Abstract:
A method of removing particles from a surface, comprising the steps of providing a surface 5 having particles thereon, placing the surface in a flowing polar solution 3 and causing light rays having a wavelength of from about 170 to about 2000 nanometers to impinge upon the particles. The surface of the polar solution and the light rays an be disposed in an inert ambient. The surface and the particles in the polar solution can be agitated. An electrode 7 can be provided external to the polar solution to provide a positive charge on the particles in the polar solution. There is also provided a method of removing particles from a surface, comprising the steps of providing a vessel 1 having a polar composition 3 flowing therein, placing a surface 5 having particles thereon in the flowing polar composition, providing an electrode 7 electrically insulated from the surface and providing a positive charge on the electrode. The electrode 7 can be disposed external to the vessel 1. The polar composition 3 is preferably clean water.
Abstract:
Generally, and in one form of the invention, a method is presented for the photo-stimulated etching of a CaF₂ surface 12, comprising the steps of exposing the CaF₂ surface 12 to an ambient species 16, exciting the CaF₂ surface 12 and/or the ambient species 16 by photo-stimulation sufficiently to allow reaction of the CaF₂ surface 12 with the ambient species 16 to form CaF₂/ambient species products, and removing the ambient species 16 and the CaF₂/ambient species products from the CaF₂ surface 12. Other devices, systems and methods are also disclosed.
Abstract:
A method of cleaning and treating a device, including those of the micromechanical (10) and semiconductor type. The surface of a device, such as the landing electrode (22) of a digital micromirror device (10), is first cleaned with a supercritical fluid (SCF) in a chamber (50) to remove soluble chemical compounds, and then maintained in the SCF chamber until and during the subsequent passivation step. Passivants including PFDA and PFPE are suitable for the present invention. By maintaining the device in the SCF chamber, and without exposing the device to, for instance, the ambient of a clean room, organic and inorganic contaminants cannot be deposited upon the cleaned surface prior to the passivation step. The present invention derives technical advantages by providing an improved passivated surface that is suited to extend the useful operation life of devices, including those of the micromechanical type, reducing stiction forces between contacting elements such as a mirror and its landing electrode. The present invention is also suitable for cleaning and passivating other surfaces including a surface of semiconductor wafers, and the surface of a hard disk memory drive.
Abstract:
Novel methods of forming capacitors containing high dielectric materials are disclosed. Capacitors are made by forming a layer of conductive metal nitride (e.g. ruthenium nitride, 28), then forming a layer of a high dielectric constant material (e.g. barium strontium titanate, 30) on the metal nitride layer, then forming a layer of a non-metal containing electrically conductive compound (e.g. ruthenium oxide, 32) on the layer of high dielectric constant material. Typically, the high dielectric constant material is a transition metal oxide, a titanate doped with one or more rare earth elements, a titanate doped with one or more alkaline earth metals, or combinations thereof. Preferably, the conductive compound is ruthenium nitride, ruthenium dioxide, tin nitride, tin oxide, titanium nitride, titanium monoxide, or combinations thereof. The conductive compound may be doped to increase its electrical conductivity.
Abstract:
Photothermal effects of a material (10) may be detected and analyzed in order to identify and characterize the material (10). The material (10) is illuminated by a light (32) from a light source (34). The material (10) absorbs the light (32), causing an increase in temperature and size of the material (10). An atomic force probe tip (30) detects the increase in temperature and size of the material (10) in order to determine characteristic properties of the material (10). The characteristic properties of the material (10) are used in identifying the nature of the material (10).
Abstract:
A method of unsticking contacting elements (11, 17) of a micro-mechanical device (30). The device is exposed to either a low surface tension liquid with a surfactant (32) or to a supercritical fluid (62) so as to avoid damage to fragile components of the device (30). The exposure conditions are controlled so as to provide optimum results without damage to the device.
Abstract:
A method of removing particles from a surface, comprising the steps of providing a surface 5 having particles thereon, placing the surface in a flowing polar solution 3 and causing light rays having a wavelength of from about 170 to about 2000 nanometers to impinge upon the particles. The surface of the polar solution and the light rays an be disposed in an inert ambient. The surface and the particles in the polar solution can be agitated. An electrode 7 can be provided external to the polar solution to provide a positive charge on the particles in the polar solution. There is also provided a method of removing particles from a surface, comprising the steps of providing a vessel 1 having a polar composition 3 flowing therein, placing a surface 5 having particles thereon in the flowing polar composition, providing an electrode 7 electrically insulated from the surface and providing a positive charge on the electrode. The electrode 7 can be disposed external to the vessel 1. The polar composition 3 is preferably clean water.
Abstract:
Generally, and in one form of the invention, a method is presented for the photo-stimulated removal of trace metals 16 from a surface 11, comprising the steps of covering the surface 11 with an ambient species 14, exciting the trace metals 16 and/or the ambient species 14 by photo-stimulation sufficiently to allow reaction of the trace metals with the ambient species to form metal products, and removing the ambient species 14 and the metal products from the surface 11. Other methods are also disclosed.
Abstract:
Generally, and in one form of the invention, a method is presented for the photo-stimulated removal of trace metals 16 from a surface 11, comprising the steps of covering the surface 11 with an ambient species 14, exciting the trace metals 16 and/or the ambient species 14 by photo-stimulation sufficiently to allow reaction of the trace metals with the ambient species to form metal products, and removing the ambient species 14 and the metal products from the surface 11. Other methods are also disclosed.