公开(公告)号：JP2001083105A

公开(公告)日：2001-03-30

申请号：JP25735099

申请日：1999-09-10

Applicant: CANON KK

Inventor： NOMA TAKASHI ,  TAKADA KAZUHIRO

IPC: G01N23/20

Abstract: PROBLEM TO BE SOLVED: To obtain an X-ray diffractometer with which more detailed information on the structure of the very small part of a thin film can be obtained by reducing the influence of air-scattered X-rays when the diffractometer is used for an oblique emission X-ray diffraction method. SOLUTION: An X-ray diffractometer is used for evaluating the crystal structure of a sample 4 by projecting primary X-rays 2 upon the sample 4 and measuring the angle of diffraction and intensity of diffracted X-rays which are emitted from the sample 4 after being diffracted by the sample 4. The diffractometer is provided with an X-ray source 1 which projects the primary X-rays 2 upon the sample 4, a shielding body 4 which shields scattered X-rays which are generated when the X-rays 2 are scattered by the air, and a shielding body moving means 6 which moves the shielding body 4 to a designated position. The diffractometer is also provided with a sample rotating mechanism 10 that rotates the sample which is irradiated with the primary X-rays 2 from which the scattered X-rays are removed by means of the shielding body 4 and an X-ray measuring means 9 which measures the angle of diffraction and intensity of the diffracted X-rays which are emitted from the sample 4 after being diffracted by the sample 4.

公开(公告)号：JP2000338017A

公开(公告)日：2000-12-08

申请号：JP14853699

申请日：1999-05-27

Applicant: CANON KK

Inventor： MIURA NAOKO ,  NOMA TAKASHI

IPC: G01N1/28

Abstract: PROBLEM TO BE SOLVED: To obtain a pretreating device and method with a processing function for preventing a partially or wholly non-conductive sample from being charged up and contaminated at the time of applying a conductive paste on the surfaces of the sample and obtaining satisfactory images through an electron microscope. SOLUTION: This pretreating device is provided with a means 4 to provide a minute amount of droplet 3 containing a conductive substance for any location on a sample 2, an optical microscope for observing and specifying the provided location, a moving means for displacing the relative locations of the sample 2, the droplet providing means 4 and the optical microscope. In this method for pretreating a sample, by providing the droplet 3 of a dispersing liquid containing conductive particulates for any location on the sample 2 through the use of the droplet providing means 4 and then evaporating a solvent, a conductive thin membrane formed of particulates is formed in any shape.

公开(公告)号：JPH1055749A

公开(公告)日：1998-02-24

申请号：JP15420797

申请日：1997-06-12

Applicant: CANON KK

Inventor： UENO RIE ,  SAKANO YOSHIKAZU ,  TAKEDA TOSHIHIKO ,  NOMURA ICHIRO ,  SUZUKI HIDETOSHI ,  KANEKO TETSUYA ,  NOMA TAKASHI

IPC: H01J1/316 ,  H01J1/30 ,  H01J9/02 ,  H01J29/04 ,  H01J31/12

Abstract: PROBLEM TO BE SOLVED: To form an electron emission part linearly, easily control its position and shape, and ensure uniform electron characteristics and luminescent brightness by providing a fine particle film having a thick step part with its partial difference between a pair of electrodes on a substrate. SOLUTION: A fine particle film 5 having a thick step part 2 with its partial difference is provided on a substrate between a pair of electrodes 3 and 4 provided in opposite thereto. This step part 5 may be one fine particle in a difference with the other fine particle film 5, and further an electron emission part 6 is configured along this step part 2. Here, electric conducting is performed for the fine particle film having this part with partial thickness, and the electron emission part 6 is formed linearly along the step part 2. This makes it possible to eliminate snaking of the electron emission part 6. Forming of this electron emission part 6 depends upon electric conducting direction, type of fine particle material, thickness of the fine particle film or the like. Thus, by providing the step part 2 linearly, the electron emission part 6 can be formed linearly, and the position and shaft thereof can be easily controlled.

