Method of removing small particles from a surface
    32.
    发明公开
    Method of removing small particles from a surface 失效
    Verfahren zum Entfernen kleiner Teilchen von einem Substrat。

    公开(公告)号:EP0567939A2

    公开(公告)日:1993-11-03

    申请号:EP93106589.0

    申请日:1993-04-22

    CPC classification number: H01L21/02052

    Abstract: A method of removing particles from a surface, comprising the steps of providing a surface 5 having particles thereon, placing the surface in a flowing polar solution 3 and causing light rays having a wavelength of from about 170 to about 2000 nanometers to impinge upon the particles. The surface of the polar solution and the light rays an be disposed in an inert ambient. The surface and the particles in the polar solution can be agitated. An electrode 7 can be provided external to the polar solution to provide a positive charge on the particles in the polar solution. There is also provided a method of removing particles from a surface, comprising the steps of providing a vessel 1 having a polar composition 3 flowing therein, placing a surface 5 having particles thereon in the flowing polar composition, providing an electrode 7 electrically insulated from the surface and providing a positive charge on the electrode. The electrode 7 can be disposed external to the vessel 1. The polar composition 3 is preferably clean water.

    Abstract translation: 一种从表面除去颗粒的方法,包括以下步骤:在其上提供具有颗粒的表面5,将表面放置在流动的极性溶液3中,并引起波长为约170至约2000纳米的光线撞击颗粒 。 极性溶液的表面和光线被设置在惰性环境中。 可以搅拌极性溶液中的表面和颗粒。 电极7可以设置在极性溶液的外部,以在极性溶液中的颗粒上提供正电荷。 还提供了从表面除去颗粒的方法,包括以下步骤:提供容器1,其具有流过其中的极性组合物3,将具有颗粒的表面5放置在流动的极性组合物中,从而提供与电极7电绝缘的电极7 并在电极上提供正电荷。 电极7可以设置在容器1的外部。极性组合物3优选为干净的水。

    Photo-stimulated etching of CaF2
    33.
    发明公开
    Photo-stimulated etching of CaF2 失效
    CAF2的光刺激蚀刻

    公开(公告)号:EP0516142A3

    公开(公告)日:1993-06-09

    申请号:EP92109086.6

    申请日:1992-05-29

    CPC classification number: H01L21/31116 H01L21/31654

    Abstract: Generally, and in one form of the invention, a method is presented for the photo-stimulated etching of a CaF₂ surface 12, comprising the steps of exposing the CaF₂ surface 12 to an ambient species 16, exciting the CaF₂ surface 12 and/or the ambient species 16 by photo-stimulation sufficiently to allow reaction of the CaF₂ surface 12 with the ambient species 16 to form CaF₂/ambient species products, and removing the ambient species 16 and the CaF₂/ambient species products from the CaF₂ surface 12. Other devices, systems and methods are also disclosed.

    Abstract translation: 通常,在本发明的一种形式中,提出了用于CaF2表面12的光刺激蚀刻的方法,包括以下步骤:将CaF 2表面12暴露于环境物质16,激发CaF 2表面12和/或 环境物质16通过光刺激足以允许CaF 2表面12与环境物质16反应以形成CaF 2 /环境物质产物,并从CaF 2表面12去除环境物质16和CaF 2 /环境物质产物。其它装置 ,还公开了系统和方法。

    Method of cleaning and treating a micromechanical device
    34.
    发明公开
    Method of cleaning and treating a micromechanical device 失效
    一种用于清洁和处理微型机械装置的方法

    公开(公告)号:EP0746013A3

    公开(公告)日:1999-10-27

    申请号:EP96108733.5

    申请日:1996-05-31

    Abstract: A method of cleaning and treating a device, including those of the micromechanical (10) and semiconductor type. The surface of a device, such as the landing electrode (22) of a digital micromirror device (10), is first cleaned with a supercritical fluid (SCF) in a chamber (50) to remove soluble chemical compounds, and then maintained in the SCF chamber until and during the subsequent passivation step. Passivants including PFDA and PFPE are suitable for the present invention. By maintaining the device in the SCF chamber, and without exposing the device to, for instance, the ambient of a clean room, organic and inorganic contaminants cannot be deposited upon the cleaned surface prior to the passivation step. The present invention derives technical advantages by providing an improved passivated surface that is suited to extend the useful operation life of devices, including those of the micromechanical type, reducing stiction forces between contacting elements such as a mirror and its landing electrode. The present invention is also suitable for cleaning and passivating other surfaces including a surface of semiconductor wafers, and the surface of a hard disk memory drive.

