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公开(公告)号：SG10201506169XA
公开(公告)日：2015-09-29
申请号：SG10201506169X
申请日：2011-09-06
Applicant: BASF SE
Inventor： LI YUZHUO , CHU JEA-JU , VENKATARAMAN SHYAM SUNDAR , USMAN IBRAHIM SHEIK ANSAR , PINDER HARVEY WAYNE
Abstract: An aqueous polishing composition having a pH of 3 to 11 and comprising (A) abrasive particles which are positively charged when dispersed in an aqueous medium free from component (B) and of a pH of 3 to 9 as evidenced by the electrophoretic mobility; (B) anionic phosphate dispersing agents; and (C) a polyhydric alcohol component selected from the group consisting of (c1) water-soluble and water-dispersible, aliphatic and cycloaliphatic, monomeric, dimeric and oligomeric polyols having at least 4 hydroxy groups; (c2) a mixture consisting of (c21) water-soluble and water-dispersible, aliphatic and cycloaliphatic polyols having at least 2 hydroxy groups; and (c22) water-soluble or water-dispersible polymers selected from linear and branched alkylene oxide homopolymers and copolymers (c221); and linear and branched, aliphatic and cycloaliphatic poly(N-vinylamide) homopolymers and copolymers (c222); and (c3) mixtures of (c1) and (c2); and a process for polishing substrates for electrical, mechanical and optical devices.
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公开(公告)号：MY175638A
公开(公告)日：2020-07-03
申请号：MYPI2015002194
申请日：2011-09-05
Applicant: BASF SE
Inventor： CHU JEA-JU , LI YUZHUO , VENKATARAMAN SHYAM SUNDAR , PINDER HARVEY WAYNE , CHIU WEI LAN WILLIAM
Abstract: An aqueous polishing composition has been found, the said aqueous polishing composition comprising (A) at least one type of abrasive particles which are positively charged when dispersed in an aqueous medium free from component (B) and having a pH in the range of from 3 to 9 as evidenced by the electrophoretic mobility;(B) at least one water-soluble polymer selected from the group consisting of linear and branched alkylene oxide homopolymers and copolymers; and (C) at least one anionic phosphate dispersing agent; and a process for polishing substrate materials for electrical, mechanical and optical devices making use of the aqueous polishing composition.
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公开(公告)号：SG10201506220PA
公开(公告)日：2015-09-29
申请号：SG10201506220P
申请日：2011-09-06
Applicant: BASF SE
Inventor： LI YUZHUO , CHU JEA-JU , VENKATARAMAN SHYAM SUNDAR , USMAN IBRAHIM SHEIK ANSAR , PINDER HARVEY WAYNE
Abstract: An aqueous polishing composition comprising (A) abrasive particles which are positively charged when dispersed in an aqueous medium having a pH in the range of from 3 to 9 as evidenced by the electrophoretic mobility; (B) water-soluble and water-dispersible hydroxy group containing components selected from (b1) aliphatic and cycloaliphatic hydroxycarboxylic acids, wherein the molar ratio of hydroxy groups to carboxylic acid groups is at least 1; (b2) esters and lactones of the hydroxycarboxylic acids (b1) having at least one hydroxy group; and (b3) mixtures thereof; and (C) water-soluble and water-dispersible polymer components selected from (c1) linear and branched alkylene oxide polymers; (c2) linear and branched, aliphatic and cycloaliphatic poly(N-vinylamide) polymers; and (c3) cationic polymeric flocculents having a weight average molecular weight of less than 100,000 Dalton.; and a process for polishing substrate materials for electrical, mechanical and optical devices.
