公开(公告)号：DE60109257T2

公开(公告)日：2005-07-28

申请号：DE60109257

申请日：2001-12-20

Applicant: UNITED TECHNOLOGIES CORP

Inventor： BURNS STEVEN M ,  MARSZAL DEAN N

IPC: F01D5/28 ,  C23C4/02 ,  C23C4/08 ,  C23C4/10 ,  C23C14/02 ,  C23C28/00 ,  C23C30/00

公开(公告)号：SG67549A1

公开(公告)日：1999-09-21

申请号：SG1998003327

申请日：1998-08-27

Applicant: UNITED TECHNOLOGIES CORP

Inventor： BEERS RUSSELL A ,  HENDRICKS ROBERT E ,  MARSZAL DEAN N ,  NOETZEL ALLAN A ,  WRIGHT ROBERT J ,  ERVIN DAVID R ,  SILEO GERARD A

IPC: C23C14/24 ,  C23C14/32 ,  C23C14/56 ,  C23C14/54

Abstract: A vapor deposition production system (10) for coating substrates (12) is provided which includes a plurality of vapor deposition coaters (14), a plurality of platters (16), a platter docking station (18), a shuttle track (20), and apparatus for transporting the platters between the coaters and the platter docking station. The shuttle track connects the platter docking station and the coaters. Platters selectively removed from the coaters are transported along the shuttle track to the platter docking station where processed substrates are unloaded from the platters and unprocessed substrates loaded on to the platters.