公开(公告)号：EP0459177B1

公开(公告)日：1995-12-20

申请号：EP91107210.6

申请日：1991-05-03

Applicant: International Business Machines Corporation

Inventor： Cuomo, Jerome J. ,  Guarnieri, Charles R. ,  Whitehair, Stanley J.

IPC: H01J37/32 ,  H05H1/46

CPC classification number: H01J37/32201 ,  H01J37/32192 ,  H01J37/3222

公开(公告)号：WO2015148246A1

公开(公告)日：2015-10-01

申请号：PCT/US2015/021382

申请日：2015-03-19

Applicant: MKS INSTRUMENTS, INC.

Inventor： CHEN, Xing ,  JI, Chengxiang ,  MADDEN, Erin ,  POKIDOV, Ilya ,  WENZEL, Kevin, W.

IPC: H05H1/46

CPC classification number: H01J37/32229 ,  H01J37/32201 ,  H01J37/32311 ,  H01J37/32522 ,  H05H1/46 ,  H05H2001/4622

Abstract: An apparatus for generating plasma includes a plasma discharge tube and a conductive coil helically wound around an outer surface of the plasma discharge tube. A waveguide is coupled to a microwave cavity surrounding the plasma discharge tube to guide the microwave energy into the plasma discharge tube such that the plasma is generated in the plasma discharge tube. The waveguide is positioned such that an electric field of the microwave energy is oriented at a predetermined angle with respect to the longitudinal axis of the plasma discharge tube. A resulting induced electric current in the conductive coil affects power absorption in the plasma discharge tube, the predetermined angle being selectable such that power absorption in the plasma discharge tube is according to a predetermined profile with respect to the longitudinal axis of the plasma discharge tube.

Abstract translation: 用于产生等离子体的装置包括等离子体放电管和螺旋缠绕在等离子体放电管的外表面上的导电线圈。 波导耦合到围绕等离子体放电管的微波腔，以将微波能量引导到等离子体放电管中，使得等离子体在等离子体放电管中产生。 波导被定位成使得微波能量的电场相对于等离子体放电管的纵向轴线定向成预定角度。 导电线圈中产生的感应电流影响等离子体放电管中的功率吸收，该预定角度是可选择的，使得等离子体放电管中的功率吸收相对于等离子体放电管的纵向轴线具有预定的轮廓。

公开(公告)号：WO2014154424A2

公开(公告)日：2014-10-02

申请号：PCT/EP2014/053658

申请日：2014-02-25

Applicant: NEOCOAT SA

Inventor： RATS, David ,  PROVENT, Christophe

IPC: C23C16/04

CPC classification number: C23C16/274 ,  B81C1/00373 ,  C01B32/25 ,  C23C16/045 ,  C23C16/511 ,  H01J37/32192 ,  H01J37/32201 ,  H01J37/32293 ,  H01J37/32403 ,  H01J37/32678 ,  H01J2237/327 ,  H01J2237/3321 ,  H01J2237/3323 ,  H01L21/02115 ,  H01L21/02274

Abstract: La présente invention concerne un procédé de dépôt de diamant nanocristallin mettant en œuvre un équipement de dépôt de diamant en phase vapeur comprenant : - un réacteur sous vide (3) comprenant une chambre de réaction reliée à une source de vide, - une pluralité de sources de plasma, disposées selon une matrice au moins bidimensionnelle dans la chambre de réaction, - un porte-substrat (5) disposé dans le réacteur, ledit procédé étant caractérisé en ce que le dépôt est effectué à une température comprise entre 100 et 500°C.

Abstract translation: 本发明涉及使用金刚石气相沉积设备沉积纳米晶金刚石的方法，该方法包括：真空反应器（3），其包括连接到真空源的反应室; 沿反应室中至少二维的矩阵排列的多个等离子体源; 和布置在所述反应器中的衬底保持器（5），所述方法的特征在于，所述沉积在100至500℃的温度下进行。

公开(公告)号：WO2013051248A1

公开(公告)日：2013-04-11

申请号：PCT/JP2012/006331

申请日：2012-10-03

Applicant: 東京エレクトロン株式会社

Inventor： 石橋　清隆 ,  森田　治

IPC: H05H1/46 ,  C23C16/511 ,  H01L21/3065 ,  H01L21/31

CPC classification number: H01J37/32201 ,  C23C16/45563 ,  C23C16/511 ,  H01J37/321 ,  H01J37/32192 ,  H01J37/3244 ,  H01J37/32495 ,  H05H2001/463

