公开(公告)号：JP2003115451A

公开(公告)日：2003-04-18

申请号：JP2002216633

申请日：2002-07-25

Applicant: CANON KK

Inventor： HASEGAWA TAKAYASU ,  TERAJIMA SHIGERU

IPC: G03B27/52 ,  G03F7/20 ,  G03F7/22 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To keep optical transmittance almost constant in an optical path space in which exposing light passes through between a projection optical system and a wafer while the wafer moves to conduct scanning exposure. SOLUTION: This exposure system possesses a shielding member that forms optical path space containing the optical path of the exposing light between the projection optical system and the wafer stage together with a surrounding space that surrounds the optical path space, and a first gas supplying means that supplies an inert gas to the optical path space, to provide a reduction means that reduces the change, caused by the movement of the wafer stage, of the total light quantity of the exposing light that reaches the wafer.

公开(公告)号：JP2000357643A

公开(公告)日：2000-12-26

申请号：JP16741999

申请日：1999-06-14

Applicant: CANON KK

Inventor： TERAJIMA SHIGERU ,  WATANABE YUTAKA ,  MIYAJI GOJI ,  HARUMI KAZUYUKI

IPC: H01L21/027 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To reduce the width of a boundary region produced by the penumbral blur by allowing a mask to have a light dimming region in a specified part outside a transfer pattern region of it and disposing a light shielding plate so that an inner end part of the light dimming region of the mask may overlap a region having the penumbral blur by the light shielding plate. SOLUTION: The inner edge of an X-ray absorber 5R outside an exposure angle of view on a mask 3 is positively set so that it may overlap a region having the penumbral blur. More specifically, the inner edge of the X-ray absorber 5R which will become a boundary of an exposure angle of view of the X-ray mask 3 is set within a boundary region outside proper exposure energy region, that is, in a region wherein the exposure X-ray intensity distribution nor suitable for exposure is generated. The mask 3 is formed with a light shielding part by the X-ray absorber 5R or with light dimming regions 5R, 5L in a predetermined part outside a transfer pattern region of it and a light shielding plate 2 is so disposed that the light shielding regions 5R, 5L partly overlap a region of the mask which has the penumbral blur due to the light shielding plate 2 which regulates an exposure angle of view of the aligner.

公开(公告)号：JPH10172879A

公开(公告)日：1998-06-26

申请号：JP32677096

申请日：1996-12-06

Applicant: CANON KK

Inventor： MATSUI SHIN ,  MURAKI MASATO ,  TERAJIMA SHIGERU ,  MIYAKE AKIRA ,  OKUNUKI MASAHIKO

IPC: G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To improve the throughput by using an arcuate electron beam, means for correcting the aberration of the electron beam and means for scanning a wafer and mask. SOLUTION: A light 2 from an optical source or sec. optical source 1 enters an aperture 4 by an illuminating optical system 3. The aperture 4 cuts the light into an arcuate region and guides it to a mask 5 having light-transmitting and -opaque parts. The mask 5 is irradiated with the light having the arcuate illuminating region to project a pattern of the mask on a photoelectric conversion plane PE through a projection optical system PL. A photoelectric converter member composed of this conversion plane PE and light-transmitting member S radiates an electron beam according to the pattern image on the mask 5. This beam is accelerated by accelerating electrodes to form an image on a wafer 14 through a reduced electron-optical system where the beam aberration is corrected by an aberration correcting optical system 7.

公开(公告)号：JPH09330878A

公开(公告)日：1997-12-22

申请号：JP6822697

申请日：1997-03-21

Applicant: CANON KK

Inventor： TERAJIMA SHIGERU ,  TSUKAMOTO MASAMI

IPC: G21K5/02 ,  G03F7/20 ,  G21K1/06 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To remove a fact that incident lights on a mask are shielded even when a wafer of a large diameter is used, and remove a fact that a device is made large-sized by a method wherein a bending mirror is disposed between a mask and a wafer. SOLUTION: A bending mirror 11 is disposed between a concave face multilayer film reflection mirror and an X-ray mask 13. At this time, if designating an irradiative width of X-ray beams 12 on an X-ray mask 13 to be d, an incident angle of the X-ray beams 12 at an upper end of the irradiative width d to be δ1, an incident angle of the X-ray beams 12 at a lower end thereof to be δ2, a distance from the X-ray mask 13 to a side end close to a light path of the X-ray beams 12 reflected by the bending mirror 11 to be L, and a distance between the mask 13 and a wafer 7 to be D, D>L>d/(tan δ1 + tan δ2) is satisfied. Thereby, the X-ray beams 12 reflected by the concave face multilayer film reflection mirror are reflected by the bending mirror 11 and incident on the X-ray mask 13, and at this time, a light path of the X-ray beams 12 is prevented from being shielded by a bending mirror or a wafer.

公开(公告)号：JPH09218299A

公开(公告)日：1997-08-19

申请号：JP4671496

申请日：1996-02-08

Applicant: CANON KK

Inventor： TERAJIMA SHIGERU ,  WATANABE YUTAKA

IPC: G21K5/00 ,  G21K5/02

Abstract: PROBLEM TO BE SOLVED: To manufacture a thin curved X-ray take-out window by a thin film of diamond, etc. SOLUTION: A thin film 11 of diamond is formed by vapor deposition or the like manner on a surface of a semi-cylindrical silicon block. Then, a central part of the silicon block is removed by back etching, whereby a supporting body 12 with an opening 12a is formed. The thin film 11 left at the opening 12a has a surface shape of the silicon block before the block is processed by back etching, in other words, the thin film 11 is semi-cylindrically curved. Therefore, the thin film has a sufficient mechanical strength to endure a pressure difference between a beam duct 2 and an exposure chamber 1.

