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    1.
    发明专利
    未知

    公开(公告)号：DE69531019D1

    公开(公告)日：2003-07-17

    申请号：DE69531019

    申请日：1995-03-31

    Applicant: CANON KK

    Inventor： HASEGAWA TAKAYUKI ,  FUJIOKA HIDEHIKO ,  YONEYAMA YOSHITO

    IPC: G03F7/16 ,  G03F7/20 ,  G03F7/30 ,  H01L21/00 ,  G02B26/12

    Abstract: A processing system includes a first processing chamber (101) in which a first process is to be performed, a second processing chamber (130) in which a second process is to be performed, and a device for introducing an inactive gas, having been used in said first processing chamber for the first process, into the second chamber for reuse thereof. The gas subsequently used in the second chamber is introduced back into the first chamber for reuse of the gas. At least a portion of the circulated gas is purified to improve its purity. A purity sensor (110) detects the purity of gas discharged from the second chamber and, in accordance with the detection, the capacity of gas purification is adjusted.

    8.
    发明专利
    未知

    公开(公告)号：DE3803738A1

    公开(公告)日：1988-08-25

    申请号：DE3803738

    申请日：1988-02-08

    Applicant: CANON KK

    Inventor： FUJIOKA HIDEHIKO

    IPC: H01L21/673 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  G03F9/00 ,  G03D3/12 ,  G12B5/00

    Abstract: A mask holding device for detachably holding a mask, typically for use in the manufacture of microcircuits, comprises mask holder 3 with permanent magnets (4a, 4c) holding magnetic mask frame 2 and mask 1. The magnetic force is made variably controllable by varying current to solenoid cells (5a, 5c) so as to correct the flatness of the mask. The flatness of the mask on the holder 3 can be measured by interferometer 9 and temperature and pressure are taken by sensors (25a, 25b) so the mask can be altered by computer 12 to ensure it is flat before exposure to water 18 which is slidably mounted on bar 22. Alternatively, the flatness of the mask can be adjusted as above at one station and then transferred to a second holder which has temperature and pressure sensors before exposure at a second station (Fig. 5).

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