公开(公告)号：WO2004070776A3

公开(公告)日：2005-01-20

申请号：PCT/US0340155

申请日：2003-12-08

Applicant: MICELL TECHNOLOGIES INC ,  MCCLAIN JAMES B ,  DEYOUNG JAMES P ,  GROSS STEPHEN M ,  WAGNER MARK I

Inventor： MCCLAIN JAMES B ,  DEYOUNG JAMES P ,  GROSS STEPHEN M ,  WAGNER MARK I

IPC: B05D1/18 ,  B08B7/00 ,  B81B3/00 ,  B81C1/00 ,  H01L21/00 ,  H01L21/306 ,  C03C23/00 ,  B08B3/00 ,  B08B5/00

CPC classification number: B08B7/0021 ,  B05D1/18 ,  B05D2401/90 ,  H01L21/02063 ,  H01L21/02101 ,  H01L21/67017 ,  H01L21/67028 ,  Y10T137/0324

Abstract: A method of displacing a supercritical fluid from a pressure vessel (e.g., in a microelectronic manufacturing process), comprises the steps of: providing an enclosed pressure vessel containing a first supercritical fluid (said supercritical fluid preferably comprising carbon dioxide); adding a second fluid (typically also a supercritical fluid) to said vessel, with said second fluid being added at a pressure greater than the pressure of the first supercritical fluid, and with said second fluid having a density less than that of the first supercritical fluid; forming an interface between the first supercritical fluid and the second fluid; and displacing at least a portion of the first supercritical fluid from the vessel with the pressure of the second, preferably fluid while maintaining the interface therebetween.

Abstract translation: 从压力容器（例如，微电子制造工艺）中移出超临界流体的方法包括以下步骤：提供包含第一超临界流体（所述超临界流体优选包含二氧化碳）的封闭压力容器; 向所述容器中加入第二流体（通常也是超临界流体），其中所述第二流体以大于第一超临界流体的压力的压力加入，并且所述第二流体的密度小于第一超临界流体的密度 ; 在所述第一超临界流体和所述第二流体之间形成界面; 并且使第二超临界流体的至少一部分与第二流体（优选流体）的压力从容器移位，同时保持其间的界面。

公开(公告)号：WO2004033758A2

公开(公告)日：2004-04-22

申请号：PCT/US0330702

申请日：2003-09-30

Applicant: MICELL TECHNOLOGIES INC ,  MCCLAIN JAMES B ,  GROSS STEPHEN M ,  DEYOUNG JAMES P ,  WAGNER MARK I

Inventor： MCCLAIN JAMES B ,  GROSS STEPHEN M ,  DEYOUNG JAMES P ,  WAGNER MARK I

IPC: C23F1/10 ,  H01L21/306 ,  H01L21/311 ,  H01L21/3205 ,  H01L21/3213 ,  C23F

CPC classification number: C23F1/10 ,  H01L21/02052 ,  H01L21/31116 ,  H01L21/32051 ,  H01L21/32134

Abstract: Compositions useful for cleaning metal from a substrate or coating metal onto a substrate are described: Such compositions comprise (a) a densified carbon dioxide continuous phase; (b) a polar discrete phase in said carbon dioxide continuous phase; (c) a metal in said discrete phase (i.e., a metal removed from the substrate, or to be coated onto the substrate); (d) at least one ligand in said continuous phase, said discrete phase, or both said continuous and said discrete phase.

Abstract translation: 描述了用于从基材或涂覆金属清洗金属到基底上的组合物：这样的组合物包含（a）致密化的二氧化碳连续相; （b）所述二氧化碳连续相中的极性离散相; （c）所述离散相中的金属（即，从基底去除或要涂覆在基底上的金属）; （d）所述连续相中的至少一种配体，所述离散相或所述连续和所述离散相两者。

公开(公告)号：WO2004046826A2

公开(公告)日：2004-06-03

申请号：PCT/US0336670

申请日：2003-11-12

Applicant: MICELL TECHNOLOGIES INC ,  MCCLAIN JAMES B ,  DEYOUNG JAMES P

Inventor： MCCLAIN JAMES B ,  DEYOUNG JAMES P

IPC: G03F20060101 ,  G03F7/00 ,  G03F7/32 ,  G03F7/36 ,  G03F

CPC classification number: G03F7/36 ,  G03F7/32 ,  G03F7/325 ,  G03F7/327

Abstract: A method for carrying out positive tone lithography with a carbon dioxide solvent system is carried out by (a) providing a substrate having a polymer resist layer formed thereon; (b) exposing at least one portion of the polymer resist layer to radiant energy to form at least one light field region in the polymer resist layer; and then (c) contacting the polymer resist layer to a carbon dioxide solvent system, the solvent system preferably comprising a polar group, under conditions in which the at least one light field region is preferentially removed.

