APPARATUS AND METHOD OF TEMPERATURE CONTROL DURING CLEAVING PROCESSES OF THICK MATERIALS
    23.
    发明申请
    APPARATUS AND METHOD OF TEMPERATURE CONTROL DURING CLEAVING PROCESSES OF THICK MATERIALS 有权
    厚材料清洗过程中的温度控制装置及方法

    公开(公告)号:US20120077289A1

    公开(公告)日:2012-03-29

    申请号:US13246717

    申请日:2011-09-27

    Abstract: A method for temperature control during a process of cleaving a plurality of free-standing thick films from a bulk material includes clamping a bulk material using a mechanical clamp device adapted to engage the bottom region of the bulk material through a seal with a planar surface of a stage to form a cavity with a height between the bottom region and the planar surface. The planar surface includes a plurality of gas passageways allowing a gas filled in the cavity with adjustable pressure. The method also includes maintaining the temperature of the surface region by processing at least input data and executing a control scheme utilizing at least one or more of; particle bombardment to heat the surface region; radiation to heat the surface region; and gas-assisted conduction between the bottom region and the stage.

    Abstract translation: 在从大量材料切割多个独立的厚膜的过程中的温度控制方法包括使用机械夹紧装置来夹紧散装材料,该机械夹紧装置适于通过密封件与大块材料的底部区域接合, 形成在底部区域和平面之间具有高度的空腔的阶段。 平面表面包括多个气体通道,允许以可调节的压力填充在空腔中的气体。 该方法还包括通过至少处理输入数据并执行利用至少一个或多个的控制方案来维持表面区域的温度; 颗粒轰击加热表面区域; 辐射加热表面区域; 和底部区域和阶段之间的气体辅助传导。

    Conductive seal ring electrostatic chuck
    24.
    发明授权
    Conductive seal ring electrostatic chuck 有权
    导电密封环静电吸盘

    公开(公告)号:US08139340B2

    公开(公告)日:2012-03-20

    申请号:US12689784

    申请日:2010-01-19

    Inventor: Glyn J. Reynolds

    CPC classification number: H01L21/6831 H01J37/20 H01J2237/2005

    Abstract: The present invention provides an improved electrostatic chuck for a substrate processing system. The electrostatic chuck comprising a main body having a top surface configured to support the substrate, a power supply to apply a voltage to the main body and a sealing ring disposed between the main body and the substrate wherein the sealing ring has a conductive layer.

    Abstract translation: 本发明提供一种用于衬底处理系统的改进的静电吸盘。 该静电卡盘包括具有构造成支撑基板的顶表面的主体,向主体施加电压的电源和设置在主体和基板之间的密封环,其中密封环具有导电层。

    Method of use of reusable sample holding device permitting ready loading of very small wet samples
    25.
    发明授权
    Method of use of reusable sample holding device permitting ready loading of very small wet samples 失效
    使用可重复使用的样品保持装置的方法,允许准备加载非常小的湿样品

    公开(公告)号:US08102523B1

    公开(公告)日:2012-01-24

    申请号:US13239632

    申请日:2011-09-22

    Abstract: A method for using a reusable sample-holding device for readily loading very small wet samples for observation of the samples by microscopic equipment, in particular in a vacuum environment. The method may be used with a scanning electron microscope (SEM), a transmission electron microscope (TEM), an X-ray microscope, optical microscope, and the like. For observation of the sample, the method provides a thin-membrane window etched in the center of each of two silicon wafers abutting to contain the sample in a small uniform gap formed between the windows. This gap may be adjusted by employing spacers. Alternatively, the thickness of a film established by the fluid in which the sample is incorporated determines the gap without need of a spacer. To optimize resolution each window may have a thickness on the order of 50 nm and the gap may be on the order of 50 nm.

    Abstract translation: 一种使用可重复使用的样品保持装置的方法,用于容易地加载非常小的湿样品,以通过微观设备特别是在真空环境中观察样品。 该方法可以用扫描电子显微镜(SEM),透射电子显微镜(TEM),X射线显微镜,光学显微镜等来使用。 为了观察样品,该方法提供了在两个硅晶片的每一个的中心蚀刻的薄膜窗口,其邻接以将样品容纳在窗口之间形成的小的均匀间隙中。 该间隙可以通过使用间隔物来调节。 或者,通过其中包含样品的流体建立的膜的厚度确定了间隙而不需要间隔物。 为了优化分辨率,每个窗口可以具有大约50nm的厚度,并且间隙可以在50nm量级。

