公开(公告)号：US20080099693A1

公开(公告)日：2008-05-01

申请号：US11978661

申请日：2007-10-30

Applicant: Elmar Platzgummer

Inventor： Elmar Platzgummer

IPC: G21K5/04

CPC classification number: H01J37/3007 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/02 ,  H01J37/045 ,  H01J37/09 ,  H01J37/3174 ,  H01J2237/022 ,  H01J2237/0435 ,  H01J2237/0451 ,  H01J2237/0453 ,  H01J2237/0458 ,  H01J2237/0835

Abstract: In a particle-beam projection processing apparatus a target (41) is irradiated by means of a beam (pb) of energetic electrically charged particles, using a projection system (103) to image a pattern presented in a pattern definition means (102) onto the target (41) held at position by means of a target stage; no elements—other than the target itself—obstruct the path of the beam after the optical elements of the projection system. In order to reduce contaminations from the target space into the projection system, a protective diaphragm (15) is provided between the projection system and the target stage, having a central aperture surrounding the path of the patterned beam, wherein at least the portions of the diaphragm defining the central aperture are located within a field-free space after the projection system (103).

Abstract translation: 在粒子束投影处理装置中，使用投影系统（103）将图案定义装置（102）中呈现的图案成像到图像定义装置（102）的图像上，借助于能量带电粒子束（pb）照射目标（41） 目标（41）通过目标阶段保持在位置; 没有元件 - 除了目标本身 - 在投影系统的光学元件之后阻挡光束的路径。 为了减少从目标空间到投影系统的污染，在投影系统和目标台之间提供保护膜片（15），其具有围绕图案化梁的路径的中心孔，其中至少部分 限定中心孔的光阑在投影系统（103）之后位于无场空间内。

公开(公告)号：US07214951B2

公开(公告)日：2007-05-08

申请号：US10969493

申请日：2004-10-20

Applicant: Gerhard Stengl ,  Elmar Platzgummer ,  Hans Loschner

Inventor： Gerhard Stengl ,  Elmar Platzgummer ,  Hans Loschner

IPC: H01J37/08 ,  G21G5/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3177

Abstract: A charged-particle multi-beam exposure apparatus (1) for exposure of a target (41) uses a plurality of beams of electrically charged particles, which propagate along parallel beam paths towards the target (41). For each particle beam an illumination system (10), a pattern definition means (20) and a projection optics system (30) are provided. The illuminating system (10) and/or the projection optics system (30) comprise particle-optical lenses having lens elements (L1, L2, L3, L4, L5) common to more than one particle beam. The pattern definition means (20) defines a multitude of beamlets in the respective particle beam, forming its shape into a desired pattern which is projected onto the target (41), by allowing it to pass only through a plurality of apertures defining the shape of beamlets permeating said apertures, and further comprises a blanking means to switch off the passage of selected beamlets from the respective paths of the beamlets.

Abstract translation: 用于曝光目标（41）的带电粒子多光束曝光装置（1）使用沿平行光束路径朝向目标（41）传播的多个带电粒子束。 对于每个粒子束，提供照明系统（10），图案定义装置（20）和投影光学系统（30）。 照明系统（10）和/或投影光学系统（30）包括具有多于一个粒子束共有的透镜元件（L 1，L 2，L 3，L 4，L 5）的粒子 - 光学透镜。 图案定义装置（20）在相应的粒子束中限定多个子束，通过使其仅通过限定形状的多个孔而将其形状形成为投射到目标（41）上的期望图案 子束穿透所述孔，并且还包括消隐装置，以切断所选子束从子束的相应路径的通过。

公开(公告)号：US07033647B2

公开(公告)日：2006-04-25

申请号：US10301317

申请日：2002-11-20

Applicant: Xinhe Tang ,  Klaus Mauthner ,  Ernst Hammel ,  Hans Löschner ,  Elmar Platzgummer ,  Gerhard Stengl

Inventor： Xinhe Tang ,  Klaus Mauthner ,  Ernst Hammel ,  Hans Löschner ,  Elmar Platzgummer ,  Gerhard Stengl

IPC: C23C16/26 ,  C23C16/48 ,  D01F9/127

CPC classification number: C30B23/00 ,  B82Y30/00 ,  B82Y40/00 ,  C01B32/162 ,  C30B29/02 ,  C30B29/605 ,  C30B33/00 ,  Y10S427/102

Abstract: Method of synthesizing carbon nano tubes (CNTs) on a catalyst layer formed on a support member, by catalytic deposition of carbon from a gaseous phase, whereby an ion beam is used prior to, during, and/or after formation of the carbon nano tubes for modifying the physical, chemical, and/or conductive properties of the carbon nanotubes.

