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    Lithographic apparatus and device manufacturing method
    31.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2007258749A

    公开(公告)日：2007-10-04

    申请号：JP2007154924

    申请日：2007-06-12

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： PRIL WOUTER ONNO ,  VAN DER PASCH ENGELBERTUS ANTO ,  DILLON ROBERT F ,  HENSHAW PHILIP DENNIS

    IPC: H01L21/027 ,  G01B9/02 ,  G01B11/00 ,  G03F7/20 ,  H01L21/68

    CPC classification number: G03F7/70958 ,  G01B9/02007 ,  G01B9/02014 ,  G01B9/02027 ,  G01B9/0207 ,  G01B9/02074 ,  G01B2290/45 ,  G01B2290/60 ,  G01B2290/70 ,  G03F7/70775 ,  G03F7/70883

    Abstract: PROBLEM TO BE SOLVED: To provide an interferometric displacement measuring system for use in a lithographic projection apparatus having increased precision in spite of pressure and temperature disturbances in the optical paths of measurement and reference beams. SOLUTION: Measurement values of an interferometric measurement system are corrected for variations of atmospheric conditions such as pressure, temperature and turbulence using measurement values from a second harmonic interferometer. A ramp, representing the dependence of the SHI (second harmonic interferometer) data on a path length, is removed before use of the SHI data. The SHI may use a passive Q-switched laser as a light source and Brewster prisms in a receiver module. Optical fibers may be used to conduct light to detectors. A mirror reflecting the measurement beams has a coating of a thickness selected to minimize the sensitivity of the SHI data to changes in the coating thickness. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于光刻投影设备的干涉位移测量系统，其具有在测量和参考光束的光路中的压力和温度干扰的情况下具有提高的精度。 解决方案：使用来自二次谐波干涉仪的测量值来校正干涉测量系统的测量值，以测量大气条件（如压力，温度和湍流）的变化。 代表SHI（二次谐波干涉仪）数据对路径长度的依赖性的斜坡在使用SHI数据之前被去除。 SHI可以使用无源Q开关激光器作为光源，并在接收器模块中使用布鲁斯特棱镜。 可以使用光纤将光传导到检测器。 反映测量光束的反射镜具有选择的厚度的涂层，以使SHI数据对涂层厚度的变化的敏感性最小化。 版权所有（C）2008，JPO＆INPIT

    Lithographic apparatus and method of manufacturing device
    32.
    发明专利
    Lithographic apparatus and method of manufacturing device 有权
    光刻设备及其制造方法

    公开(公告)号：JP2007129194A

    公开(公告)日：2007-05-24

    申请号：JP2006247183

    申请日：2006-09-12

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： LOOPSTRA ERIK ROELOF ,  VAN DER PASCH ENGELBERTUS ANTO

    IPC: H01L21/027 ,  G01B21/00 ,  G01B21/22 ,  G03F7/20

    CPC classification number: G03F7/70775

    Abstract: PROBLEM TO BE SOLVED: To measure the position of a substrate table at a high accuracy, using a displacement measuring system. SOLUTION: A displacement measuring system 1 includes: a first x-sensor 4 for measuring the position of a substrate table 2 in a first direction; a second y-sensor 6 for measuring the position of the substrate table 2 in a second direction; and a second x-sensor 5. The first and second x-sensors 4, 5 and the first and second y-sensors 6, 7 are constituted to measure their respective sensor positions relative to at least one lattice plate 3. The displacement measuring system 1 selectively uses the first and second x-sensors 4, 5 and the first and second y-sensors 6, 7 according to the position of the substrate table 2, thus determining the position of the substrate table 2 in the three degree of freedom. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：使用位移测量系统来高精度地测量基板台的位置。 解决方案：位移测量系统1包括：第一x传感器4，用于测量衬底台2在第一方向上的位置; 用于在第二方向上测量衬底台2的位置的第二y传感器6; 和第二x传感器5.第一和第二x传感器4,5以及第一和第二y传感器6,7构成为相对于至少一个格子板3测量其各自的传感器位置。位移测量系统 1根据衬底台2的位置选择性地使用第一和第二x传感器4,5以及第一和第二y传感器6,7，从而确定衬底台2在三自由度中的位置。 版权所有（C）2007，JPO＆INPIT

    Position determination system and lithography system
    33.
    发明专利
    Position determination system and lithography system 有权
    位置确定系统和平移系统

    公开(公告)号：JP2007071874A

    公开(公告)日：2007-03-22

    申请号：JP2006237166

    申请日：2006-09-01

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： PRIL WOUTER ONNO ,  EUSSEN EMIEL J M ,  VAN DER PASCH ENGELBERTUS ANTO

    IPC: G01B11/00 ,  H01L21/027

    CPC classification number: G03F7/70775

    Abstract: PROBLEM TO BE SOLVED: To provide a position determination system for measuring the position of an object.
    SOLUTION: This system comprises: a first increment value measuring unit for measuring the first distance step of a first number at the distance between a reference frame and the object, in which the first number is equal to the value obtained by adding a first fraction to a first integer; and a second increment value measuring unit for measuring the second distance step of a second number at the distance between the reference frame and the object, in which the second number is equal to the value obtained by adding a second fraction to the first integer. The position determination system is constructed and arranged to initialize the second increment value measuring unit based on the first number and the second fraction.
    COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于测量物体的位置的位置确定系统。 解决方案：该系统包括：第一增量值测量单元，用于测量在参考帧和对象之间的距离处的第一数字的第一距离步长，其中第一数字等于通过添加一个 第一个分数到第一个整数; 以及第二增量值测量单元，用于在参考帧和对象之间的距离处测量第二数量的第二距离步长，其中第二数量等于通过将第二分数加到第一整数而获得的值。 位置确定系统被构造和布置为基于第一数量和第二分数来初始化第二增量值测量单元。 版权所有（C）2007，JPO＆INPIT

