公开(公告)号：EP1164629A1

公开(公告)日：2001-12-19

申请号：EP00911386.1

申请日：2000-03-27

Applicant: ASAHI GLASS COMPANY LTD. ,  Semiconductor Leading Edge Technologies, Inc.

Inventor： OGAWA, Tohru ,  HOSONO, Hideo ,  KIKUGAWA, Shinya ,  IKUTA, Yoshiaki ,  MASUI, Akio ,  SHIMODAIRA, Noriaki ,  YOSHIZAWA, Shuhei

IPC: H01L21/027 ,  G03F1/14 ,  C03C3/06 ,  C03B20/00

CPC classification number: G03F7/70058 ,  G03F7/70241 ,  G03F7/70958

Abstract: An exposure apparatus, wherein at least one of optical members constituting an exposure light source system, an illuminating optical system, a photomask and a projection optical system, is made of a synthetic quartz glass for an optical member, which has an absorption coefficient of 0.70 cm -1 or less at a wavelength of 157 nm and an infrared absorption peak attributable to SiOH stretching vibration at about 3640 cm -1 .

Abstract translation: 一种曝光装置，其中构成曝光光源系统的光学构件，照明光学系统，光掩模和投影光学系统中的至少一个由用于光学构件的合成石英玻璃制成，其吸收系数为0.70 cm -1以下，波长157nm处的红外吸收峰，以及在约3640cm -1处的SiOH伸缩振动引起的红外吸收峰。

公开(公告)号：EP1125897A1

公开(公告)日：2001-08-22

申请号：EP00937201.2

申请日：2000-06-09

Applicant: ASAHI GLASS COMPANY LTD.

Inventor： IKUTA, Yoshiaki Asahi Glass Company Ltd. ,  KIKUGAWA, Shinya Asahi Glass Company Ltd. ,  MASUI, Akio ,  SIMODAIRA, Noriaki Asahi Glass Company Ltd. ,  YOSHIZAWA, Shuhei Asahi Glass Company Ltd.

IPC: C03B8/04 ,  C03B20/00 ,  C03C3/06

CPC classification number: C03B19/1415 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2207/30 ,  C03B2207/32 ,  C03B2207/36 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/54 ,  Y02P40/57

Abstract: A synthetic quartz glass to be used for light with a wavelength of from 150 to 200 nm, wherein the OH group concentration is at most 100 ppm, the hydrogen molecule concentration is at most 1×10 17 molecules/cm 3 , reduction type defects are at most 1×10 15 defects/cm 3 , and the relation between Δk 163 and Δk 190 , as between before and after irradiation of ultraviolet rays, satisfies 0 163 190 , and a process for its production.

公开(公告)号：EP1088795A1

公开(公告)日：2001-04-04

申请号：EP00911387.9

申请日：2000-03-27

Applicant: ASAHI GLASS COMPANY LTD.

Inventor： KIKUGAWA, Shinya, Asahi Glass Company, Limited ,  IKUTA, Yoshiaki, Asahi Glass Company, Limited ,  MASUI, Akio ,  SHIMODAIRA, Noriaki, Asahi Glass Company, Limited ,  YOSHIZAWA, Shuhei, Asahi Glass Company, Limited

IPC: C03B20/00 ,  C03C3/06 ,  H01L21/027

CPC classification number: C03C23/002 ,  B08B7/0057 ,  C03B19/1453 ,  C03B19/1469 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03C3/06 ,  C03C2201/23 ,  C03C2203/50 ,  Y02P40/57

Abstract: A process for producing a synthetic quartz glass for an optical member, which comprises a step of irradiating a synthetic quartz glass having an OH group content of 50 ppm or lower with vacuum ultraviolet light having a wavelength of 180 nm or shorter to improve the transmittance in a region of wavelengths of not longer than 165 nm.

Abstract translation: 一种生产用于在光学部件的合成石英玻璃，其包括照射具有与具有180纳米或更短的波长的真空紫外光，以改善透射率在50ppm以下的OH基含量的合成石英玻璃的步骤的过程 不大于165纳米的较长波长的区域中。

公开(公告)号：EP1067097A1

公开(公告)日：2001-01-10

申请号：EP99962506.4

申请日：1999-12-24

Applicant: ASAHI GLASS COMPANY LTD.

Inventor： IKUTA, Yoshiaki, Asahi Glass Company, Limited ,  KIKUGAWA, Shinya, Asahi Glass Company, Limited ,  MASUI, Akio ,  SHIMODAIRA, Noriaki, Asahi Glass Company, Limited ,  YOSHIZAWA, Shuhei, Asahi Glass Company, Limited

IPC: C03C3/06 ,  C03B8/04 ,  C03B20/00

CPC classification number: C03B19/1453 ,  C03B2201/03 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C23/002 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/44 ,  C03C2203/54 ,  Y02P40/57

Abstract: A synthetic quartz glass to be used for light in a vacuum ultraviolet region with a wavelength of at most 175 nm, which is characterized in that the OH group content in the synthetic quartz glass is less than 10 ppm, and it contains substantially no reduction type defects.