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公开(公告)号：MY170196A
公开(公告)日：2019-07-09
申请号：MYPI2013000777
申请日：2011-09-06
Applicant: BASF SE
Inventor： CHU JEA-JU , LI YUZHUO , VENKATARAMAN SHYAM SUNDAR , USMAN IBRAHIM SHEIK ANSAR , PINDER HARVEY WAYNE
Abstract: An aqueous polishing composition having a pH of 3 to 11 and comprising (A) abrasive particles which are positively charged when dispersed in an aqueous medium free from component (8) and of a pH of 3 to 9 as evidenced by the electrophoretic mobility; (B) anionic phosphate dispersing agents; and (C) a polyhydric alcohol component selected from the group consisting of (c1) water-soluble and water-dispersible, aliphatic and cycloaliphatic, monomeric, dimeric and oligomeric polyols having at least 4 hydroxy groups; (c2) a mixture consisting of (c21) water-soluble and water-dispersible, aliphatic and cycloaliphatic polyols having at least 2 hydroxy groups; and (c22) water-soluble or water-dispersible polymers selected from linear and branched alkylene oxide homopolymers and copolymers (c221); and linear and branched, aliphatic and cycloaliphatic poly (N-vinylamide) homopolymers and copolymers (c222); and (c3) mixtures of (c1) and (c2); and a process for polishing substrates for electrical, mechanical and optical devices.
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公开(公告)号：MY164859A
公开(公告)日：2018-01-30
申请号：MYPI2013000780
申请日：2011-09-06
Applicant: BASF SE
Inventor： LI YUZHUO , CHU JEA-JU , VENKATARAMAN SHYAM SUNDAR , USMAN IBRAHIM SHEIK ANSAR , PINDER HARVEY WAYNE
Abstract: AN AQUEOUS POLISHING COMPOSITION COMPRISING (A) ABRASIVE PARTICLES WHICH ARE POSITIVELY CHARGED WHEN DISPERSED IN AN AQUEOUS MEDIUM HAVING A PH IN THE RANGE OF FROM 3 TO 9 AS EVIDENCED BY THE ELECTROPHORETIC MOBILITY; (B) WATER-SOLUBLE AND WATER-DISPERSIBLE HYDROXY GROUP CONTAINING COMPONENTS SELECTED FROM (B1) ALIPHATIC AND CYCLOALIPHATIC HYDROXYCARBOXYLIC ACIDS, WHEREIN THE MOLAR RATIO OF HYDROXY GROUPS TO CARBOXYLIC ACID GROUPS IS AT LEAST 1; (B2) ESTERS AND LACTONES OF THE HYDROXYCARBOXYLIC ACIDS (B1) HAVING AT LEAST ONE HYDROXY GROUP; AND (B3) MIXTURES THEREOF; AND (C) WATER-SOLUBLE AND WATER-DISPERSIBLE POLYMER COMPONENTS SELECTED FROM (C1) LINEAR AND BRANCHED ALKYLENE OXIDE POLYMERS; (C2) LINEAR AND BRANCHED, ALIPHATIC AND CYCLOALIPHATIC POLY(N-VINYLAMIDE) POLYMERS; AND (C3) CATIONIC POLYMERIC FLOCCULANTS HAVING A WEIGHT AVERAGE MOLECULAR WEIGHT OF LESS THAN 100,000 DALTON.; AND A PROCESS FOR POLISHING SUBSTRATE MATERIALS FOR ELECTRICAL, MECHANICAL AND OPTICAL DEVICES.
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Patent Agency Ranking
公开(公告)号：SG10201506215WA
公开(公告)日：2015-09-29
申请号：SG10201506215W
申请日：2011-09-06
Applicant: BASF SE
Inventor： NOLLER BASTIAN , FRANZ DIANA , LI YUZHUO , USMAN IBRAHIM SHEIK ANSAR , PINDER HARVEY WAYNE , VENKATARAMAN SHYAM SUNDAR
Abstract: An aqueous polishing composition comprising (A) at least one water-soluble or water-dispersible compound selected from the group consisting of N-substituted diazenium dioxides and N'-hydroxy-diazenium oxide salts; and (B) at least one type of abrasive particles; the use of the compounds (A) for manufacturing electrical, mechanical and optical devices and a process for polishing substrate materials for electrical, mechanical and optical devices making use of the aqueous polishing composition.