公开(公告)号：JPH08236425A

公开(公告)日：1996-09-13

申请号：JP3841995

申请日：1995-02-27

Applicant: CANON KK

Inventor： TERAJIMA SHIGERU

IPC: G02B1/00 ,  G03F7/20 ,  H01L21/027

Abstract: PURPOSE: To use a material other than beryllium as a radiation take-out window appropriate for an exposure apparatus or the like. CONSTITUTION: An aluminum film 12 for reflecting wavelengths other than X-rays (visible light and infrared rays) is vapor-deposited on a light source side of an X-ray take-out window 11 made of diamond. It prevents the visible light and infrared rays from being incident to an exposure apparatus and solves problems such as degraded accuracy in positioning or rise in temperature.

公开(公告)号：JPH07326574A

公开(公告)日：1995-12-12

申请号：JP9451095

申请日：1995-03-28

Applicant: CANON KK

Inventor： TERAJIMA SHIGERU ,  MIYAJI GOJI

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

Abstract: PURPOSE:To improve alignment accuracy by preventing alignment light from being irregularly reflected and causing diffraction by an end edge of a light screening part of an opening of an aperture. CONSTITUTION:X ray L1 which passed through an opening 1a of an aperture 1 is cast on a wafer W1 through a mask M1, and a circuit pattern P1 and an alignment mark Ae of the mask M1 are transferred to the wafer W1. Irregular reflection of alignment light F1 is prevented by a circumferential edge of the opening 1a of the aperture 1, that is, an end edge 1b of a light screening part by making a clearance E between the aperture 1 and the mask M1 larger than the value e=(f+m)/2(tantheta+tangamma), wherein theta is the angle formed by an optical axis of X ray L1 and an optical axis of alignment light F1, f is the beam width when alignment light F1 passes through the aperture 1, gamma is the maximum value of a divergent angle of a necessary part of X ray L1 and m is the width of an alignment mark Ae.

公开(公告)号：JPH07283124A

公开(公告)日：1995-10-27

申请号：JP9306994

申请日：1994-04-06

Applicant: CANON KK

Inventor： TERAJIMA SHIGERU ,  MIYAJI GOJI

IPC: G21K5/02 ,  G03F7/20 ,  H01L21/027

Abstract: PURPOSE:To prevent the illumination beam from being irregularly reflected by the edge of an opening and prevent contrast of a circuit pattern from reducing by a method wherein a flat plate portion encircling the opening is inclined towards the downstream side of an optical path towards the optical axis with respect to the plane vertical to the optical axis of the illumination beam. CONSTITUTION:Each aperture blade 11 of an aperture 1 is provided with an end edge portion 11b being a flat plate in an edge of an opening 1a of the aperture 1. This end edge portion 11b is bent on the side of optical path downstream of an X-ray L1 at an inclined angle of about 10 degrees with respect to a body portion 11c of each aperture blade 11 excluding this portion 11b. The body portion 11c of each aperture blade 11 is arranged vertical to the optical axis O1 of the beam of X-rays L1. Accordingly, an end surface of an end edge 11a is inclined outwardly of the optical path of the X-ray beam L1 at an inclined angle of about 10 degrees with respect to the optical axis O1 of the X-ray L1. Thus, irregular reflection can be prevented due to the edge.

公开(公告)号：JPH07281417A

公开(公告)日：1995-10-27

申请号：JP7464694

申请日：1994-04-13

Applicant: CANON KK

Inventor： TERAJIMA SHIGERU ,  CHIBA KEIKO

IPC: G03F1/22 ,  G03F1/42 ,  H01L21/027 ,  G03F1/08 ,  G03F1/16

Abstract: PURPOSE:To obtain the line width size of transfer alignment marks similar to the line width size obtd. when correct exposure is executed by correcting and designing the alignment marks in such a manner that the desired line width is obtd. CONSTITUTION:A mask for X-ray exposure is formed on an X-ray transmittable membrane 11. An intensity distribution 13a is obtd. by exposing X-ray shielding film patterns 12a prior to correction to this membrane. An intensity distribution 13b is obtd. by exposing the X-ray light shielding patterns 12b after correction. Positive type resist patterns 15 are obtd. from the X-ray light shielding film patterns 12b after the correction. An overexposure intensity distribution 14 is obtd. by adding an overexposure-component to the intensity distribution 13b. The line width of the X-ray shielding film patterns 12a is corrected and designed by as much as the alignment marks previously exposed and transferred for the purpose of alignment in the ensuing stage. More specifically, both sides of the X-ray shielding film patterns 12a prior to correction are designed larger by, for example about 0.02mum each as to the alignment marks to be exposed and transferred.

公开(公告)号：JPH0729804A

公开(公告)日：1995-01-31

申请号：JP17431593

申请日：1993-07-14

Applicant: CANON KK

Inventor： TERAJIMA SHIGERU ,  FUKUDA YOSHIAKI ,  FUJIOKA HIDEHIKO

IPC: G03F7/20 ,  H01L21/027

Abstract: PURPOSE:To minimize generation of ozone in the vicinity of a light source by providing a chamber having a window for taking out ultraviolet ray from the light source and constituted to cover the light source thus isolating the atmosphere thereof from the atmospheric air. CONSTITUTION:Light from a lamp 11 is condensed or made parallel through a mirror 13 and then it is subjected to wavelength selection by means of a wavelength selection mirror 14. The light source system comprising these members is then surrounded by a chamber 12 fixed with a light take-out window 15. The chamber can isolate the light source system perfectly from the atmospheric air and made of a material transmitting no ultraviolet ray except the light take-out window 15. The ultraviolet ray taken out through the window 15 can generate ozone in the atmospheric air but the generation of ozone is reduce significantly as compared with the case where the light source is not isolated.