Abstract translation: 通过（a）提供其上形成有聚合物抗蚀剂层的基材，进行用二氧化碳溶剂系统进行正色调光刻的方法; （b）将聚合物抗蚀剂层的至少一部分暴露于辐射能以在聚合物抗蚀剂层中形成至少一个光场区域; 然后（c）在其中优选除去所述至少一个光场区域的条件下，使所述聚合物抗蚀剂层与二氧化碳溶剂体系接触，所述溶剂体系优选包含极性基团。

公开(公告)号：EP1368136A4

公开(公告)日：2005-10-12

申请号：EP02724947

申请日：2002-02-14

Applicant: MICELL TECHNOLOGIES INC

Inventor： DEYOUNG JAMES P ,  GROSS STEPHEN M ,  MCCLAIN JAMES B ,  COLE MICHAEL E ,  BRAINARD DAVID E ,  DESIMONE JOSEPH M

IPC: G03F7/32 ,  B08B7/00 ,  H01L21/027 ,  H01L21/304 ,  H01L21/306 ,  B08B3/00 ,  F26B3/00 ,  G03F7/42 ,  H01L21/00

CPC classification number: B08B7/0021 ,  H01L21/02063

Abstract: A method of cleaning and removing water, entrained solutes and particulate matter during a manufacturing process from a microelectronic device comprises the steps of: (a) providing a partially fabricated integrated circuit, MEM's device, or optoelectronic device having water and entrained solutes on the substrate; (b) providing a densified carbon dioxide cleaning composition, the cleaning composition comprising carbon dioxide and, optionally but preferably, a cleaning adjunct; (c) immersing the surface portion in the densified carbon dioxide drying composition; and then (d) removing the cleaning composition from the surface portion.

公开(公告)号：EP1706897A4

公开(公告)日：2010-06-23

申请号：EP04814212

申请日：2004-12-15

Applicant: MICELL TECHNOLOGIES INC

Inventor： DEYOUNG JAMES P ,  MCCLAIN JAMES B ,  GROSS STEPHEN M ,  TAYLOR DOUG ,  WAGNER MARK I ,  BRAINARD DAVID

IPC: H01L21/20 ,  H01L21/283 ,  H01L21/288 ,  H01L21/3205 ,  H01L21/44 ,  H01L21/4763 ,  H01L21/768 ,  H01L23/48 ,  H01L23/52 ,  H01L29/40

CPC classification number: H01L21/32051 ,  H01L21/283 ,  H01L21/288 ,  H01L21/76814 ,  H01L21/76843 ,  H01L21/76871

公开(公告)号：EP1200665A4

公开(公告)日：2004-05-06

申请号：EP00948825

申请日：2000-07-20

Applicant: MICELL TECHNOLOGIES INC ,  DEYOUNG JAMES P ,  STOREY LAUBACH BERNADETTE ,  CAUBLE DAVID F ,  MCCLAIN JAMES B

Inventor： DEYOUNG JAMES P ,  STOREY-LAUBACH BERNADETTE ,  CAUBLE DAVID F ,  MCCLAIN JAMES B

IPC: D06L1/00 ,  D06L1/16 ,  B05D1/00 ,  C11D1/82 ,  C11D3/39 ,  C11D3/43 ,  D06L1/02 ,  D06L1/04 ,  D06L1/08

CPC classification number: D06L1/00 ,  D06L1/16

Abstract: A method for dry-cleaning articles such as fabrics and clothing in carbon dioxide. The article includes a stained portion or region, which is pretreated with a pretreatment composition prior to initiating the cleaning cycle. The pretreatment step is followed by contacting the pretreated article to be cleaned with a liquid dry cleaning composition for a time sufficient to clean the article. The liquid dry-cleaning composition comprises a mixture of carbon dioxide, a surfactant, and an organic co-solvent. After the contacting step, the article is separated from the liquid dry cleaning composition. The pretreatment composition, in a preferred embodiment, comprises at least one of (a) a surfactant; (b) d-limonene, and (c) a C12-C15 alkane co-solvent. Preferably the pretreatment composition comprises at least two, and in some particularly preferred embodiments, the pretreatment composition comprises all three, of the aforesaid ingredients.