Abstract: 【課題】プラズマ生成用の電磁波をチャンバ内に透過して導入する誘電体窓にガス流路を設ける場合に、そのガス流路の入口付近における異常放電を確実に防止する。 【解決手段】このマイクロ波プラズマ処理装置は、チャンバ１０内に処理ガスを導入するためのガス導入機構として、誘電体窓５２を貫通する複数の誘電体窓ガス流路９４(1)～９４(8)にそれぞれ設けられる放電防止部材９６(1)～９６(8)を有している。各放電防止部材９６(n)は、その入口側の部分１１４が誘電体窓５２の裏面より上方に所定距離Ｈ以上の高さｈだけ突出していて、スロット板５４の開口５４ａを通ってガス分岐部９０の分岐ガス流路９２(n)の中に挿入されている。各放電防止部材９６(n)の突出部１１４の周りを囲んでいるガス分岐部９０、スプリングコイル１１６およびスロット板５４は包囲導体１１８を構成している。

Abstract translation: [问题]为了可靠地防止气体通道设置在电介质窗口之后靠近气体通道的入口处的异常放电，通过该电介质窗口，在室内传输用于产生等离子体的电磁波。 [微波等离子体处理装置]作为用于将室内（10）内的工作气体导入的气体导入机构，具有放电防止部件（96（1）〜96（8））， 多个电介质窗口气体通道（94（1）至（94（8）），电介质窗口（54）通过该电介质窗口气体通道，每个防放电构件（96（n）），其中一部分（114） 大于或等于预定距离H的高度h从入口侧的电介质窗口（52）的后表面向上穿过槽板（54）的开口（54a），并插入 分支气体通道（92（n）），气体分支部分（90），弹簧圈（116）和槽板（54），围绕每个的突出部分（114） 放电防止构件（96（n））构成封闭导体（118）。

公开(公告)号：EP3163598A1

公开(公告)日：2017-05-03

申请号：EP16192813

申请日：2016-10-07

Applicant: TOKYO ELECTRON LTD

Inventor： KANEKO KAZUSHI ,  KOYAMA KOJI

IPC: H01J37/32 ,  H05H1/46

CPC classification number: H01J37/32229 ,  H01J37/32192 ,  H01J37/32201 ,  H01J37/32266 ,  H01J37/32302 ,  H01J37/32311 ,  H01J37/32935 ,  H01J2237/327

Abstract: Detection accuracy of a power of a progressive wave and detection accuracy of a power of a reflection wave can be improved. In a plasma processing apparatus, a first directional coupler is provided in a first waveguide which is configured to connect a microwave generating unit and a first port of a circulator. A first detector is connected to the first directional coupler. A second port of the circulator is connected to a plasma generating unit via a second waveguide. Further, a second directional coupler is provided in a third waveguide which is configured to connect a third port of the circulator and a dummy load. A second detector is connected to the second directional coupler.

Abstract translation: 可以提高行波功率的检测精度和反射波功率的检测精度。 在等离子体处理装置中，第一定向耦合器设置在第一波导中，该第一波导配置为连接微波产生单元和循环器的第一端口。 第一检测器连接到第一定向耦合器。 循环器的第二端口经由第二波导连接到等离子体产生单元。 此外，第二定向耦合器被提供在第三波导中，该第三波导被配置成连接循环器的第三端口和假负载。 第二检测器连接到第二定向耦合器。

公开(公告)号：EP2702839A1

公开(公告)日：2014-03-05

申请号：EP12723249.4

申请日：2012-04-27

Applicant: Gasplas AS

Inventor： RISBY, Philip, John ,  PENNINGTON, Dale

IPC: H05H1/30 ,  H05H1/46

CPC classification number: H01J37/32449 ,  H01J37/32192 ,  H01J37/32201 ,  H01J37/32357 ,  H05H1/30 ,  H05H1/34 ,  H05H1/46 ,  H05H2001/3478 ,  H05H2001/4622

Abstract: The present invention relates to a method and device for processing a gas by forming microwave plasmas of the gas. The gas that is to be processed is set in a two or three co-axial vortex flow inside the device and exposed to a microwave field to form the plasma in the inner co-axial vortex flow, which subsequently is expelled as a plasma afterglow through an outlet of the device. The device is provided with a microwave field choking effect by having a diameter of the exit channel larger than zero but smaller than 1/16 of the wavelength of the standing microwave within the microwave chamber and a length, ∈, of the exit channel that may correspondingly have one of the following ranges: from a factor larger than zero but smaller than (n+1/8), n G {0, 1, 2, 3}, of the wavelength of the standing microwave within the microwave chamber.

