32.
    发明专利
    未知

    公开(公告)号:DE4202845A1

    公开(公告)日:1993-08-05

    申请号:DE4202845

    申请日:1992-01-31

    Applicant: BASF AG

    Abstract: The invention relates to a radiation-sensitive mixture essentially comprising (a) a water-insoluble binder or binder mixture, and (b) a compound which forms a strong acid on irradiation, where component (a) is a phenolic resin all or some of whose phenolic hydroxyl groups have been replaced by groups (IA) or (IB) in which R , R and R are alkyl radicals, or R together with R forms a ring, and X is CH2, O, S, SO2 or NR . This radiation-sensitive mixture is suitable for the production of relief structures.

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