公开(公告)号：US3564077A

公开(公告)日：1971-02-16

申请号：US3564077D

申请日：1968-07-11

Applicant: HOECHST AG

Inventor： BRINKMANN LUDWIG ,  HERWIG WALTER

IPC: C08L67/02 ,  C08G39/10

CPC classification number: C08L67/02 ,  C08L25/00 ,  C08L2666/08

Abstract: MOLDING COMPOSITIONS WHICH CAN BE PROCESSED THERMOPLASTICALLY AND WHICH HAVE A HIGH IMPACT STRENGTH ARE PREPARED FROM LINEAR SATURATED POLYESTERS AND COPOLYMERS OF STYRENE AND CONJUGATED ALIPHATIC DIENES.

公开(公告)号：US3507930A

公开(公告)日：1970-04-21

申请号：US3507930D

申请日：1967-05-15

Applicant: HOECHST AG

Inventor： HERWIG WALTER

IPC: B01J31/14 ,  B01J31/18 ,  C07C2/32 ,  C07C3/18 ,  C07C11/02 ,  C07C11/12

CPC classification number: C07C2/32 ,  B01J31/143 ,  B01J31/1855 ,  B01J2231/20 ,  B01J2531/847 ,  C07C2531/14 ,  C07C2531/22

公开(公告)号：NO904115A

公开(公告)日：1991-03-22

申请号：NO904115

申请日：1990-09-20

Applicant: HOECHST AG

Inventor： EMMELIUS MICHAEL ,  HERWIG WALTER ,  ERBES KURT ,  DECKER RUDOLF

IPC: G03F7/033 ,  C08F257/02 ,  C08F283/10 ,  C08G59/00 ,  C08G59/18 ,  C08G59/40 ,  C08K3/36 ,  G03F1/08 ,  G03F7/004 ,  G03F7/031 ,  G03F7/032 ,  G03F7/038 ,  H05K3/06 ,  H05K3/28 ,  C08L25/02 ,  C08L33/00

CPC classification number: H05K3/287 ,  C08F257/02 ,  C08F283/10 ,  G03F7/004 ,  G03F7/032 ,  H05K2203/0793 ,  Y10S430/136

公开(公告)号：FI80155B

公开(公告)日：1989-12-29

申请号：FI850719

申请日：1985-02-21

Applicant: HOECHST AG

Inventor： SCHNELLER ARNOLD ,  HERWIG WALTER ,  ERBES KURT

IPC: G03C1/72 ,  G03F7/004 ,  G03F7/021 ,  G03F7/022 ,  G03F7/039 ,  G03F7/02

Abstract: A radiation-sensitive composition is disclosed which comprises: (a) a polymeric binder comprised of an alkenyl phenol monomer; (b) a compound which forms a strong acid under the action of actinic radiation; and (c) a compound which contains at least one acid-cleavable C-O-C bond and has a solubility in a liquid developer which is increased by the action of acid. The composition yields positive-working recording layers which are more flexible than layers comprising known novolak binders.

公开(公告)号：DE3540480A1

公开(公告)日：1987-05-21

申请号：DE3540480

申请日：1985-11-15

Applicant: HOECHST AG

Inventor： GEISSLER ULRICH ,  STEPPAN HARTMUT ,  HERWIG WALTER

IPC: C08F2/50 ,  C08F2/46 ,  C08F2/48 ,  C08F2/54 ,  C08F20/28 ,  C08F20/34 ,  C08F290/00 ,  C08F299/02 ,  G03C1/00 ,  G03F7/004 ,  G03F7/027 ,  G03F7/028 ,  G03F7/032 ,  H01L21/027 ,  G03C1/70 ,  G03F7/10 ,  C08F220/60 ,  C08F220/36

Abstract: A radiation-polymerizable mixture, recording material and process for using the recording material in relief recordings. The radiation-polymerizable mixture contains: (a) a polymeric binder, (b) a compound of the formula: 'in which A is O, NH or N-alkyl, Q is -CO-CpH2p-Z- or -CkH2kO-, Z is O or NH, R1 is H or alkyl, R2 is alkyl, alkenyl, cycloalkyl, aryl, aralkyl or SO2R3, R3 is alkyl, alkenyl, cycloalkyl, aryl, aralkyl or aryloxy, k is a number from 3 to 20, l is a number from 0 to 20, m is a number from 2 to 20, n is a number from 1 to 20 and p is a number from 2 to 10, and (c) a compound or a combination of compounds, which is capable of initiating the polymerization of the compound (b) under the action of actinic radiation. The mixture is especially suitable for the preparation of dry photoresist materials and is distinguished by good flexibility and adhesion to copper and by easy strippability in the light-cured state.

