公开(公告)号：JPH11131221A

公开(公告)日：1999-05-18

申请号：JP24545998

申请日：1998-08-31

Applicant: UNITED TECHNOLOGIES CORP

Inventor： MARSZAL DEAN N ,  BEERS RUSSELL A ,  HENDRICKS ROBERT E ,  NOETZEL ALLAN A ,  WRIGHT ROBERT J ,  ERVIN DAVID R ,  SILEO GERARD A

IPC: C23C14/24 ,  C23C14/32 ,  C23C14/56

Abstract: PROBLEM TO BE SOLVED: To provide an efficient gaseous phase deposition forming device capable of continuously applying coating of high quality to many substrates and good in the efficiency of the cost. SOLUTION: A geseous phase deposition forming device for applying substrates with coating is provided, and this device contains plural gaseous phase deposition coaters 14, plural platers 16, a plater docking station 18 and a device for carrying the platers between the coaters and the plater docking station. A shuttle truck connects the plater docking station and coaters. The plater selectively discharged from the coater is carried to the plater docking station along the shuttle truck, where the treated substrate is taken down from the plater, and untreated substrate is placed on the plater.

公开(公告)号：DE69832016T2

公开(公告)日：2006-07-13

申请号：DE69832016

申请日：1998-08-28

Applicant: UNITED TECHNOLOGIES CORP HARTF

Inventor： BEERS RUSSELL A ,  MARSZAL DEAN N ,  NOETZEL ALLAN A ,  SILEO GERARD A ,  HENDRICKS ROBERT E ,  WRIGHT ROBERT J ,  ERVIN DAVID R

IPC: C23C14/24 ,  C23C14/54 ,  C23C14/32 ,  C23C14/56

Abstract: A vapor deposition production system (10) for coating substrates (12) is provided which includes a plurality of vapor deposition coaters (14), a plurality of platters (16), a platter docking station (18), a shuttle track (20), and apparatus for transporting the platters between the coaters and the platter docking station. The shuttle track connects the platter docking station and the coaters. Platters selectively removed from the coaters are transported along the shuttle track to the platter docking station where processed substrates are unloaded from the platters and unprocessed substrates loaded on to the platters.

公开(公告)号：DE69832016D1

公开(公告)日：2005-12-01

申请号：DE69832016

申请日：1998-08-28

Applicant: UNITED TECHNOLOGIES CORP

Inventor： BEERS RUSSELL A ,  MARSZAL DEAN N ,  NOETZEL ALLAN A ,  SILEO GERARD A ,  HENDRICKS ROBERT E ,  WRIGHT ROBERT J ,  ERVIN DAVID R

IPC: C23C14/24 ,  C23C14/32 ,  C23C14/56 ,  C23C14/54

Abstract: A vapor deposition production system (10) for coating substrates (12) is provided which includes a plurality of vapor deposition coaters (14), a plurality of platters (16), a platter docking station (18), a shuttle track (20), and apparatus for transporting the platters between the coaters and the platter docking station. The shuttle track connects the platter docking station and the coaters. Platters selectively removed from the coaters are transported along the shuttle track to the platter docking station where processed substrates are unloaded from the platters and unprocessed substrates loaded on to the platters.

公开(公告)号：SG67549A1

公开(公告)日：1999-09-21

申请号：SG1998003327

申请日：1998-08-27

Applicant: UNITED TECHNOLOGIES CORP

Inventor： BEERS RUSSELL A ,  HENDRICKS ROBERT E ,  MARSZAL DEAN N ,  NOETZEL ALLAN A ,  WRIGHT ROBERT J ,  ERVIN DAVID R ,  SILEO GERARD A

IPC: C23C14/24 ,  C23C14/32 ,  C23C14/56 ,  C23C14/54

Abstract: A vapor deposition production system (10) for coating substrates (12) is provided which includes a plurality of vapor deposition coaters (14), a plurality of platters (16), a platter docking station (18), a shuttle track (20), and apparatus for transporting the platters between the coaters and the platter docking station. The shuttle track connects the platter docking station and the coaters. Platters selectively removed from the coaters are transported along the shuttle track to the platter docking station where processed substrates are unloaded from the platters and unprocessed substrates loaded on to the platters.