metallic nickel, cobalt or manganese or a combination of at least two of the foregoing.
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公开(公告)号：CA3113941A1
公开(公告)日：2020-04-23
申请号：CA3113941
申请日：2019-10-08
Applicant: BASF SE
Inventor： ROHDE WOLFGANG , BAYER DOMNIK , ADERMANN TORBEN
IPC: C25C1/08 , C22B3/00 , C22B7/00 , C22B15/00 , C22B23/00 , C22B26/12 , C22B47/00 , C25C1/12 , C25C7/00
Abstract: The present invention relates to a process for the recovery of transition metals from batteries comprising treating a transition metal material with a leaching agent to yield a leach which contains dissolved copper impurities, and depositing the dissolved copper impurities as elemental copper on a particulate deposition cathode by electrolysis of an electrolyte containing the leach.
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公开(公告)号：CA3092790A1
公开(公告)日：2019-10-17
申请号：CA3092790
申请日：2019-04-01
Applicant: BASF SE
Inventor： ROHDE WOLFGANG , ADERMANN TORBEN , RYLL THOMAS MICHAEL , SCHIERLE-ARNDT KERSTIN , SEELER FABIAN , WEIGUNY SABINE , ZEILINGER MICHAEL
Abstract: Process for the recovery of transition metal from spent lithium ion batteries containing nickel, wherein said process comprises the steps of (a) heating a lithium containing transition metal oxide material to a temperature in the range of from 400 to 1200°C, (b) treating said heat-treated material with water, (c) treating the solid residue from step (b)with an acid selected from sulfuric acid, hydrochloric acid, nitric acid, methanesulfonic acid, oxalic acid and citric acid, (d) adjusting the pH value to 2.5 to 8, (e) removing compounds of Al, Cu, Fe, Zn or combinations of at least two of the foregoing from the solution or slurry obtained in step (d).
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公开(公告)号：SG11201803553UA
公开(公告)日：2018-06-28
申请号：SG11201803553U
申请日：2016-11-30
Applicant: BASF SE
Inventor： ADERMANN TORBEN , LOEFFLER DANIEL , WILMER HAGEN , SCHIERLE-ARNDT KERSTIN , GERKENS JAN , VOLKMANN CHRISTIAN , SCHNEIDER SVEN
IPC: C23C16/18 , C07F13/00 , C07F15/04 , C07F15/06 , C23C16/455
Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. The present invention relates to a process comprising bringing a compound of general formula (I) into the gaseous or aerosol state and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein M is Mn, Ni or Co, X is a ligand which coordinates M, n is 0, 1, or 2, R1, R2 are an alkyl group, an alkenyl group, an aryl group or a silyl group, m is 1, 2, or 3, R3, R4, and R5 are an alkyl group, an alkenyl group, an aryl group, an alkoxy group, or an aryloxy group, and p is 1, 2 or 3.
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