公开(公告)号：JPH103849A

公开(公告)日：1998-01-06

申请号：JP17288296

申请日：1996-06-13

Applicant: CANON KK

Inventor： NOMA TAKASHI

IPC: H01J1/30 ,  H01J1/316 ,  H01J9/02 ,  H01J31/12

Abstract: PROBLEM TO BE SOLVED: To provide an electron emission element as an electron beam source capable of realizing a high-quality image formation device. SOLUTION: Element electrodes 2 and 3 are opposite to each other via a narrow gap part 5 and a wide gap part 4 having a wider gap than the part 5, and an electron emission part 6 having carbon and/or carbon compound is formed at the narrow gap part 5. Thus, the position and shape of the electron emission part 6 can be controlled precisely, and uniformity of element characteristics is realized.

公开(公告)号：JPH0831314A

公开(公告)日：1996-02-02

申请号：JP18516294

申请日：1994-07-15

Applicant: CANON KK

Inventor： NOMA TAKASHI

IPC: H01J9/02 ,  H01J1/30 ,  H01J31/12 ,  H01J31/15

Abstract: PURPOSE:To establish a manufacturing method for surface conduction type electron emitting elements for use as an electron source of an image forming device, etc. CONSTITUTION:An electron emitting element of surface conduction type is structured so that an electron emission part 2 is provided in a conductive thin film 3 which puts element electrodes 4, 5 in communication with each other. In the manufacture of such elements, the process for pattern formation on the thin film 3 produces a thin film 7 including metal oxide. A covering material 8 is provided on the film 7 in its region to become conductive thin film 3. The metal oxide in the region free from formation of the covering material 8 is subjected to a reduction process, and a metal film 9 is formed. Then a wet etching process is conducted to melt off the metal film 9 selectively. Thereby the patterning process can be simplified even though a noble metal is selected as the chief constituent element of the conductive thin film 3, and there is no need for provision of any vacuum device.

公开(公告)号：JPH07192629A

公开(公告)日：1995-07-28

申请号：JP34592893

申请日：1993-12-24

Applicant: CANON KK

Inventor： UNO KUMIKO ,  NOMA TAKASHI

IPC: H01J9/50 ,  H01J1/30 ,  H01J1/316 ,  H01J9/02 ,  H01J29/04 ,  H01J31/12 ,  H01J31/15

Abstract: PURPOSE:To easily repair a defective part when generated a defect in a thin film containing an electron emitting part of an electron emitting element. CONSTITUTION:A thin film including an electron emitting part is provided between opposed electrodes, and this thin film is formed of electron emitting material. In this electron emitting element, when a defect is generated in the thin film including the electron emitting part, a defect part of the thin film is irradiated by heat source light in the atmosphere of chemical evaporation gas, to repair the defective part by evaporating the chemical evaporation gas. Here, the chemical evaporation gas is at least the same to a material by which the electron emitting part is formed, and the heat source light has energy of decomosing the chemical evaporation gas. A part of the thin film, containing at least the electron emitting part of the electron emitting element, has a light absorber.

公开(公告)号：JPH0765705A

公开(公告)日：1995-03-10

申请号：JP23596693

申请日：1993-08-30

Applicant: CANON KK

Inventor： MATSUTANI SHIGEKI ,  ASAI AKIRA ,  YAMAMOTO KEISUKE ,  NOMA TAKASHI ,  OKUDA MASAHIRO ,  SUGIOKA HIDEYUKI ,  OSADA YOSHIYUKI

