MEMS PARTICLE SORTING ACTUATOR AND METHOD OF MANUFACTURE
    35.
    发明申请
    MEMS PARTICLE SORTING ACTUATOR AND METHOD OF MANUFACTURE 有权
    MEMS颗粒分级致动器及其制造方法

    公开(公告)号:US20150031120A1

    公开(公告)日:2015-01-29

    申请号:US13987464

    申请日:2013-07-29

    Abstract: A MEMS-based system and a method are described for separating a target particle from the remainder of a fluid stream. The system makes use of a unique, microfabricated movable structure formed on a substrate, which moves in a rotary fashion about one or more fixed points, which are all located on one side of the axis of motion. The movable structure is actuated by a separate force-generating apparatus, which is entirely separate from the movable structure formed on its substrate. This allows the movable structure to be entirely submerged in the sample fluid.

    Abstract translation: 描述了基于MEMS的系统和方法,用于将目标颗粒与流体流的其余部分分离。 该系统利用形成在基板上的独特的微加工可移动结构,其以旋转方式围绕一个或多个固定点移动,所述固定点都位于运动轴的一侧。 可移动结构由独立的力产生装置致动,该装置与其基板上形成的可移动结构完全分开。 这允许可移动结构完全浸没在样品流体中。

    Eight spring dual substrate MEMS plate switch and method of manufacture

    公开(公告)号:US11305982B2

    公开(公告)日:2022-04-19

    申请号:US16515943

    申请日:2019-07-18

    Abstract: Systems and methods for forming an electrostatic MEMS plate switch include forming a deformable plate on a first substrate, forming the electrical contacts on a second substrate, and coupling the two substrates using a hermetic seal. A two-fold symmetric switch may be formed by a primary, secondary, and optionally tertiary set of voids formed in the movable plate. These voids may define the spring beams which provide a stable and reliable restoring force to the switch.

    METHOD FOR ETCHING SHAPES INTO SILICON
    38.
    发明申请

    公开(公告)号:US20190304794A1

    公开(公告)日:2019-10-03

    申请号:US16369140

    申请日:2019-03-29

    Abstract: The method described here uses gray scale lithography to form curve surfaces in photoresist. These surfaces can be of arbitrary shape since the remaining resist following exposure and develop is dependent on the exposure dose, which is controlled precisely by the opacity of the photo-mask. The process may include a silicon etch step, followed by a photoresist etch step to form an etching cycle. Each etch cycle may form a pair of substantially orthogonal stepped surfaces, with a characteristic “rise” and “run.”

    SCANNING OPTICAL BEAM SOURCE
    40.
    发明申请

    公开(公告)号:US20190137611A1

    公开(公告)日:2019-05-09

    申请号:US16164802

    申请日:2018-10-19

    Abstract: We describe here a scanning optical beam that is comprised of no moving parts The device includes a plurality of microfabricated beam shaping elements disposed in an array wherein each microfabricated beam shaping element is registered with a microfabricated light source but has an optical axis that is offset from the optical axis of the light source by a different amount, wherein the amount is a function of the distance from a center of the arrays. A method of operating the scanning optical beam is also described.

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