Abstract translation: 在形成在支撑体上的催化剂层上合成碳纳米管（CNT）的方法，通过从气相中催化沉积碳，由此在形成碳纳米管之前，期间和/或之后使用离子束 用于改变碳纳米管的物理，化学和/或导电性质。

公开(公告)号：US08378320B2

公开(公告)日：2013-02-19

申请号：US13051714

申请日：2011-03-18

Applicant: Elmar Platzgummer

Inventor： Elmar Platzgummer

IPC: G21G5/10

CPC classification number: B82Y40/00 ,  B82Y10/00 ,  H01J37/3177

Abstract: For irradiating a target with a beam of energetic electrically charged particles comprising a plurality of beamlets, the target is exposed in a sequence of exposure stripes composed image pixels. These stripes (s1, s2) are, at their boundaries to adjacent stripes, provided with overlap margins (m12, m21) which are mutually overlapped, so nominal positions of image pixels in the overlap margin (m21) overlap, or substantially coincide, with image pixels in the corresponding overlap margin (m12). During the exposure of an overlap margin (m21), a first subset (n1) of image pixels in said overlap margin are exposed while those of a second subset (n2), possibly a complementary subset with respect to a desired pattern, are not exposed; contrariwise, during the exposure of the corresponding overlap margin (m12), image pixels corresponding to image pixels in the first subset are not exposed, but those corresponding to image pixels in the second subset are.

Abstract translation: 为了用包含多个子束的能量带电粒子束照射目标，目标以组成图像像素的曝光条纹的序列曝光。 这些条纹（s1，s2）在其相邻条纹的边界处设置有相互重叠的重叠边缘（m12，m21），因此重叠边界（m21）中图像像素的标称位置重叠或基本一致，与 相应重叠余量（m12）中的图像像素。 在重叠边缘（m21）的曝光期间，暴露所述重叠边缘中的图像像素的第一子集（n1），而第二子集（n2）可能相对于期望图案可能是互补子集的 ; 相反地​​，在曝光相应重叠余量（m12）期间，与第一子集中的图像像素相对应的图像像素不被曝光，但是对应于第二子集中的图像像素的像素是。

公开(公告)号：US08304749B2

公开(公告)日：2012-11-06

申请号：US11816059

申请日：2006-02-09

Applicant: Elmar Platzgummer ,  Stefan Cernusca

Inventor： Elmar Platzgummer ,  Stefan Cernusca

IPC: G21K5/10 ,  H01J37/08

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3174

Abstract: In a particle-beam projection processing apparatus for irradiating a target by a beam of energetic electrically charged particles, including an illumination system, a pattern definition system for positioning an aperture arrangement composed of apertures transparent to the energetic particles in the path of the illuminating beam, and a projection system to project the beam onto a target, there is provided at least one plate electrode device, which has openings corresponding to the apertures of the pattern definition system and including a composite electrode composed of a number of partial electrodes being arranged non-overlapping and adjoining to each other, the total lateral dimensions of the composite electrode covering the aperture arrangement of the pattern definition system. The partial electrodes can be applied different electrostatic potentials.

Abstract translation: 在用于通过包括照明系统的能量带电粒子束照射目标的粒子束投影处理装置中，用于定位由照明光束的路径中的能量粒子透明的孔组成的孔布置的图案定义系统 以及用于将光束投射到靶上的投影系统，设置有至少一个平板电极装置，其具有对应于图案定义系统的孔的开口，并且包括由多个部分电极组成的复合电极， 重叠并相邻，覆盖图案定义系统的孔布置的复合电极的总侧向尺寸。 部分电极可以施加不同的静电电位。

