公开(公告)号：DE69923182D1

公开(公告)日：2005-02-17

申请号：DE69923182

申请日：1999-03-17

Applicant: OSMIC INC

Inventor： VERMAN BORIS ,  JIANG LICAI

IPC: G01N23/20 ,  G01N23/207

Abstract: An x-ray diffractometer system comprising an x-ray optic which directs x-rays, a sample placed into said directed x-rays, wherein said sample diffracts said directed x-rays, creating a diffraction pattern, a translation stage coupled to said sample for moving said sample within said directed x-rays, whereby the resolution, angular range, and intensity of said diffraction pattern may be adjusted, and an x-ray detector for registering said diffraction pattern.

公开(公告)号：DE29924462U1

公开(公告)日：2003-06-18

申请号：DE29924462

申请日：1999-02-18

Applicant: OSMIC INC

IPC: G21K1/06 ,  A61N5/10

公开(公告)号：AT241848T

公开(公告)日：2003-06-15

申请号：AT99934364

申请日：1999-02-18

Applicant: OSMIC INC

Inventor： GUTMAN GEORGE ,  JIANG LICAI ,  VERMAN BORIS

IPC: G21K1/06

Abstract: An x-ray reflecting system comprising a plurality of x-ray reflectors, wherein the x-ray reflectors are coupled together to form a Kirkpatrick-Baez side-by-side system of multiple corners and may include multi-layer or graded-d multi-layer Bragg x-ray reflective surfaces.

公开(公告)号：AU2002258469A1

公开(公告)日：2002-09-19

申请号：AU2002258469

申请日：2002-03-01

Applicant: OSMIC INC

Inventor： MARTYNOV VLADIMIR V ,  PLATONOV YURIY

IPC: G21K1/06 ,  G03H5/00

Abstract: An analyzer that includes a first multilayer structure, a spacer material deposited on the first multilayer structure and a second multilayer structure deposited on the spacer material.

公开(公告)号：AU2685199A

公开(公告)日：1999-09-06

申请号：AU2685199

申请日：1999-02-18

Applicant: OSMIC INC

Inventor： GUTMAN GEORGE ,  JIANG LICAI ,  VERMAN BORIS

IPC: G02B17/00 ,  G21K1/06

Abstract: An x-ray reflecting system comprising a Kirkpatrick-Baez side-by-side optic in a single corner configuration having multi-layer Bragg x-ray reflective surfaces.

公开(公告)号：CA2321005A1

公开(公告)日：1999-08-26

申请号：CA2321005

申请日：1999-02-18

Applicant: OSMIC INC

Inventor： GUTMAN GEORGE ,  VERMAN BORIS ,  JIANG LICAI

IPC: G21K1/06

Abstract: An x-ray reflecting system comprising a plurality of x-ray reflectors, wherein said x-ray reflectors are coupled together to form a Kirkpatrick-Baez side-by-side system of multiple corners and may include multi-layer or graded-d multilayer Bragg x-ray reflective surfaces.

公开(公告)号：CZ301342B6

公开(公告)日：2010-01-20

申请号：CZ20003042

申请日：1999-02-18

Applicant: OSMIC

Inventor： GUTMAN GEORGE ,  JIANG LICAI ,  VERMAN BORIS

IPC: G02B17/06 ,  G02B17/00 ,  G02B17/02 ,  G21K1/06 ,  G21K7/00

Abstract: Systém pro úpravu rentgenových paprsku obsahuje zdroj rentgenových paprsku pro generování svetelného svazku rentgenových paprsku, dopadajícího na Kirkpatrick-Baezovu optiku (16) typu vedle sebe, mající vícevrstvé Braggovy odrazové plochy (18a, 18b) rentgenových paprsku. Odrazové plochy (18a, 18b) rentgenových paprsku jsou usporádány vedle sebe pod úhlem 90.degree. pro odrážení svazku rentgenových paprsku od techto odrazových ploch (18a, 18b) ve dvou smerech pro nezávislé vytvárení upraveného svazku rentgenových paprsku pro pusobení na príslušnou strukturu. Vícevrstvé Braggovy odrazové plochy (18a, 18b) rentgenových paprsku mají bocne odstupnovanou vzdálenost d.

公开(公告)号：DE602004012562T2

公开(公告)日：2009-04-16

申请号：DE602004012562

申请日：2004-06-10

Applicant: OSMIC INC

Inventor： VERMAN BORIS ,  HARADA JIMPEI

IPC: G21K1/00 ,  G02B26/08 ,  G21K1/06

Abstract: The present invention provides an x-ray beam conditioning system with a Kirkpatrick-Baez diffractive optic including two optical elements, of which one of the optical elements is a crystal. The elements are arranged in a side-by-side configuration. The crystal can be a perfect crystal. One or both diffractive elements can be mosaic crystals. One element can be a multilayer optic. For example, the multilayer optic can be an elliptical mirror or a parabolic mirror with graded d-spacing. The graded d-spacing can be either lateral grading or depth grading, or both.

公开(公告)号：DE602004012562D1

公开(公告)日：2008-04-30

申请号：DE602004012562

申请日：2004-06-10

Applicant: OSMIC INC

Inventor： VERMAN BORIS ,  HARADA JIMPEI

IPC: G21K1/00 ,  G02B26/08 ,  G21K1/06

Abstract: The present invention provides an x-ray beam conditioning system with a Kirkpatrick-Baez diffractive optic including two optical elements, of which one of the optical elements is a crystal. The elements are arranged in a side-by-side configuration. The crystal can be a perfect crystal. One or both diffractive elements can be mosaic crystals. One element can be a multilayer optic. For example, the multilayer optic can be an elliptical mirror or a parabolic mirror with graded d-spacing. The graded d-spacing can be either lateral grading or depth grading, or both.

公开(公告)号：DE602004003347D1

公开(公告)日：2007-01-04

申请号：DE602004003347

申请日：2004-02-26

Applicant: OSMIC INC

Inventor： VERMAN BORIS ,  JIANG LICAI

IPC: G21K1/06 ,  G21K1/04

Abstract: An x-ray optical device includes an optic and an adjustable aperture that selectively occludes a portion of an x-ray beam. The adjustable aperture may be positioned between the optic and a sample and may be integrated with the optic or located in close proximity to the optic. The adjustable aperture enables a user to easily and effectively adjust the convergence of the x-rays. In doing so, the flux and resolution of the x-ray optical device can be optimized by using an optic having the maximum convergence allowed for all potential measurements, and then selecting a convergence for a particular measurement by adjusting the aperture.