公开(公告)号：IN1903MUN2014A

公开(公告)日：2015-07-10

申请号：IN1903MUN2014

申请日：2014-09-24

Applicant: SAINT GOBAIN CERAMICS

Inventor： TANIKELLA BRAHMANANDAM V ,  CHINNAKARUPPAN PALANIAPPAN ,  RIZZUTO ROBERT A ,  CHERIAN ISAAC K ,  VEDANTHAM RAMANUJAM

IPC: B24B1/00 ,  B24B7/22

Abstract: A method of machining a sapphire substrate comprises grinding a first surface of a sapphire substrate using a first fixed abrasive and grinding said first surface of the sapphire substrate using a second fixed abrasive, wherein the second fixed abrasive has a smaller average grain size than the first fixed abrasive, and wherein the second, fixed abrasive is self -dressing.

公开(公告)号：PL2121242T3

公开(公告)日：2012-07-31

申请号：PL07855323

申请日：2007-12-21

Applicant: SAINT GOBAIN CERAMICS

Inventor： TANIKELLA BRAHMANANDAM V ,  CHINNAKARUPPAN PALANIAPPAN ,  RIZZUTO ROBERT A ,  CHERIAN ISAAC K ,  VEDANTHAM RAMANUJAM

IPC: B24B1/00 ,  B24B7/22

公开(公告)号：CA2382724C

公开(公告)日：2006-01-24

申请号：CA2382724

申请日：2000-08-30

Applicant: SAINT GOBAIN CERAMICS

Inventor： TANIKELLA BRAHMANANDAM V ,  DELANEY WILLIAM R ,  GARG AJAY K

IPC: B24B37/00 ,  C09K3/14 ,  C01F7/44 ,  C09G1/02 ,  H01L21/304 ,  H01L21/321

Abstract: CMP processes and products employ aluminas comprising alpha alumina particle s having a particle width of less than 50 nanometers and a surface area of at least 50 m2/gm.

公开(公告)号：ZA200201091B

公开(公告)日：2003-07-30

申请号：ZA200201091

申请日：2002-02-07

Applicant: SAINT GOBAIN CERAMICS

Inventor： GARG AJAY K ,  TANIKELLA BRAHMANANDAM V ,  DELANEY WILLIAM R

IPC: C01F7/44 ,  C09G1/02 ,  C09K3/14 ,  B24B37/00 ,  H01L21/304 ,  H01L21/321 ,  C09K ,  C09G ,  H01L

Abstract: CMP processes and products employ aluminas comprising alpha alumina particles having a particle width of less than 50 nanometers and a surface area of at least 50 m2/gm.

公开(公告)号：DE60001958D1

公开(公告)日：2003-05-08

申请号：DE60001958

申请日：2000-06-06

Applicant: SAINT GOBAIN CERAMICS

Inventor： GARG AJAY K ,  TANIKELLA BRAHMANANDAM V ,  KHAUND ARUP

IPC: B24B37/00 ,  C01F17/00 ,  C09K3/14 ,  H01L21/304 ,  H01L21/306

Abstract: A polishing slurry, useful in optical or CMP applications, comprises a ceria with a BET surface area of at least 10 m2/gm. The slurry may be made by subjecting a commercial ceria slurry comprising agglomerates to a mechano-chemical treatment at a pH of from 9 to 11 using media that are low purity alpha alumina or zirconia. Preferred slurries maintain a positive surface charge at all pH values. CMP slurries preferably comprise in addition an anionic surfactant to aid in removal of surface residues.

公开(公告)号：CA2374373A1

公开(公告)日：2000-12-21

申请号：CA2374373

申请日：2000-06-06

Applicant: SAINT GOBAIN CERAMICS

Inventor： KHAUND ARUP ,  TANIKELLA BRAHMANANDAM V ,  GARG AJAY K

IPC: B24B37/00 ,  C01F17/00 ,  C09K3/14 ,  H01L21/304 ,  H01L21/306

Abstract: A polishing slurry, useful in optical or CMP applications, comprises a ceria with a BET surface area of at least 10 m2/gm. The slurry may be made by subjecting a commercial ceria slurry comprising agglomerates to a mechano- chemical treatment at a pH of from 9 to 11 using media that are low purity alpha alumina or zirconia. Preferred slurries maintain a positive surface charge at all pH values. CMP slurries preferably comprise in addition an anionic surfactant to aid in removal of surface residues.