公开(公告)号：EP1171799A1

公开(公告)日：2002-01-16

申请号：EP00913438.8

申请日：2000-02-11

Applicant: CORNING INCORPORATED

Inventor： BERKEY, George, E. ,  MOORE, Lisa, A. ,  YU, Charles, C.

IPC: G03F1/14 ,  C03B19/14 ,  C03C3/06

CPC classification number: C03C4/0085 ,  C03B19/1415 ,  C03B19/1423 ,  C03B19/1453 ,  C03B19/1469 ,  C03B19/1492 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2207/02 ,  C03B2207/06 ,  C03B2207/20 ,  C03B2207/32 ,  C03B2207/52 ,  C03B2207/54 ,  C03B2207/66 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/21 ,  G03F1/60

Abstract: The invention includes methods of making lithography photomask blanks. The invention also includes lithography photomask blanks and preforms for producing lithography photomask. The method of making a lithography photomask blank includes providing a soot deposition surface, producing SiO2 soot particles and projecting the SiO2 soot particles toward the soot deposition surface. The method includes successively depositing layers of the SiO2 soot particle on the deposition surface to form a coherent SiO2 porous glass preform body comprised of successive layers of the SiO2 soot particles and dehydrating the coherent SiO2 glass preform body to remove OH from the preform body. The SiO2 is exposed to and reacted with a fluorine containing compound and consolidated into a nonporous silicon oxyfluoride glass body with parallel layers of striae. The method further includes forming the consolidated silicon oxyfluoride glass body into a photomask blank having a planar surface with the orientation of the striae layer parallel to the photomask blank planar surface.

公开(公告)号：EP1161403A1

公开(公告)日：2001-12-12

申请号：EP00908593.7

申请日：2000-02-11

Applicant: CORNING INCORPORATED

Inventor： BERKEY, George, D. ,  MOORE, Lisa, A. ,  PIERSON, Michelle, D.

IPC: C03B19/14 ,  C03C3/06 ,  G03F1/14

CPC classification number: C03C4/0085 ,  C03B19/1453 ,  C03B19/1469 ,  C03B23/043 ,  C03B23/045 ,  C03B23/051 ,  C03B23/07 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03C3/06 ,  C03C2201/12 ,  C03C2203/50 ,  G03F1/60

Abstract: The present invention is a method of making a lithography photomask and photomask blank. The method of making the lithography photomask and photomask blank includes providing a silicon oxyfluoride glass tube having an OH content less than 50 ppm. The method further includes cutting the silicon oxyfluoride glass tube, flattening the silicon oxyfluoride glass tube, and forming the flattened cut silicon oxyfluoride glass tube into a photomask blank having a planar surface. The present invention includes a glass lithography mask preform. The glass lithography mask preform is a longitudinal silicon oxyfluoride glass tube that has an OH content ≤ 10 ppm, an F wt. % concentration ≥ 0.5 wt. %.

公开(公告)号：EP1125897A1

公开(公告)日：2001-08-22

申请号：EP00937201.2

申请日：2000-06-09

Applicant: ASAHI GLASS COMPANY LTD.

Inventor： IKUTA, Yoshiaki Asahi Glass Company Ltd. ,  KIKUGAWA, Shinya Asahi Glass Company Ltd. ,  MASUI, Akio ,  SIMODAIRA, Noriaki Asahi Glass Company Ltd. ,  YOSHIZAWA, Shuhei Asahi Glass Company Ltd.

IPC: C03B8/04 ,  C03B20/00 ,  C03C3/06

CPC classification number: C03B19/1415 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2207/30 ,  C03B2207/32 ,  C03B2207/36 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/54 ,  Y02P40/57

Abstract: A synthetic quartz glass to be used for light with a wavelength of from 150 to 200 nm, wherein the OH group concentration is at most 100 ppm, the hydrogen molecule concentration is at most 1×10 17 molecules/cm 3 , reduction type defects are at most 1×10 15 defects/cm 3 , and the relation between Δk 163 and Δk 190 , as between before and after irradiation of ultraviolet rays, satisfies 0 163 190 , and a process for its production.

公开(公告)号：EP0401845B2

公开(公告)日：2001-04-11

申请号：EP90110854.8

申请日：1990-06-08

Applicant: Heraeus Quarzglas GmbH & Co. KG ,  SHIN-ETSU QUARTZ PRODUCTS CO., LTD.