公开(公告)号：EP0432573A3

公开(公告)日：1992-01-02

申请号：EP90122701.7

申请日：1990-11-28

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventor： Cuomo, Jerome John ,  Guarnieri, Charles Richard ,  Whitehair, Stanley

IPC: H05H1/46

CPC classification number: H01J37/32201 ,  H01J37/3222 ,  H05H1/46

Abstract: A solid state microwave generator is utilized as an excitation source for material/plasma processes. The invention provides very close precise control of the solid state device's power levels to control the ultimate power output and frequency which contol is not readily possible with vacuum tube devices. Utilizing the concepts of the invention the total power generated by the system may be easily varied and, further, the power may be easily monitored and used to control other device parameters such as frequency and the like. Because of the degree of control possible within the overall processs system of the invention any measurable physical property of the process such as temperature, power, color (e.g., optical pyrometer), or the like that can be monitored and converted to a control signal can be utililzed by the present system to carefully control the overall process conditions. These control features are lacking in currently available vacuum tube microwave devices. It is also probable that the overall cost of the solid state based microwave power generators systems will be far less than that of comparable tube type microwave generators.

公开(公告)号：EP0459177A2

公开(公告)日：1991-12-04

申请号：EP91107210.6

申请日：1991-05-03

Applicant: International Business Machines Corporation

Inventor： Cuomo, Jerome J. ,  Guarnieri, Charles R. ,  Whitehair, Stanley J.

IPC: H01J37/32 ,  H05H1/46

CPC classification number: H01J37/32201 ,  H01J37/32192 ,  H01J37/3222

Abstract: A solid state microwave generator energized phased antenna (10) array is utilized as the excitation source for material/plasma processes. Each antenna element (10) of the array is driven by a separate solid state microwave power source. Very close and precise control of each solid state generator's phase and amplitude is provided to control the amplitude of the composite power node, and electromagnetic field distribution produced by the array which control is not readily possible with vacuum tube devices and systems such as microwave oven magnetrons. Utilizing the concepts of the invention the total power generated by the system may be easily controlled. The phase of the individual elements may be used to control the location of the power node of the plasma within a reaction chamber (12) and to move said power node within the chamber (12) with no mechanical movement or physical alteration of the processing apparatus. Because of the degree of control possible within the overall processes system of the invention plasma processing methods may be performed which were not previously practical because a high power density plasma can be concentrated at any desired location in the reaction chamber (12) or scanned across a desired region. These control features are lacking in currently available vacuum tube microwave devices. It is also probable that the overall cost of such a solid state based microwave power generators systems will be far less than that of comparable tube type microwave generators especially as fabrication and control technology progresses.

Abstract translation: 固态微波发生器通电控天线（10）阵列被用作材料/等离子体工艺的激发源。 该阵列的每个天线元件（10）由一个单独的固态微波功率源驱动。 设置在每个固态发生器的相位和振幅的非常接近和精确的控制，以控制所述复合功率节点的振幅，并且通过该控制是不与真空管设备和系统容易实现阵列产生电磁场分布：如微波炉磁控管 ， 利用本发明系统所产生的总功率可以容易地控制的概念。 各个元件的相位可以被用于将反应室（12）内控制所述等离子体的功率节点的位置，并与处理装置的无机械运动或物理改变所述腔室（12）内移动，所述功率节点 ， 因为控制的程度可能的本发明的等离子体处理方法的整体流程系统内的可以执行先前没有实用，因为高功率密度等离子体可以在反应室（12）的任何所需位置被集中或跨扫描 所需的区域。 这些控制功能缺乏当前可用的真空管微波器件。 因此，可能没有寻求基于固态微波发电系统的总成本将远远低于可比管式微波发生器的爱尤其是制造和控制技术的进步。

公开(公告)号：EP2221850B1

公开(公告)日：2012-02-22

申请号：EP09160865.3

申请日：2009-05-21

Applicant: Postech Academy-Industry- Foundation

Inventor： Choi, Jun ,  Lee, Jae Koo ,  Sim, Jae Yoon

IPC: H01J37/32

CPC classification number: H01J37/32825 ,  H01J37/32192 ,  H01J37/32201 ,  H05H1/46

公开(公告)号：EP2221850A1

公开(公告)日：2010-08-25

申请号：EP09160865.3

申请日：2009-05-21

Applicant: Postech Academy-Industry Foundation

Inventor： Choi, Jun ,  Lee, Jae Koo ,  Sim, Jae Yoon

IPC: H01J37/32

CPC classification number: H01J37/32825 ,  H01J37/32192 ,  H01J37/32201 ,  H05H1/46

Abstract: Provided is a portable power supply apparatus for generating microwave plasma, capable of minimizing a power reflected from a plasma generation apparatus and improving power consumption of the plasma generation apparatus by generating the plasma by using a microwave having a specific frequency, monitoring the power reflected from the plasma generation apparatus after the generation of the plasma, detecting a changed impedance matching condition, and correcting the frequency.

Abstract translation: 提供了一种用于产生微波等离子体的便携式电源装置，其能够使从等离子体发生装置反射的功率最小化，并且通过使用具有特定频率的微波产生等离子体来改善等离子体产生装置的功率消耗，监测从 在产生等离子体之后的等离子体产生装置，检测改变的阻抗匹配条件，以及校正频率。