IPC: H01J1/316 ,  G11B9/14 ,  H01J1/30 ,  H01J9/02

Abstract: PURPOSE:To enable the arrangement of electron emission part fine particles or the design of its material, and lessen the dispersion between elements, and enable the enlargement of an emitted electron current by fairing or processing a fine particle dispersed type of film, using the probe of a scanning tunneling microscope. CONSTITUTION:Film sections left behind the cutting of a conductive film 3 with the probe 4 of a scanning tunneling microscope (STM) effectively serve as a particles dispersed type of film. At that time, the fine particles are controlled to be in specified position by the positional control of the probe 4 of the STM and to have such cross sections as to be electrically discontinuous (D). Hereby, the design of the arrangement of the fine particles of an electron emission part becomes possible, and the improvement of an element is facilitated, and the dispersion between elements decreases sharply. Moreover, the material of the fine particles can be selected freely, and even a material small in work function can be used without being confined to gold, silver, etc., and the enlargement of the current of emitted electrons becomes possible.

公开(公告)号：JPS57190278A

公开(公告)日：1982-11-22

申请号：JP7498981

申请日：1981-05-20

Applicant: CANON KK

Inventor： NOMA TAKASHI ,  SAWADA TAKESHI

IPC: G01R33/12

Abstract: PURPOSE:To achieve a short-time measurement of large quantity of sample with the capability of automatizing the measurement by determining the bearing and the magnitude of the magnetic anisotropy based on resistance values of magnetic resistance effect elements varying with changes in the external magnetic field. CONSTITUTION:After a sample 42 is set on a base 43, a fixed current flows from a power source 47 and initial values of an angle, a magnetic field and the like are set. Then, a magnetic signal and a resistance value R of the sample 42 are memorized at the specified address of a memory circuit 58. Subsequently, current flowing through a coil 45' is varied to increase the magnetic field H. By this process, an RH curve is stored in the memory circuit 58 and then, the magnetic field H is reduced. While the magnetic field H is increased, a correlation value between the R and the voltage during the decrease of the value H is memorized to rotate the base 43 with a motor 44. Thus, the measurement is repeated. When the correlation value reaches the set one, the magnetic anisotropy of a magnetic resistance effect element 42 is obtained.

公开(公告)号：JP2002323696A

公开(公告)日：2002-11-08

申请号：JP2001126359

申请日：2001-04-24

Applicant: CANON KK

Inventor： NOMA TAKASHI ,  OYAMA JUNJI ,  MARUYAMA TOMOKO

IPC: G01N23/203 ,  G02F1/13 ,  G02F1/1334

Abstract: PROBLEM TO BE SOLVED: To provide a technique to directly inspect aligned state of liquid crystal molecules in a PDLC(polymer dispersed liquid crystal) element. SOLUTION: A sample 5 obtained by removing one substrate of the PDLC element is fixed with a sample holding mechanism 4. X-rays 2 are made to irradiate the sample 5 and a detector 8 measures scattered X-rays 6. The aligned state of the liquid crystal is found by extracting components scattered by the liquid crystal from the measured scattered X-rays and analyzing them.

公开(公告)号：JP2001141675A

公开(公告)日：2001-05-25

申请号：JP32727599

申请日：1999-11-17

Applicant: CANON KK

Inventor： TAKADA KAZUHIRO ,  NOMA TAKASHI

IPC: G01N23/207

Abstract: PROBLEM TO BE SOLVED: To measure a diffraction pattern having a desired S/B ratio by reducing the background due to the scattering of air generated by X-rays transmitted through a sample in the case of the measurement of the diffraction of obliquely emitted X-rays. SOLUTION: A shield member 13 is arranged between a sample 3 and an X-ray detector 6 so that the light path of X-rays 11 transmitted through the sample is not looked from the X-ray detector 6 without shielding diffracted X-rays. When the diffraction of obliquely emitted X-rays is measured, a part of primary X-rays emitted from an X-ray source 9 transmits through the sample 3 and the scattering of air and scattered X-rays are generated in the periphery of the sample 3 by X-rays 11 transmitted through the sample 3 but shielded by the shield member 13, and only diffracted X-rays 5 are detected by the X-ray detector 6. Therefore, the background due to the scattering of air and scattered X-rays is reduced and a diffraction pattern having a desired S/B ratio is measured.