Inventor： Yamagata, Shigeru ,  Inaki Kyoichi ,  Matsuya, Toshikatu ,  Takke, Ralf ,  Thomas, Stephan ,  Fabian, Heinz

IPC: G02B1/00 ,  C03C3/06

CPC classification number: G03F7/70241 ,  C03B19/1423 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/06 ,  C03B2207/08 ,  C03B2207/12 ,  C03B2207/14 ,  C03B2207/20 ,  C03B2207/32 ,  C03B2207/36 ,  C03B2207/42 ,  C03C3/06 ,  C03C23/007 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/54 ,  G02B1/00 ,  Y02P40/57 ,  Y10S65/90

公开(公告)号：EP0835848A2

公开(公告)日：1998-04-15

申请号：EP97114460.5

申请日：1997-08-21

Applicant: NIKON CORPORATION

Inventor： Fujiwara, Seishi,c/o Nikon Corporation ,  Hiraiwa, Hiroyuki, c/o Nikon Corporation ,  Nakagawa, Kazuhiro, c/o Nikon Corporation ,  Yajima, Shouji, c/o Nikon Corporation ,  Komine, Norio, c/o Nikon Corporation ,  Jinbo, Hiroki, c/o Nikon Corporation

IPC: C03C3/06 ,  C03B8/04 ,  C03B19/14 ,  G03F7/20

CPC classification number: C03B19/14 ,  C03B37/014 ,  C03B37/0142 ,  C03B2201/07 ,  C03B2207/66 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/42 ,  C03C2203/46 ,  G03F7/2004 ,  Y02P40/57 ,  Y10S501/905

Abstract: The invention relates to fluorine-containing silica glasses, and methods of their production. The silica glass may be used for an ultraviolet light optical system in which light in a wavelength region of 200 nm or less, such as an ArF (193nm) excimer laser, is used. The invention also relates to a projection exposure apparatus containing fluorine-containing glass of the invention.

Abstract translation: 本发明涉及含氟二氧化硅玻璃及其制造方法。 石英玻璃可以用于使用ArF（193nm）准分子激光等200nm以下的波长区域的光的紫外线光学系统。 本发明还涉及一种含有本发明的含氟玻璃的投射曝光设备。

公开(公告)号：EP0546196B1

公开(公告)日：1997-05-02

申请号：EP92913798.2

申请日：1992-06-29

Applicant: SHIN-ETSU QUARTZ PRODUCTS CO., LTD.

Inventor： NISHIMURA, Hiroyuki, Shin-Etsu Quartz Co.Ltd. ,  FUJINOKI, Akira, Shin-Etsu Quartz Co.Ltd Sekieigi ,  MATSUYA, Toshikatsu, Shin-Etsu Quartz Co.Ltd.Seki ,  INAKI, Kyoichi, Shin-Etsu Quartz Products Co.Ltd. ,  KATO, Toshiyuki, Shin-Etsu Quartz Products Co.Ltd ,  SHIMADA, Atsushi, Shin-Etsu Quartz Co. Ltd.

IPC: C03C3/06 ,  C03B8/04 ,  C03B20/00 ,  G02B1/02 ,  C03C4/00 ,  C03C23/00 ,  G02B1/00 ,  C03B32/00

CPC classification number: C03B37/014 ,  C03B19/1415 ,  C03B19/1453 ,  C03B2201/02 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2203/22 ,  C03B2207/32 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  G03F7/70958 ,  Y02P40/57 ,  Y10S65/08 ,  Y10S501/90

Abstract: A synthetic quartz glass optical member for an ultraviolet laser, suitably applicable as a stepper lens of a lithographer using an excimer laser beam and other optical members, wherein the quartz glass has a hydroxyl content of 10 to 100 ppm, a chlorine content of 200 ppm or less, a hydrogen content of 1 x 1016 molecules/cm3 or less, a homogeneity of refractive index of 5 x 10-6 or less in terms of Δn, and a birefringence of 5 nm/cm or less. The optical member can be produced by subjecting a volatile silicon compound to flame hydrolysis with oxyhydrogen flame, depositing the formed particulate silica on a heat-resistant support to prepare a porous silica matrix, heating the matrix in a vacuum as high as 1 x 10-2 Torr or above to a temperature of 1,400 °C or above to effect dehydration and degassing, homogenizing the resultant transparent quartz glass into highly homogeneous quartz glass free from striae in at least one direction, molding the highly homogeneous quartz glass, and annealing the molded glass.

公开(公告)号：EP0405580B1

公开(公告)日：1994-03-02

申请号：EP90112460.2

申请日：1990-06-29

Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.

