Abstract:
Optical waveguide fiber having low water peak as well as optical waveguide fiber preforms and methods of making optical waveguide fiber preforms from which low water peak and/or low hydrogen aged attenuation optical waveguide fibers are formed, including optical waveguide fiber and preforms made via OVD. The fibers may be hydrogen resistant, i.e. exhibit low hydrogen aged attenuation. A low water peak, hydrogen resistant optical waveguide fiber is disclosed which exhibits an optical attenuation at a wavelength of about 1383 nm which is less than or equal to an optical attenuation exhibited at a wavelength of about 1310 nm.
Abstract:
The present invention is directed to a method of making an ultra dry high purity, Cl-free, F doped fused silica glass. Silica powder or soot preforms are used to form a glass under conditions to provide a desired level of F doping while reducing the Cl and nullOH concentrations to trace levels. The method includes providing a glass precursor in the from of a silica powder or soot preform. The powder is heated in a furnace. The powder is exposed to a F-species at a predetermined temperature and time sufficient to melt the powder and form a high purity fused silica glass in the bottom of said furnace.
Abstract:
The optical fiber which enables the optical fiber transmission stabilized in the wavelength range of the pump light also, which is not used conventionally, and suppresses the non-linear effect on the occasion of WDM transmission is offered. The optical fiber for WDM transmission has at least three or more layers wherein the first core doped with germanium is located at the center and surrounded by the second core having a refractive index lower than the first core, and cladding having a refractive index lower than the first core and higher than second core surrounds the second or last core layer. The single mode optical fiber for WDM transmission has the following characteristics: cut off wavelength of 1400 nm or less, chromatic dispersion of 5-13 ps/nm/km at 1500 nm, zero dispersion wavelength of 1400 nm or less and transmission loss of 0-5 dB/km or less in the wavelength range from cut off wavelength to 1600 nm
Abstract:
The present invention is a method of making a lithography photomask and photomask blank. The method of making the lithography photomask and photomask blank includes providing a silicon oxyfluoride glass tube having an OH content less than 50 ppm. The method further includes cutting the silicon oxyfluoride glass tube, flattening the silicon oxyfluoride glass tube, and forming the flattened cut silicon oxyfluoride glass tube into a photomask blank having a planar surface. The present invention includes a glass lithography mask preform. The glass lithography mask preform is a longitudinal silicon oxyfluoride glass tube that has an OH content ≦10 ppm, a F wt. % concentration ≧0.5 wt. %.
Abstract:
High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed with the silicon oxyfluoride glass having a preferred fluorine content
Abstract translation:公开了具有优选氟含量<0.5重量%的氟氧化硅玻璃,适合用作光刻应用中的低于190nm的VUV波长区域的光掩模基板的高纯度氟氧化硅玻璃。 本发明的氟氧化硅玻璃在157nm波长下是透射的,使其特别适用于157nm波长区域的光掩模衬底。 本发明的光掩模基材是“真空”的氟氧化硅玻璃,其在真空紫外(VUV)波长区域中表现出非常高的透射率,同时保持通常与高纯度熔融石英相关的优异的热和物理性能。 除了含氟并且具有很少或不具有OH含量之外,本发明的适合用作157nm的光掩模衬底的氟氧化硅玻璃的特征还在于具有小于1×10 17分子/ cm 3的分子氢和低 氯水平。
Abstract:
A silica optical fiber is provided, which contains a pure-silica core and a cladding layer formed on the pure-silica core, wherein the pure-silica core contains a C element and has a content of elements belonging to the third period-the seventh period of the periodic table, except Si element that constitutes the quartz structure, of not more than 100 ppm. The present invention can provide a silica optical fiber superior in the resistance to high energy electromagnetic waves such as UV light and &ggr;-rays.
Abstract:
A method for making silica includes delivering a silica precursor comprising a perfluorinated group to a conversion site and passing the silica precursor through a conversion flame to produce silica soot.
Abstract:
Optical waveguide fiber having low water peak as well as optical waveguide fiber preforms and methods of making optical waveguide fiber preforms from which low water peak and/or low hydrogen aged attenuation optical waveguide fibers are formed, including optical waveguide fiber and preforms made via OVD. The fibers may be hydrogen resistant, i.e. exhibit low hydrogen aged attenuation. A low water peak, hydrogen resistant optical waveguide fiber is disclosed which exhibits an optical attenuation at a wavelength of about 1383 nm which is less than or equal to an optical attenuation exhibited at a wavelength of about 1310 nm.
Abstract:
Methods of fabricating an optical fiber preform and a method of fabricating an optical fiber of the invention realize the fabrication of an optical fiber having desirable transmission characteristics in the entire wavelength rage of about 1.3 to 1.6 nullm. The fabrication method comprisses a porous core rod producing step of depositing a first cladding (3) having an outer diameter D so as to surround a core (2) having an outer diameter d to produce a porous core rod (1) of D/dnull4.0 by VAD. Then, the porous core rod (1) is dehydrated to reduce the OH group concentration to 0.8 ppb or less by weight ratio. The porous core rod (1) is formed to be transparent for a vitrified core rod (4) and is heated and stretched. Thereafter, a second cladding is obtained by depositing a second porous cladding (5) around the vitrified core rod (4) by VAD to be dehydrated, transparent and vitrified. The optical fiber preform thus fabricated is drawn to form into an optical fiber and is then allowed to stand in a deuterium gas atmosphere for a predetermined period.
Abstract:
High purity direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive direct deposit vitrified silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a dry direct deposit vitrified silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1null1017 molecules/cm3 of molecular hydrogen and low chlorine levels.
Abstract translation:公开了适用于在190nm以下的VUV波长区域中用于光刻应用的光掩模基板的高纯度直接沉积玻璃化硅氧氟化物玻璃。 本发明的直接沉积玻璃化硅氧氟化物玻璃在157nm波长附近是透射的,使其特别适用于157nm波长区域的光掩模衬底。 本发明的光掩模基材是在真空紫外(VUV)波长区域中显示非常高的透射率的干直接沉积玻璃化硅氧氟化物玻璃,同时保持通常与高纯度熔融二氧化硅相关的优异的热和物理性能。 除了含氟且具有很少或不含OH含量之外,本发明的适用于157nm的光掩模衬底的直接沉积玻璃化氟氧化硅玻璃的特征还在于具有小于1×10 17分子/ cm 3的分子氢和低氯水平。