公开(公告)号：MY8600250A

公开(公告)日：1986-12-31

申请号：MY8600250

申请日：1986-12-30

Applicant: HOECHST AG

Inventor： GEISSLER ULRICH ,  HERWIG WALTER ,  SPRENGEL HEIDE ,  HASENJAEGER MANFRED

IPC: C08F2/00 ,  C08F2/46 ,  C08F2/48 ,  C08F2/50 ,  C08F220/36 ,  C08F290/00 ,  C08F299/00 ,  C08F299/06 ,  C08G18/67 ,  C08L75/06 ,  G03F7/004 ,  G03F7/027 ,  G03F7/26 ,  G03F7/10 ,  G03C1/70

Abstract: A radiation-polymerizable mixture comprising a polymeric binder, a radiation-activatable polymerization initiator and a polymerizable acrylate or methacrylate ester having at least two urethane groups in the molecule, said ester being a reaction product of glycerol dimethacrylate or glycerol diacrylate and a polyisocyanate obtained by reacting a polyhydroxy compound having from two to six hydroxyl groups with a diisocyanate or a reaction product of glycerol dimethacrylate or glycerol diacrylate and a diisocyanate. The new polymerizable urethanes provide the mixture with a high light-sensitivity, good reciprocity and a low tendency to crystallize.

公开(公告)号：FI864625A0

公开(公告)日：1986-11-13

申请号：FI864625

申请日：1986-11-13

Applicant: HOECHST AG

Inventor： GEISSLER ULRICH ,  STEPPAN HARTMUT ,  HERWIG WALTER

IPC: C08F2/50 ,  C08F2/46 ,  C08F2/48 ,  C08F2/54 ,  C08F20/28 ,  C08F20/34 ,  C08F290/00 ,  C08F299/02 ,  G03C1/00 ,  G03F7/004 ,  G03F7/027 ,  G03F7/028 ,  G03F7/032 ,  H01L21/027 ,  G03C

Abstract: A radiation-polymerizable mixture, recording material and process for using the recording material in relief recordings. The radiation-polymerizable mixture contains: (a) a polymeric binder, (b) a compound of the formula: 'in which A is O, NH or N-alkyl, Q is -CO-CpH2p-Z- or -CkH2kO-, Z is O or NH, R1 is H or alkyl, R2 is alkyl, alkenyl, cycloalkyl, aryl, aralkyl or SO2R3, R3 is alkyl, alkenyl, cycloalkyl, aryl, aralkyl or aryloxy, k is a number from 3 to 20, l is a number from 0 to 20, m is a number from 2 to 20, n is a number from 1 to 20 and p is a number from 2 to 10, and (c) a compound or a combination of compounds, which is capable of initiating the polymerization of the compound (b) under the action of actinic radiation. The mixture is especially suitable for the preparation of dry photoresist materials and is distinguished by good flexibility and adhesion to copper and by easy strippability in the light-cured state.

公开(公告)号：ZA8501110B

公开(公告)日：1985-09-25

申请号：ZA8501110

申请日：1985-02-14

Applicant: HOECHST AG

Inventor： SCHNELLER ARNOLD ,  HERWIG WALTER ,  ERBES KURT

IPC: G03C1/72 ,  G03F7/004 ,  G03F7/021 ,  G03F7/022 ,  G03F7/039 ,  G03F ,  G03C

CPC classification number: G03F7/0045 ,  G03F7/021 ,  Y10S430/111

公开(公告)号：CA1189650A

公开(公告)日：1985-06-25

申请号：CA405702

申请日：1982-06-22

Applicant: HOECHST AG

Inventor： MOHR DIETER ,  HERWIG WALTER ,  FRASS WERNER ,  USBECK GERHARD

IPC: C08F30/00 ,  B41N1/08 ,  B41N3/03 ,  C08F30/02 ,  C08F230/02 ,  G03F7/004 ,  G03C1/46 ,  C08F2/46 ,  G03C1/68

Abstract: The invention relates to a phosphoruscontaining polymer, polyvinylmethylphosphinic acid. It is prepared by polymerization, preferably catalytic, of vinylmethylphosphinic acid or a salt thereof. The new polymer possesses valuable properties and is used, in particular, in the production of offset printing plates which have a light-sensi-tive layer.

公开(公告)号：DE3168946D1

公开(公告)日：1985-03-28

申请号：DE3168946

申请日：1981-10-27

Applicant: HOECHST AG

Inventor： GEISSLER ULRICH ,  HERWIG WALTER ,  SPRENGEL HEIDE ,  HASENJAEGER MANFRED

IPC: C08F2/00 ,  C08F2/46 ,  C08F2/48 ,  C08F2/50 ,  C08F220/36 ,  C08F290/00 ,  C08F299/00 ,  C08F299/06 ,  C08G18/67 ,  C08L75/06 ,  G03F7/004 ,  G03F7/027 ,  G03F7/26 ,  G03C1/70

Abstract: A radiation-polymerizable mixture comprising a polymeric binder, a radiation-activatable polymerization initiator and a polymerizable acrylate or methacrylate ester having at least two urethane groups in the molecule, said ester being a reaction product of glycerol dimethacrylate or glycerol diacrylate and a polyisocyanate obtained by reacting a polyhydroxy compound having from two to six hydroxyl groups with a diisocyanate or a reaction product of glycerol dimethacrylate or glycerol diacrylate and a diisocyanate. The new polymerizable urethanes provide the mixture with a high light-sensitivity, good reciprocity and a low tendency to crystallize.