Inventor： Ishikawa, Shinji, C/o Yokohama Work ,  Ohga, Yuichi, C/o Yokohama Work ,  Tsuchiya, Ichiro, c/o Yokohama Work ,  Kanamori, Hiroo, C/o Yokohama Work ,  Yokota, Hiroshi, C/o Yokohama Work ,  Kyoto, Michihisa, C/o Yokohama Work

IPC: C03B37/012

CPC classification number: C03B37/01446 ,  C03B37/0146 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  Y10S65/16 ,  Y10S65/90

公开(公告)号：EP0557587A1

公开(公告)日：1993-09-01

申请号：EP92120012.7

申请日：1992-11-25

Applicant: Heraeus Quarzglas GmbH

Inventor： Fabian, Heinz ,  Thomas, Stephan, Dr.

IPC: G02B6/10 ,  G02B6/42

CPC classification number: C03C3/06 ,  A61B18/22 ,  C03B2201/07 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2207/36 ,  C03C4/0085 ,  C03C2201/23 ,  G02B6/122 ,  G02B6/4296

Abstract: Es wird ein Bauteil für die Übertragung von Licht hoher Energiedichte mit einer Wellenlänge zwischen 250 nm und 400 nm aus synthetischem, hochreinem Quarzglas beschrieben, bei dem zur Erzielung einer möglichst geringen Transmissionsänderung bei der Übertragung des Lichtes, das Quarzglas einen Hydroxylionengehalt im Bereich zwischen 50 ppm und 1200 ppm und einen unterstöchiometrischen Gehalt an Sauerstoff aufweist.

Abstract translation: 给出了从合成的超纯熔凝石英传输波长在250nm和400nm之间的高能量密度的光的组件的描述，其中为了尽可能低地实现传输的变化，当 光透过时，熔融石英的羟基离子含量在50ppm和1200ppm之间，氧化的化学计量含量。

公开(公告)号：EP0483752A3

公开(公告)日：1993-04-28

申请号：EP91118411.7

申请日：1991-10-29

Applicant: SHIN-ETSU QUARTZ PRODUCTS CO., LTD. ,  Heraeus Quarzglas GmbH

Inventor： Yamagata, Shigeru ,  Kuriyama, Michiyou ,  Inaki, Kyoichi ,  Takke, Ralf

IPC: C03C3/06 ,  C03C4/00 ,  C03C21/00 ,  C03B20/00 ,  C03B29/02 ,  C03B32/02

CPC classification number: G03F7/70958 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C4/0071 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/10 ,  C03C2203/54 ,  G02B1/00 ,  G03F7/70241 ,  H01S3/034 ,  Y10S359/90 ,  Y10S501/905

Abstract: This invention relates to an optical member made of synthetic silica glass of high-purity and transparency, and a method for manufacture a blank thereof or the optical member, and more especially to optical members assembled in assembled in various apparatus employing such high-power laser beams as an excimer laser. The optical member comprising: having absolute refractive index, n d , of 1.460 or more, and having hydrogen molecule concentration of about 5 x 10¹⁶ molecules/cm³ or more.

公开(公告)号：EP3390301A1

公开(公告)日：2018-10-24

申请号：EP16815839.2

申请日：2016-12-16

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： OTTER, Matthias ,  LEHMANN, Walter ,  HÜNERMANN, Michael ,  NIELSEN, Nils Christian ,  WHIPPEY, Nigel Robert ,  GROMANN, Boris ,  KPEBANE, Abdoul-Gafar ,  KAYSER, Thomas

IPC: C03B20/00 ,  C03C12/00 ,  C03B19/10 ,  C03B37/012 ,  C03C3/06 ,  C03B19/06

CPC classification number: C03B19/106 ,  C03B17/04 ,  C03B19/066 ,  C03B19/108 ,  C03B19/1095 ,  C03B2201/07 ,  C03B2201/23 ,  C03C3/06 ,  C03C13/045 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2203/44 ,  C03C2203/54

Abstract: The invention relates to a method for producing a silica glass article, involving method steps i.) providing a silica granulate, ii.) forming a glass melt from the silica granulate, and iii.) forming a silica glass article from at least some of the glass melt, step i.) consisting of steps I. producing a silica powder using at least two particles made from a silicon-chlorine compound, II. bringing the silica powder into contact with ammonia so as to obtain a treated silica powder, and III. granulating the treated silica powder so as to obtain a silica granulate, the chlorine content of the silica powder being higher than the chlorine content of the silica granulate. The invention further relates to a silica glass article that can be obtained by said method. The invention also relates to a method for producing a silica granulate. The invention finally relates to an optical waveguide, an illuminant and a molded article, each of which can be obtained by further processing the silica glass article.