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公开(公告)号：SG11201606187RA
公开(公告)日：2016-09-29
申请号：SG11201606187R
申请日：2011-09-05
Applicant: BASF SE
Inventor： LI YUZHUO , CHU JEA-JU , VENKATARAMAN SHYAM SUNDAR , CHIU WEI LAN WILLIAM , PINDER HARVEY WAYNE
Abstract: An aqueous polishing composition has been found, the said aqueous polishing composition comprising (A) at least one type of abrasive particles which are positively charged when dispersed in an aqueous medium free from component (B) and having a pH in the range of from 3 to 9 as evidenced by the electrophoretic mobility; (B) at least one water-soluble polymer selected from the group consisting of linear and branched alkylene oxide homopolymers and copolymers; and (C) at least one anionic phosphate dispersing agent; and a process for polishing substrate materials for electrical, mechanical and optical devices making use of the aqueous polishing composition.
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公开(公告)号：SG10201606566SA
公开(公告)日：2016-09-29
申请号：SG10201606566S
申请日：2011-09-05
Applicant: BASF SE
Inventor： LI YUZHUO , CHU JEA-JU , VENKATARAMAN SHYAM SUNDAR , CHIU WEI LAN WILLIAM , PINDER HARVEY WAYNE
Abstract: An aqueous polishing composition has been found, the said aqueous polishing composition comprising (A) at least one type of abrasive particles which are positively charged when dispersed in an aqueous medium free from component (B) and having a pH in the range of from 3 to 9 as evidenced by the electrophoretic mobility; (B) at least one water-soluble polymer selected from the group consisting of linear and branched alkylene oxide homopolymers and copolymers; and (C) at least one anionic phosphate dispersing agent; and a process for polishing substrate materials for electrical, mechanical and optical devices making use of the aqueous polishing composition.
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公开(公告)号：SG188460A1
公开(公告)日：2013-04-30
申请号：SG2013017264
申请日：2011-09-06
Applicant: BASF SE
Inventor： LI YUZHUO , CHU JEA-JU , VENKATARAMAN SHYAM SUNDAR , USMAN IBRAHIM SHEIK ANSAR , PINDER HARVEY WAYNE
Abstract: An aqueous polishing composition comprising (A) abrasive particles which are positively charged when dispersed in an aqueous medium having a pH in the range of from 3 to 9 as evidenced by the electrophoretic mobility; (B) water-soluble and water-dispersible hydroxy group containing components selected from (b1 ) aliphatic and cycloaliphatic hydroxycarboxylic acids, wherein the molar ratio of hydroxy groups to carboxylic acid groups is at least 1; (b2) esters and lactones of the hydroxycarboxylic acids (b1 ) having at least one hydroxy group; and (b3) mixtures thereof; and (C) water-soluble and water-dispersible polymer components selected from (c1 ) linear and branched alkylene oxide polymers; (c2) linear and branched, aliphatic and cycloaliphatic poly(N-vinylamide) polymers; and (c3) cationic polymeric flocculants having a weight average molecular weight of less than 100,000 Dalton.; and a process for polishing substrate materials for electrical, mechanical and optical devices.
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公开(公告)号：SG188459A1
公开(公告)日：2013-04-30
申请号：SG2013017256
申请日：2011-09-06
Applicant: BASF SE
Inventor： NOLLER BASTIAN , FRANZ DIANA , LI YUZHUO , USMAN IBRAHIM SHEIK ANSAR , PINDER HARVEY WAYNE , VENKATARAMAN SHYAM SUNDAR
Abstract: An aqueous polishing composition comprising (A) at least one water-soluble or water-dispersible compound selected from the group consisting of N-substituted diazenium dioxides and N'-hydroxy-diazenium oxide salts; and (B) at least one type of abrasive particles; the use of the compounds (A) for manufacturing electrical, mechanical and optical devices and a process for polishing substrate materials for electrical, mechanical and optical devices making use of the aqueous polishing composition.
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