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    PROCESS FOR PREPARING COPOLYMERS
    24.
    发明专利
    PROCESS FOR PREPARING COPOLYMERS 未知

    公开(公告)号：CA2063473C

    公开(公告)日：1998-09-22

    申请号：CA2063473

    申请日：1992-03-19

    Applicant: XEROX CORP

    Inventor： KOVACS GREGORY J ,  TAM MAN C ,  NG T HWEE ,  MAHABADI HADI K ,  PETERS ERIC M ,  LOUTFY RAFIK O

    IPC: C08F2/00 ,  C08F2/06 ,  C08F2/18 ,  C08F4/38 ,  G03G17/10

    Abstract: Disclosed is a process for preparing copolymers which comprises, in the order stated: (1) adding monomers containing unsaturated carbon-to-carbon bonds, a first polymerization initiator, a second polymerizatio n initiator, and a solvent to a reaction vessel; (2) purging the resulting solution with an inert gas; (3) sealing the reaction vessel and pressurizing it by addition of an inert gas to a pressure of from about 20 to about 600 kilopascals over ambient atmospheric pressure; (4) maintaining the temperature within the pressurized reaction vessel at a temperature of from about 50 to about 100.degree.C for a period of from about 60 to about 300 minutes; (5) thereafter maintaining the temperature within the pressurized reaction vessel at a temperature of from about 80 to about 115.degree.C for a period of from about 30 to about 300 minutes, wherein the temperature in step (5) is higher than the temperature in step (4); and (6) subsequently maintaining the temperature within the pressurized reaction vessel at a temperature of from about 115 to about 160.degree.C for a period of from about 30 to about 180 minutes, wherein the temperature in step (6) is higher than the temperature in step (5). Polymers prepared according to the process of the present invention can be particularly useful in migration imaging members.

    Method and Apparatus for Back Facet Monitoring of Multiple Semiconductor Laser Diodes
    25.
    发明专利
    Method and Apparatus for Back Facet Monitoring of Multiple Semiconductor Laser Diodes 未知

    公开(公告)号：CA2133496A1

    公开(公告)日：1995-05-23

    申请号：CA2133496

    申请日：1994-10-03

    Applicant: XEROX CORP

    Inventor： KOVACS GREGORY J ,  YINGLING R DONALD JR

    IPC: H01S3/23 ,  H01S5/00 ,  H01S5/026 ,  H01S5/40 ,  G01J1/08

    Abstract: The present invention is a novel multiple laser diode structure and method for using such structures to optically isolate the light from the different diodes. The novel structure comprises a submount on which the individual lasing elements are mounted and a back facet monitoring plate coupled to the submount. The back facet monitoring plate comprises a plurality of optically sensitive detectors that monitor the amount of laser light emanating from the back facet. Ideally, one detector should be mounted opposite a back facet for each lasing element. The submount is designed with an isolation bar that optically separates the light from individual lasing elements. The radiation thus detected by each detector emanates from the back facet of a single lasing element. The amount of back facet radiation captured by the detector is proportional to the amount of radiation emanating from the front facet of the lasing element. This information enables the system to individually monitor and subsequently control the spot power of the lasing element in a continuous closed loop fashion.

    26.
    发明专利
    未知

    公开(公告)号：DE69010638D1

    公开(公告)日：1994-08-18

    申请号：DE69010638

    申请日：1990-11-30

    Applicant: XEROX CORP

    Inventor： TAM MAN C ,  LOUTFY RAFIK O ,  KOVACS GREGORY J

    IPC: G03G13/26 ,  G03G5/026 ,  G03G13/22 ,  G03G17/04 ,  G03G17/10

    Abstract: Disclosed is a xeroprinting process which comprises (1) providing a xeroprinting master comprising (a) a substrate (22); and (b) a layer of softenable material (25), a charge-transport material (27) capable of transporting charges of one polarity, and migration marking material (26) situated contiguous to the surface of the softenable layer spaced from the substrate, wherein a portion of the migration marking material has migrated through the softenable layer toward the substrate in imagewise fashion; (2) uniformly charging the xeroprinting master to a polarity opposite to the polarity of the charges that the charge transport material in the softenable layer is capable of transporting; (3) uniformly exposing the charged master to activating radiation (31), thereby discharging those areas of the master wherein the migration marking material has migrated toward the substrate and forming an electrostatic latent image; (4) developing the electrostatic latent image, and (5) transferring the developed image to a receiver sheet. The process results in greatly-enhanced contrast potentials or contrast voltages between the charged and uncharged areas of the master subsequent to exposure to activating radiation, and the charged master can be developed with either liquid developers or dry developers.

    METHOD AND APPARATUS WITH VERNIER TECHNIQUE FOR REGISTRATIONOF EJECTOR MODULE
    28.
    发明专利
    METHOD AND APPARATUS WITH VERNIER TECHNIQUE FOR REGISTRATIONOF EJECTOR MODULE 未知

    公开(公告)号：CA2529140A1

    公开(公告)日：2006-06-17

    申请号：CA2529140

    申请日：2005-12-09

    Applicant: XEROX CORP

    Inventor： KOVACS GREGORY J

    IPC: B41J2/145 ,  B41J2/14

    Abstract: Alignment of an ejector module in a printhead array is achieved along a lateral direction by arranging first and second partially overlapping pluralities of nozzles, determining an alignment pair between first and second nozzles with in their respective pluralities, and assigning the alignment pair as boundaries for print actuation. The first and second ejector modules are disposed in a printhead array along a lateral direction and include first and second nozzles that eject fluid on command. The first nozzles are disposed with a first spacing therebetween in the first ejector module. The second nozzles at one end of the second ejector module that overlap the first nozzles are disposed with a second spacing that diffe rs from the first spacing. An alignment pair between first and second nozzles of the ir respective pluralities is determined to minimize an alignment spacing betwee n each other as compared to remaining nozzles. The first and second alignment nozzl es are assigned as first and second boundaries for print actuation.

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