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公开(公告)号：SG10201506215WA
公开(公告)日：2015-09-29
申请号：SG10201506215W
申请日：2011-09-06
Applicant: BASF SE
Inventor： NOLLER BASTIAN , FRANZ DIANA , LI YUZHUO , USMAN IBRAHIM SHEIK ANSAR , PINDER HARVEY WAYNE , VENKATARAMAN SHYAM SUNDAR
Abstract: An aqueous polishing composition comprising (A) at least one water-soluble or water-dispersible compound selected from the group consisting of N-substituted diazenium dioxides and N'-hydroxy-diazenium oxide salts; and (B) at least one type of abrasive particles; the use of the compounds (A) for manufacturing electrical, mechanical and optical devices and a process for polishing substrate materials for electrical, mechanical and optical devices making use of the aqueous polishing composition.
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22.发明公开AQUEOUS POLISHING COMPOSITION AND PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATES FOR ELECTRICAL, MECHANICAL AND OPTICAL DEVICES 审中-公开含水抛光组合物和方法用于化学机械抛光底物，电气，机械和光学器件
公开(公告)号：EP2614121A4
公开(公告)日：2016-03-09
申请号：EP11823139
申请日：2011-09-06
Applicant: BASF SE
Inventor： LI YUZHUO , CHU JEA-JU , VENKATARAMAN SHYAM SUNDAR , USMAN IBRAHIM SHEIK ANSAR , PINDER HARVEY WAYNE
CPC classification number: C09K13/00 , C08L33/24 , C09G1/02 , C09K3/1463 , H01L21/31053
Abstract: An aqueous polishing composition having a pH of 3 to 11 and comprising (A) abrasive particles which are positively charged when dispersed in an aqueous medium free from component (B) and of a pH of 3 to 9 as evidenced by the electrophoretic mobility; (B) anionic phosphate dispersing agents; and (C) a polyhydric alcohol component selected from the group consisting of (c1) water-soluble and water-dispersible, aliphatic and cycloaliphatic, monomeric, dimeric and oligomeric polyols having at least 4 hydroxy groups; (c2) a mixture consisting of (c21) water-soluble and water-dispersible, aliphatic and cycloaliphatic polyols having at least 2 hydroxy groups; and (c22) water-soluble or water-dispersible polymers selected from linear and branched alkylene oxide homopolymers and copolymers (c221); and linear and branched, aliphatic and cycloaliphatic poly(N-vinylamide) homopolymers and copolymers (c222); and (c3) mixtures of (c1) and (c2); and a process for polishing substrates for electrical, mechanical and optical devices.
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23.发明公开AQUEOUS POLISHING COMPOSITIONS CONTAINING N-SUBSTITUTED DIAZENIUM DIOXIDES AND/OR N'-HYDROXY-DIAZENIUM OXIDE SALTS 审中-公开WÄSSRIGEREINIGUNGSZUSAMMENSETZUNGEN MIT N-SUBSTITUIERTEN DIAZENIUMDIOXIDEN UND / ODER N'-HYDROXY-DIAZENIUM-OXIDSALZEN
公开(公告)号：EP2614122A4
公开(公告)日：2014-01-15
申请号：EP11823140
申请日：2011-09-06
Applicant: BASF SE
Inventor： NOLLER BASTIAN , FRANZ DIANA , LI YUZHUO , USMAN IBRAHIM SHEIK ANSAR , PINDER HARVEY WAYNE , VENKATARAMAN SHYAM SUNDAR
IPC: C09G1/02 , H01L21/3105
CPC classification number: C09K13/00 , C09G1/02 , C09K3/1463 , H01L21/31053
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