    Charged beam apparatus
    27.
    发明授权
    Charged beam apparatus 失效
    带电束装置

    公开(公告)号:US5493125A

    公开(公告)日:1996-02-20

    申请号:US206161

    申请日:1994-03-07

    CPC classification number: H01J37/20 H01J37/18 H01J2237/2005

    Abstract: A charged beam apparatus comprising a vacuum chamber having a moving mechanism inside and a sample chamber, the sample chamber being used placed in an ultra-high vacuum atmosphere or a gas atmosphere, wherein a flat surface is formed on that surface of the moving mechanism which faces the sample chamber, and a flange having a flat open surface is mounted between the vacuum chamber and the sample chamber such that the open surface is opposed to the flat surface with a tiny gap being formed between the open surface and the flat surface for permitting vacuum venting without imposing any restrictions on the moving mechanism, whereby the apparatus operates without restricting the action of the moving mechanism.

    Abstract translation: 一种带电束装置,包括在内部具有移动机构的真空室和样品室,所述样品室用于超高真空气氛或气体气氛中,其中在所述移动机构的所述表面上形成有平坦表面, 面对样品室,并且具有平坦开放表面的凸缘安装在真空室和样品室之间,使得开口表面与平坦表面相对,在开口表面和平坦表面之间形成微小的间隙以允许 真空排气而不对移动机构施加任何限制,由此该装置在不限制移动机构的作用的情况下操作。

    Process and apparatus, for electron beam welding of a member partially
enclosed in vacuum chamber, and the member formed thereby
    28.
    发明授权
    Process and apparatus, for electron beam welding of a member partially enclosed in vacuum chamber, and the member formed thereby 失效
    用于部分包围在真空室中的部件的电子束焊接的工艺和装置以及由此形成的部件

    公开(公告)号:US5170028A

    公开(公告)日:1992-12-08

    申请号:US564581

    申请日:1990-08-09

    CPC classification number: H01J37/18 B23K15/06 H01J2237/2005 H01J2237/3104

    Abstract: An apparatus for welding of a member to be welded in a vacuum chamber accommodating a part of the member, comprises a housing for defining the vacuum chamber, the housing including upper and lower housings between which the member to be welded is held, the upper and lower housings each having front and rear sides; an electron gun mounted on the upper housing; a drive device for moving the electron gun in a welding direction; an adjustment member or adjustment liner plate disposed on the lower housing for defining spaces allowing a part of the member to be welded to fit in at the front and rear sides of the lower housing so that the entirety of a welding portion of the member is in the vacuum chamber and both sides of the welding line are exposed in vacuum; sealing material for sealing between the housing, the adjustment member or adjustment liner plate and the member to be welded.

    Abstract translation: 一种用于将待焊接的部件焊接在容纳部件的一部分的真空室中的装置,包括用于限定真空室的壳体,所述壳体包括上部和下部壳体,所述待焊接部件保持在其之间, 下壳体各自具有前侧和后侧; 安装在上壳体上的电子枪; 用于沿焊接方向移动电子枪的驱动装置; 设置在下壳体上的调节构件或调节衬板,用于限定允许部件的一部分被焊接以配合在下壳体的前侧和后侧的空间,使得构件的焊接部分的整体处于 真空室和焊接线的两侧在真空中暴露; 密封材料用于在壳体,调节构件或调节衬板与待焊接构件之间进行密封。

    LINKAGE CONDUIT FOR VACUUM CHAMBER APPLICATIONS
    30.
    发明申请
    LINKAGE CONDUIT FOR VACUUM CHAMBER APPLICATIONS 有权
    用于真空室应用的连接管

    公开(公告)号:US20160071686A1

    公开(公告)日:2016-03-10

    申请号:US14482761

    申请日:2014-09-10

    Abstract: An ion implantation apparatus including an enclosure defining a process chamber, a carriage slidably mounted on a shaft within the process chamber and coupled to a drive mechanism adapted to selectively move the carriage along the shaft. A platen assembly can be coupled to the carriage, and a linkage conduit can extend between a side wall of the enclosure and the carriage. The linkage conduit can include a plurality of pivotably interconnected linkage members that define a contiguous internal volume that is sealed from the process chamber. The contiguous volume can be held at a desired vacuum pressure separate from the vacuum environment of the process chamber.

    Abstract translation: 一种离子注入装置,其包括限定处理室的外壳,可滑动地安装在处理室内的轴上并联接到适于沿着轴选择性地移动托架的驱动机构的托架。 压板组件可以联接到滑架,并且连接导管可以在外壳的侧壁和滑架之间延伸。 连接导管可以包括多个可枢转地互连的连接构件,其限定了与处理室密封的连续内部容积。 连续体积可以保持在与处理室的真空环境分开的期望的真空压力下。

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