公开(公告)号：US08057972B2

公开(公告)日：2011-11-15

申请号：US12619071

申请日：2009-11-16

Applicant: Heinrich Fragner ,  Elmar Platzgummer ,  Adrian Bürli

Inventor： Heinrich Fragner ,  Elmar Platzgummer ,  Adrian Bürli

IPC: G03F9/00 ,  G03C5/00

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  Y10S430/143

Abstract: The invention relates to a method for forming a pattern on a substrate surface of a target by means of a beam of electrically charged particles in a number of exposure steps, where the beam is split into a patterned beam and there is a relative motion between the substrate and the pattern definition means. This results in an effective overall motion of the patterned particle beam over the substrate surface and exposition of image elements on the substrate surface in each exposure step, wherein the image elements on the target are exposed to the beamlets multiply, namely several times during a number of exposure steps according to a specific sequence. The sequence of exposure steps of the image elements is arranged in a non-linear manner according to a specific rule from one exposure step to the subsequent exposure step in order to reduce the current variations in the optical column of the multi-beam exposure apparatus during the exposure of the pattern.

Abstract translation: 本发明涉及一种用于在多个曝光步骤中通过带电粒子束在靶的衬底表面上形成图案的方法，其中光束被分裂成图案化的束，并且在两者之间存在相对运动 底物和图案定义方式。 这导致图案化的粒子束在衬底表面上的有效的总体运动，并且在每个曝光步骤中在衬底表面上显示图像元素，其中靶上的图像元素暴露于子束，在数字期间多次 的曝光步骤。 根据从一个曝光步骤到随后的曝光步骤的特定规则，图像元素的曝光步骤的顺序以非线性方式排列，以便减少多光束曝光设备的光学列中的电流变化 曝光的图案。

公开(公告)号：US08049189B2

公开(公告)日：2011-11-01

申请号：US12090636

申请日：2006-10-20

Applicant: Herbert Buschbeck ,  Elmar Platzgummer ,  Gerhard Stengl ,  Herbert Vonach

Inventor： Herbert Buschbeck ,  Elmar Platzgummer ,  Gerhard Stengl ,  Herbert Vonach

IPC: G21K1/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J37/21 ,  H01J2237/0492 ,  H01J2237/24578

Abstract: A charged particle system comprises a particle source for generating a beam of charged particles and a particle-optical projection system. The particle-optical projection system comprises a focusing first magnetic lens (403) comprising an outer pole piece (411) having a radial inner end (411′), and an inner pole piece (412) having a lowermost end (412′) disposed closest to the radial inner end of the outer pole piece, a gap being formed by those; a focusing electrostatic lens (450) having at least a first electrode (451) and a second electrode (450) disposed in a region of the gap; and a controller (C) configured to control a focusing power of the first electrostatic lens based on a signal indicative of a distance of a surface of a substrate from a portion of the first magnetic lens disposed closest to the substrate.

Abstract translation: 带电粒子系统包括用于产生带电粒子束的粒子源和粒子光学投影系统。 粒子光学投影系统包括聚焦第一磁性透镜（403），其包括具有径向内端（411'）的外极片（411）和设置有最下端（412'）的内极片（412） 最靠近外极片的径向内端的间隙由它们形成; 具有至少设置在所述间隙的区域中的第一电极（451）和第二电极（450）的聚焦静电透镜（450） 以及控制器（C），被配置为基于表示基板的表面距离最靠近基板设置的第一磁性透镜的部分的距离的信号来控制第一静电透镜的聚焦能力。

公开(公告)号：US20110204253A1

公开(公告)日：2011-08-25

申请号：US12959270

申请日：2010-12-02

Applicant: Elmar Platzgummer ,  Hans Loeschner

Inventor： Elmar Platzgummer ,  Hans Loeschner

IPC: G21K1/08

CPC classification number: H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/28 ,  H01J37/3174 ,  H01J2237/0437 ,  H01J2237/0458 ,  H01J2237/1501 ,  H01J2237/1502

Abstract: A multi-beam pattern definition device (102) for use in a particle-beam processing or inspection apparatus is configured to be irradiated with a beam (lp,bp) of electrically charged particles so as to form a number of beamlets to be imaged to a target. An aperture array means (202) comprises at least two sets of apertures (221, 222) for defining respective beamlets (b1-b5), wherein the sets of apertures comprise a plurality of apertures arranged in interlacing arrangements and the apertures of different sets are offset to each other by a common displacement vector (d12). An opening array means (201) has a plurality of openings (210) configured for the passage of a subset of beamlets corresponding to one of the sets of apertures but lacking openings (being opaque to the beam) at locations corresponding to the other sets of apertures. A positioning means shifts the aperture array means relative to the opening array means in order to selectively bring one of the sets of apertures into alignment with the openings in the opening array means.