    Lithography equipment and device manufacturing method
    35.
    发明专利
    Lithography equipment and device manufacturing method 审中-公开
    LITHOGRAPHY设备和设备制造方法

    公开(公告)号：JP2005117051A

    公开(公告)日：2005-04-28

    申请号：JP2004295582

    申请日：2004-10-08

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： BEEMS MARCEL HENDRIKUS MARIA ,  VAN DER PASCH ENGELBERTUS ANTO

    IPC: G01B9/02 ,  G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/70941 ,  G03F7/70775

    Abstract: PROBLEM TO BE SOLVED: To provide lithography equipment in which an interference measuring system is improved, and a device manufacturing method.
    SOLUTION: In one embodiment regarding at least one reflecting surface of an interference measuring system in use, one beam path of the interferometer radiation of the interference measuring system that is incident to at least one reflecting surface is arranged so that it has an offset angle located in a region from 0.1 to 10 milliradian with respect to at least one normal of the reflecting surface, and an influence caused by spurious radiation generated in the interference measuring system with respect to the interference measuring system is suppressed by it. Therefore, the accuracy and reproducibility of accurate location measurement using the interference measuring system are improved. In the other embodiment, the parallel side face plate is used for the interference measuring system so that it obtains a signal depending on an angle of a radiation beam reflected by a mirror, and the flatness of the mirror is mapped by it. One side surface of the plate is a beam splitter, and the opposite side of the plate is a reflector.
    COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题：提供改善干涉测量系统的光刻设备和装置制造方法。 解决方案：在一个实施例中，关于使用的干涉测量系统的至少一个反射表面，入射到至少一个反射表面的干涉测量系统的干涉仪辐射的一个光束路径被布置成使得其具有 位于相对于反射面的至少一个法线的0.1〜10毫弧度的偏移角度，并且通过干涉测量系统抑制在干涉测量系统中产生的杂散辐射所引起的影响。 因此，使用干涉测量系统的精确定位测量的精度和再现性得到改善。 在另一个实施例中，平行侧面板用于干涉测量系统，使得其获得取决于由反射镜反射的辐射束的角度的信号，并且反射镜的平坦度由其映射。 板的一个侧表面是分束器，并且板的相对侧是反射器。 版权所有（C）2005，JPO＆NCIPI

    Lithography equipment and integrated circuit manufacturing method
    36.
    发明专利
    Lithography equipment and integrated circuit manufacturing method 有权
    LITHOGRAPHY设备和集成电路制造方法

    公开(公告)号：JP2005020005A

    公开(公告)日：2005-01-20

    申请号：JP2004187216

    申请日：2004-06-25

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： BARTRAY PETRUS RUTGERUS ,  BOX WILHELMUS JOSEPHUS ,  FRANKEN DOMINICUS JACOBUS PETR ,  LUTTIKHUIS BERNARDUS ANTONIUS ,  VAN DER PASCH ENGELBERTUS ANTO ,  VAN DER WIJST MARC WILHELMUS M ,  ENGELS MARC JOHANNES MARTINUS

    IPC: G01B11/00 ,  G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/70716 ,  G03F7/70775

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography projection equipment including an assembly which determines the position of pattern forming means relative to projection system more accurately.
    SOLUTION: A lithography projection equipment 1 includes a supporting structure MT which is constituted so that it might hold the pattern forming means (for instance, a reticle). When a projection beam PB irradiates the reticle, the projection beam is patterned with a pattern on the reticle. A projection system PL is constituted and arranged in order to image the irradiated part of the reticle onto the target portion of a substrate. The assembly determining the spatial position of the reticle relative to the projection system PL is equipped. The assembly includes a measuring unit equipped with some sensors which are enough in number to determine required spatial position.
    COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种光刻投影设备，其包括更精确地确定图案形成装置相对于投影系统的位置的组件。 解决方案：光刻投影设备1包括支撑结构MT，其被构造成使得其可以保持图案形成装置（例如，掩模版）。 当投影光束PB照射光罩时，投影光束以掩模版上的图案被图案化。 构造和布置投影系统PL，以将掩模版的照射部分成像到基板的目标部分上。 配备了确定掩模版相对于投影系统PL的空间位置的组件。 组件包括一个测量单元，该测量单元配备有足够数量的一些传感器以确定所需的空间位置。 版权所有（C）2005，JPO＆NCIPI

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    39.
    发明专利
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 未知

    公开(公告)号：SG135129A1

    公开(公告)日：2007-09-28

    申请号：SG2007011828

    申请日：2007-02-15

    Applicant: ASML NETHERLANDS BV

    Inventor： VAN DER PASCH ENGELBERTUS ANTO ,  EUSSEN EMIEL JOZEF MELANIE

    Abstract: A lithographic apparatus includes a displacement measuring system to measure a position of a moveable object with respect to a reference frame of the lithographic apparatus, in at least three coplanar degrees of freedom (x, y, Rz) of an orthogonal x-y-z coordinate system centred in the center of the moveable object. The moveable object includes a support structure configured to support a patterning device or a substrate table configured to support a substrate. The displacement measuring system includes at least three sensor heads, each sensor head being positioned with a measuring direction substantially coplanar with the x-y plane of the coordinate system and each sensor head being furthermore positioned with the measuring direction substantially perpendicular to a connection line connecting the sensor head with the center of the movable object and extending coplanar with the x-y plane.

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