Abstract:
A substrate support structure for clamping a substrate by means of a capillary force created by a liquid clamping layer having a lower pressure than its surroundings. The substrate support structure comprises a surface provided with a plurality of substrate supporting elements for holding the substrate, and the surface further comprises portions with different capillary potential for inducing, during clamping, a predetermined capillary flow within the liquid clamping layer.
Abstract:
A table for vacuum application which is guided by aerostatic bearing elements, having a fixedly mounted supporting structure and a tabletop which is displaceable in x-direction and y-direction with respect to the fixedly mounted supporting structure by means of slides. The slides are provided with the aerostatic bearing elements for guiding, these aerostatic bearing elements being connected to feed lines for supplying the gas required for the operation of the gas bearings and suction lines for removing this gas. The suction lines comprise at least one variable-length line arrangement having a first pipe member and a second pipe member which penetrate one inside the other without contacting, at least one sealing gap being provided between the pipe members.
Abstract:
A method for temperature control during a process of cleaving a plurality of free-standing thick films from a bulk material includes clamping a bulk material using a mechanical clamp device adapted to engage the bottom region of the bulk material through a seal with a planar surface of a stage to form a cavity with a height between the bottom region and the planar surface. The planar surface includes a plurality of gas passageways allowing a gas filled in the cavity with adjustable pressure. The method also includes maintaining the temperature of the surface region by processing at least input data and executing a control scheme utilizing at least one or more of; particle bombardment to heat the surface region; radiation to heat the surface region; and gas-assisted conduction between the bottom region and the stage.
Abstract:
The present invention provides an improved electrostatic chuck for a substrate processing system. The electrostatic chuck comprising a main body having a top surface configured to support the substrate, a power supply to apply a voltage to the main body and a sealing ring disposed between the main body and the substrate wherein the sealing ring has a conductive layer.
Abstract:
A method for using a reusable sample-holding device for readily loading very small wet samples for observation of the samples by microscopic equipment, in particular in a vacuum environment. The method may be used with a scanning electron microscope (SEM), a transmission electron microscope (TEM), an X-ray microscope, optical microscope, and the like. For observation of the sample, the method provides a thin-membrane window etched in the center of each of two silicon wafers abutting to contain the sample in a small uniform gap formed between the windows. This gap may be adjusted by employing spacers. Alternatively, the thickness of a film established by the fluid in which the sample is incorporated determines the gap without need of a spacer. To optimize resolution each window may have a thickness on the order of 50 nm and the gap may be on the order of 50 nm.
Abstract:
A sample holder used in SEM (scanning electron microscopy) or TEM (transmission electron microscopy) permitting observation and inspection at higher resolution. The holder has a frame-like member provided with an opening that is covered with a film. The film has a first surface on which a sample is held. The thickness D of the film and the length L of the portion of the film providing a cover over the opening in the frame-like member satisfy a relationship given by L/D
Abstract translation:用于SEM(扫描电子显微镜)或TEM(透射电子显微镜)中的样品架,允许以更高分辨率观察和检查。 保持器具有设置有被膜覆盖的开口的框架状构件。 该膜具有保持样品的第一表面。 膜的厚度D和在框状构件的开口上设置盖的膜的部分的长度L满足由L / D <200,000给出的关系。
Abstract:
A charged beam apparatus comprising a vacuum chamber having a moving mechanism inside and a sample chamber, the sample chamber being used placed in an ultra-high vacuum atmosphere or a gas atmosphere, wherein a flat surface is formed on that surface of the moving mechanism which faces the sample chamber, and a flange having a flat open surface is mounted between the vacuum chamber and the sample chamber such that the open surface is opposed to the flat surface with a tiny gap being formed between the open surface and the flat surface for permitting vacuum venting without imposing any restrictions on the moving mechanism, whereby the apparatus operates without restricting the action of the moving mechanism.
Abstract:
An apparatus for welding of a member to be welded in a vacuum chamber accommodating a part of the member, comprises a housing for defining the vacuum chamber, the housing including upper and lower housings between which the member to be welded is held, the upper and lower housings each having front and rear sides; an electron gun mounted on the upper housing; a drive device for moving the electron gun in a welding direction; an adjustment member or adjustment liner plate disposed on the lower housing for defining spaces allowing a part of the member to be welded to fit in at the front and rear sides of the lower housing so that the entirety of a welding portion of the member is in the vacuum chamber and both sides of the welding line are exposed in vacuum; sealing material for sealing between the housing, the adjustment member or adjustment liner plate and the member to be welded.
Abstract:
There is provided a technique that includes: an upper container; a lower container provided below the upper container and constituting a processing chamber between the lower container and the upper container; a first seal portion disposed in a boundary region between the upper container and the lower container, the first seal portion including a first seal member and a second seal member; and a support that includes a support face disposed at a highest position below the upper container, is provided between the first seal member and the second seal member in a horizontal direction, and is made of a material harder than the first seal member and the second seal member.
Abstract:
An ion implantation apparatus including an enclosure defining a process chamber, a carriage slidably mounted on a shaft within the process chamber and coupled to a drive mechanism adapted to selectively move the carriage along the shaft. A platen assembly can be coupled to the carriage, and a linkage conduit can extend between a side wall of the enclosure and the carriage. The linkage conduit can include a plurality of pivotably interconnected linkage members that define a contiguous internal volume that is sealed from the process chamber. The contiguous volume can be held at a desired vacuum pressure separate from the vacuum environment of the process chamber.