公开(公告)号：KR1020150002972A

公开(公告)日：2015-01-08

申请号：KR1020130074870

申请日：2013-06-27

Applicant: 한국화학연구원

Inventor： 최원진 ,  이정오 ,  박동원 ,  박세린 ,  양철수 ,  김범수

IPC: G01B7/16 ,  G01L1/20

CPC classification number: G01B7/16 ,  G01L1/20 ,  G01N27/308 ,  G01N27/4111 ,  G01N27/4146

Abstract: The present invention relates to a bipolar strain sensor having a carbon nanotube (CNT) network film on a flexible substrate and a manufacturing method thereof. The bipolar strain sensor of the present invention can electrically detect and measure the size and orientation of the strain by applying metallic carbon nanotubes and the semiconducting carbon nanotubes, which are randomly arranged and connected, on one surface of the flexible substrate. Moreover, the bipolar strain sensor of the present invention has an advantage of being mass-manufactured at low cost through an easy and simple process and of being used as a chemical sensor capable of electrically detecting the presence and concentration of certain chemicals.

Abstract translation: 本发明涉及一种在柔性基板上具有碳纳米管（CNT）网状膜的双极应变传感器及其制造方法。 本发明的双极应变传感器可以通过在柔性基板的一个表面上施加金属碳纳米管和随机排列和连接的半导体碳纳米管来电检测和测量该应变的尺寸和取向。 此外，本发明的双极应变传感器具有通过简单且简单的方法以低成本批量制造并且用作能够电检测某些化学品的存在和浓度的化学传感器的优点。

公开(公告)号：KR1020140010649A

公开(公告)日：2014-01-27

申请号：KR1020120077173

申请日：2012-07-16

Applicant: 한국화학연구원

Inventor： 최원진 ,  이정오 ,  양철수

IPC: H01L21/027

CPC classification number: H01L21/0274 ,  B29C59/026 ,  B32B37/1207

Abstract: The purpose of the present invention is to provide a method for fabricating a thin film pattern using soft lithography and a thin film pattern fabricated by the same. The soft lithography used for the method for fabricating a thin film pattern according to the present invention comprises: a first step of depositing a thin film on a substrate; a second step of forming a silicon resin adhesive layer on the thin film; a third step of fabricating a silicon resin stamp for forming a pattern on the thin film; a fourth step of converting the adhesive layer formed in the second step and the pattern part of the silicon resin stamp formed in the step 3 into an active adhesive layer by performing surface modification; a fifth step of attaching the pattern part of the silicon stamp converted into the active adhesive layer in the fourth step to the adhesive layer and causing a dehydration condensation reaction; and a sixth step of forming the pattern on the substrate by removing the silicon resin stamp from the substrate. The thin film pattern is fabricated using the method and includes a pattern formed on a thin film, which is made of one type of thin film among a crystalline thin film, metal thin film, amorphous thin film, and polymer thin film, on a substrate. According to the present invention, a pattern can be formed on films made of all types of materials including a crystalline thin film by using the soft lithography process.

Abstract translation: 本发明的目的是提供一种使用软光刻制造薄膜图案的方法和由其制造的薄膜图案。 根据本发明的用于制造薄膜图案的方法的软光刻包括：在基板上沉积薄膜的第一步骤; 在薄膜上形成硅树脂粘合剂层的第二步骤; 制造用于在薄膜上形成图案的硅树脂印模的第三步骤; 通过进行表面改性，将在步骤3中形成的粘合剂层和形成在步骤3中的硅树脂印模的图案部分转化成活性粘合剂层的第四步骤; 在第四步骤中将转换成活性粘合剂层的硅印迹图案部分附着到粘合剂层上并进行脱水缩合反应的第五步骤; 以及通过从衬底去除硅树脂印模在衬底上形成图案的第六步骤。 使用该方法制造薄膜图案，并且包括在基板上形成的薄膜上形成的图案，其由晶体薄膜，金属薄膜，非晶薄膜和聚合物薄膜中的一种薄膜构成 。 根据本发明，可以通过使用软光刻工艺在由包括晶体薄膜的所有类型的材料制成的膜上形成图案。