Abstract translation: 用于粒子束处理或检查装置的多光束图案定义装置（102）被配置为用带电粒子的束（lp，bp）照射，以便形成若干待成像的子束 一个目标。 孔径阵列装置（202）包括用于限定各个子束（b1-b5）的至少两组孔（221,222），其中所述孔组包括布置在隔行布置中的多个孔，并且不同组的孔是 通过公共位移矢量（d12）彼此偏移。 开口阵列装置（201）具有多个开口（210），所述多个开口（210）构造成用于通过对应于所述一组孔的子束的子集，但是在对应于其它组的位置处的位置处缺少开口（对于不透明的） 孔。 定位装置相对于开口阵列装置移动孔径阵列装置，以选择性地使组的一组孔与开口阵列装置中的开口对准。

公开(公告)号：US20100288938A1

公开(公告)日：2010-11-18

申请号：US12780551

申请日：2010-05-14

Applicant: Elmar Platzgummer

Inventor： Elmar Platzgummer

IPC: H01J37/147

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J2237/0437

Abstract: The invention relates to a multi-beam deflector array means for use in a particle-beam exposure apparatus employing a beam of charged particles, said multi-beam deflector array means having an overall plate-like shape with a membrane region and a buried CMOS-layer, said membrane region comprising a first side facing towards the incoming beam of particles and a second side opposite to the first side, an array of apertures, each aperture allowing passage of a corresponding beam element formed out of said beam of particles, and an array of electrodes, each aperture being associated with at least one of said electrodes and the electrodes being controlled via said CMOS layer, wherein the electrodes are pillared, standing proud of the main body of the multi-beam deflector array means, the electrodes being connected to one side of the main body of the multi-beam deflector array means by means of bonding connections.

Abstract translation: 本发明涉及一种用于使用带电粒子束的粒子束曝光设备的多光束偏转器阵列装置，所述多光束偏转器阵列装置具有总体板状形状，其具有膜区域和掩埋的CMOS- 所述膜区域包括面向入射入射束的第一侧和与第一侧相对的第二侧，孔阵列，每个孔允许通过由所述粒子束形成的对应的束元件，以及 电极阵列，每个孔与所述电极中的至少一个相关联，并且电极通过所述CMOS层进行控制，其中所述电极被支柱，对于多光束偏转器阵列装置的主体站立，电极被连接 通过粘合连接到多光束偏转器阵列装置的主体的一侧。

公开(公告)号：US20100270474A1

公开(公告)日：2010-10-28

申请号：US11990067

申请日：2006-08-08

Applicant: Elmar Platzgummer ,  Gerhard Stengl ,  Helmut Falkner

Inventor： Elmar Platzgummer ,  Gerhard Stengl ,  Helmut Falkner

IPC: H01J37/12 ,  H01J3/18

CPC classification number: H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3177

Abstract: The present invention relates to a multi-beamlet multi-column particle-optical system comprising a plurality of columns which are disposed in an array for simultaneously exposing a substrate, each column having an optical axis and comprising: a beamlet generating arrangement comprising at least one multi-aperture plate for generating a pattern of multiple beamlets of charged particles, and an electrostatic lens arrangement comprising at least one electrode element; the at least one electrode element having an aperture defined by an inner peripheral edge facing the optical axis, the aperture having a center and a predetermined shape in a plane orthogonal to the optical axis; wherein in at least one of the plurality of columns, the predetermined shape of the aperture is a non-circular shape with at least one of a protrusion and an indentation from an ideal circle about the center of the aperture.

Abstract translation: 多子束多列粒子光学系统技术领域本发明涉及一种多子束多列粒子光学系统，该多子束多列粒子光学系统包括多个列，其被布置成阵列以同时暴露衬底，每个列具有光轴，并且包括：子束产生装置，其包括至少一个 用于产生多个带电粒子束的图案的多孔板，以及包括至少一个电极元件的静电透镜装置; 所述至少一个电极元件具有由面向光轴的内周边缘限定的孔，所述孔在与所述光轴正交的平面中具有中心和预定形状; 其中在所述多个列中的至少一个列中，所述孔的预定形状是非圆形形状，其具有围绕所述孔的中心的来自理想圆的突起和凹陷中的至少一个。