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公开(公告)号：US20190324365A1
公开(公告)日：2019-10-24
申请号：US16502674
申请日：2019-07-03
Applicant: ASML Netherlands B.V.
Inventor： Pieter Cristiaan DE GROOT , Gerard Frans Jozef SCHASFOORT , Maksym Yuriiovych SLADKOV , Manfred Petrus Johannes M DIKKERS , Jozef Maria FINDERS , Pieter-Jan VAN ZWOL , Johannes Jacobus Matheus BASELMANS , Stefan Michael Bruno BAUMER , Laurentius Cornelius DE WINTER , Wouter Joep ENGELEN , Marcus Adrianus VAN DE KERKHOF , Robbert Jan VOOGD
Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.
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公开(公告)号：US20190317411A1
公开(公告)日：2019-10-17
申请号：US16454126
申请日：2019-06-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS
Abstract: In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.
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公开(公告)号：US20180081282A1
公开(公告)日：2018-03-22
申请号：US15823188
申请日：2017-11-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Aleksey Yurievich KOLESNYCHENKO , Johannes Jacobus Matheus BASELMANS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Hans JANSEN , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Felix Godfried Peter PEETERS , Bob STREEFKERK , Franciscus Johannes Herman Maria TEUNISSEN , Helmar VAN SANTEN
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
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公开(公告)号：US20160299440A1
公开(公告)日：2016-10-13
申请号：US15184770
申请日：2016-06-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Henrikus Herman Marie COX , Antonius Theodorus Anna Maria DERKSEN , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Joeri LOF , Erik Roelof LOOPSTRA , Jeroen Johannes Sophia Maria MERTENS , Frits VAN DER MEULEN , Johannes Catharinus Hubertus MULKENS , Gerardus Petrus Matthijs VAN NUNEN , Klaus SIMON , Bernardus Antonius SLAGHEKKE , Alexander STRAAIJER , Jan-Gerard Cornelis VAN DER TOORN , Martijn HOUKES
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
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公开(公告)号：US20160274462A1
公开(公告)日：2016-09-22
申请号：US15032245
申请日：2014-10-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Jaqueline BORGES NICOLAU , Hannah NOBLE , Johannes Jacobus Matheus BASELMANS , Bart SMEETS , Paulus Jacobus Maria VAN ADRICHEM
CPC classification number: G03F7/70425 , G03F7/2026 , G03F7/70258 , G03F7/70433 , G03F7/705 , G03F7/70566 , G03F7/706 , G06T5/00
Abstract: A method of correcting an optical image formed by an optical system, the method including obtaining a map indicative of a polarization dependent property of the optical system across a pupil plane of the optical system for each spatial position in an image plane of the optical system, combining the map indicative of the polarization dependent property of the optical system with a radiation map of the intensity and polarization of an input radiation beam to form an image map, and using the image map to correct an optical image formed by directing the input radiation beam through the optical system.
Abstract translation: 一种校正由光学系统形成的光学图像的方法，所述方法包括在所述光学系统的图像平面中的每个空间位置获得指示所述光学系统的光瞳平面上的所述光学系统的偏振度相关特性的映射， 将表示光学系统的偏振相关属性的映射与输入辐射束的强度和偏振的辐射图组合以形成图像映射，并且使用图像映射来校正通过引导输入辐射束形成的光学图像 通过光学系统。
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Patent Agency Ranking
公开(公告)号：US20150316858A1
公开(公告)日：2015-11-05
申请号：US14800493
申请日：2015-07-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70866 , G03F9/7026 , G03F9/7034
Abstract: In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.
Abstract translation: 浸没式光刻在基材曝光完成后，检测器用于检测残留在基片和/或基片台上的任何残留液体。
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公开(公告)号：US20240262736A1
公开(公告)日：2024-08-08
申请号：US18566713
申请日：2022-05-24
Applicant: ASML NETHERLANDS B.V.
IPC: C03B37/027
CPC classification number: C03B37/0279 , C03B37/02781 , C03B2203/16 , C03B2203/42
Abstract: A method of producing photonic crystal fibers (PCFs) is disclosed, the method includes: 1) obtaining an intermediate PCF having an initial outer fiber diameter of less than 1 mm; and 2) elongating the intermediate PCF so as to controllably reduce at least one dimension of the intermediate PCF.
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公开(公告)号：US20210356871A1
公开(公告)日：2021-11-18
申请号：US17277554
申请日：2019-08-28
Applicant: ASML Netherlands B.V.
Inventor： Johannes Jacobus Matheus BASELMANS
Abstract: A radiation system comprising a radiation source and a radiation conditioning apparatus, wherein the radiation source is configured to provide a radiation beam with wavelengths which extend from ultraviolet to infrared, and wherein the radiation conditioning apparatus is configured to separate the radiation beam into at least two beam portions and is further configured to condition the at least two beam portions differently.
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公开(公告)号：US20210247698A1
公开(公告)日：2021-08-12
申请号：US16973732
申请日：2019-06-11
Applicant: ASML NETHERLANDS B.V.
Inventor： Bart SMEETS , Anita BOUMA , Johannes Jacobus Matheus BASELMANS , Birgitt Noelle Cornelia Liduine HEPP , Paulus Hubertus Petrus KOLLER , Carsten Andreas KÖHLER
Abstract: A method for tuning a target apparatus of a patterning process. The method includes obtaining a reference performance, and measurement data of a substrate subjected to the patterning process at the target apparatus, the measurement data indicative of a performance of the target apparatus; determining a cause of a performance mismatch based on a difference between the reference performance and the performance of the target apparatus, wherein the cause includes an optical characteristic; and responsive to the cause, adjusting an optical parameter associated with an adjustable optical characteristic to reduce the performance mismatch in the optical characteristic.
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公开(公告)号：US20200012199A1
公开(公告)日：2020-01-09
申请号：US16576299
申请日：2019-09-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Johannes Jacobus Matheus BASELMANS
Abstract: An optical system comprising: an illumination system configured, to form a periodic illumination mode comprising radiation in a pupil plane of the optical system having a spatial intensity profile which is periodic in at least one direction, a measurement system configured to measure a dose of radiation which is received in an field plane of the optical system as a function of position in the field plane, and a controller configured to: select one or more spatial frequencies in the field plane at which variation in the received dose of radiation as a function of position is caused by speckle, and determine a measure of the variation of the received dose of radiation as a function of position at the selected one or more spatial frequencies, the measure of the variation in the received dose being indicative of speckle in the field plane.
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