Abstract:
The invention relates to a process for the production of microstructures in polymers having structure depths of from 1 mu m to 10 mm by imagewise irradiation of polymers with X-rays followed by removal of the irradiated areas using a developer which selectively dissolves the irradiated areas, where the polymers employed are polycarbonates or polycarbonate-containing polymer blends. The novel process is suitable for the production of microstructure elements.
Abstract:
Die Erfindung betrifft die Verwendung von organischen Materialien mit einer spezifischen Leitfähigkeit kleiner 10 -2 S/cm und mit einer nichtionischen Ladungsträgerbeweglichkeit von größer als 10 -4 cm 2 /Vs als Ladungstransportmedium, mit der Maßgabe, daß in diesem organischen Material durch Lichtabsorption keine Erhöhung der Ladungsträgerkonzentration um den Faktor 10 oder mehr herbeigeführt wird, sowie entsprechende elektrochemische Zellen.
Abstract:
Verfahren zur Herstellung von Beschichtungen oder Formkörpern durch Strahlungshärtung, wobei strahlungshärtbare Massen, welche 1 bis 100 Gew.-%, bezogen auf die Gesamtmenge der radikalisch oder kationisch polymerisierbaren Verbindungen, Verbindungen A) mit mindestens einem kationisch polymerisierbaren 2,3-Dihydrofurangrundkörper enthalten, mit energiereichem Licht bestrahlt werden.
Abstract:
The invention relates to a process for the production of microstructure elements having structure depths of from several mu m into the mm region by imagewise irradiation of polymers with X-rays and removal of the regions of the polymers which have been irradiated imagewise, where the polymers, before the imagewise irradiation, are firmly anchored to an electroconductive support in layer thicknesses of from several mu m into the mm region by polymerisation of the monomer(s) making up the polymer in the presence of a polymerisation catalyst, and, if desired, conditioning at temperatures between the glass transition temperature and the melting point of the polymer. The novel process is particularly suitable for the production of microstructure elements having structure depths of from 3 mu m to 2000 mu m and lateral dimensions of less than 10 mu m.
Abstract:
The invention relates to a process for the delamination of metallic microstructures which have been produced by electroplating by the LIGA process and are to be delaminated from an aliphatic polyester, the delamination being carried out using an aqueous/alcoholic alkali metal hydroxide solution at temperatures above the glass transition temperature of the aliphatic polyester.
Abstract:
The invention relates to novel sulphoxides of the formula in which Ar is an optionally substituted aromatic carboxylic radical, the radicals R are, independently of one another, hydrogen, C1- to C4-alkyl or optionally substituted phenyl, and radicals X are, independently of one another, radicals bonded via hydrogen-free carbon atoms, which are suitable for the preparation of poly(arylenevinylene) compounds and which can be converted into the polymers via prepolymers of the formula . The poly(arylenevinylene) compounds are suitable, for example, as photoluminescent or electroluminescent material.
Abstract:
The invention relates to an electroluminescent arrangement, comprising one or more organic layers, characterized in that at least one of the layers is obtained by thermal or radiation-induced crosslinking, and in that each layer contains at least one charge-transporting connection (compound). The arrangements according to the invention are, for example, very suitable for the production of displays.
Abstract:
The invention relates to an electroluminescent arrangement, comprising one or more organic layers, characterized in that at least one of the layers is obtained by thermal or radiation-induced crosslinking, and in that each layer contains at least one charge-transporting connection (compound). The arrangements according to the invention are, for example, very suitable for the production of displays.