    Electrodes for high dielectric constant materials
    35.
    发明公开
    Electrodes for high dielectric constant materials 失效
    Konstanten的ElektrodenfürMaterialien mit hohen dielektrischen Konstanten

    公开(公告)号:EP0800187A2

    公开(公告)日:1997-10-08

    申请号:EP97100451.0

    申请日:1993-04-20

    Abstract: Novel methods of forming capacitors containing high dielectric materials are disclosed. Capacitors are made by forming a layer of conductive metal nitride (e.g. ruthenium nitride, 28), then forming a layer of a high dielectric constant material (e.g. barium strontium titanate, 30) on the metal nitride layer, then forming a layer of a non-metal containing electrically conductive compound (e.g. ruthenium oxide, 32) on the layer of high dielectric constant material. Typically, the high dielectric constant material is a transition metal oxide, a titanate doped with one or more rare earth elements, a titanate doped with one or more alkaline earth metals, or combinations thereof. Preferably, the conductive compound is ruthenium nitride, ruthenium dioxide, tin nitride, tin oxide, titanium nitride, titanium monoxide, or combinations thereof. The conductive compound may be doped to increase its electrical conductivity.

    Abstract translation: 公开了形成含有高介电材料的电容器的新方法。 电容器通过形成一层导电金属氮化物(例如,氮化钌28),然后在金属氮化物层上形成一层高介电常数材料(例如钛酸钡锶30),然后形成一层非金属 在高介电常数材料层上含有导电化合物(例如氧化钌32)的金属。 通常,高介电常数材料是过渡金属氧化物,掺杂有一种或多种稀土元素的钛酸盐,掺杂有一种或多种碱土金属的钛酸盐或其组合。 优选地,导电化合物是氮化钌,二氧化钌,氮化锡,氧化锡,氮化钛,一氧化钛或其组合。 可以掺杂导电化合物以增加其导电性。

    Method and apparatus for identifying and characterizing a material
    36.
    发明公开
    Method and apparatus for identifying and characterizing a material 失效
    用于材料的鉴定和表征的方法和设备

    公开(公告)号:EP0721101A3

    公开(公告)日:1997-02-26

    申请号:EP96100210.2

    申请日:1996-01-09

    CPC classification number: G01Q30/02 G01N21/17 G01Q60/24

    Abstract: Photothermal effects of a material (10) may be detected and analyzed in order to identify and characterize the material (10). The material (10) is illuminated by a light (32) from a light source (34). The material (10) absorbs the light (32), causing an increase in temperature and size of the material (10). An atomic force probe tip (30) detects the increase in temperature and size of the material (10) in order to determine characteristic properties of the material (10). The characteristic properties of the material (10) are used in identifying the nature of the material (10).

    Improvements in or relating to micro-mechanical devices
    37.
    发明公开
    Improvements in or relating to micro-mechanical devices 失效
    Verbesserungen an oderBezüglichmikromechanische Vorrichtungen

    公开(公告)号:EP0689076A1

    公开(公告)日:1995-12-27

    申请号:EP95109614.8

    申请日:1995-06-21

    Abstract: A method of unsticking contacting elements (11, 17) of a micro-mechanical device (30). The device is exposed to either a low surface tension liquid with a surfactant (32) or to a supercritical fluid (62) so as to avoid damage to fragile components of the device (30). The exposure conditions are controlled so as to provide optimum results without damage to the device.

    Abstract translation: 一种解开微机械装置(30)的接触元件(11,17)的方法。 该装置暴露于具有表面活性剂(32)的低表面张力液体或超临界流体(62),以避免损坏装置(30)的易碎部件。 控制曝光条件以提供最佳结果而不损坏装置。

    Method of removing small particles from a surface
    38.
    发明公开
    Method of removing small particles from a surface 失效
    从表面去除小颗粒的方法

    公开(公告)号:EP0567939A3

    公开(公告)日:1993-12-15

    申请号:EP93106589.0

    申请日:1993-04-22

    CPC classification number: H01L21/02052

    Abstract: A method of removing particles from a surface, comprising the steps of providing a surface 5 having particles thereon, placing the surface in a flowing polar solution 3 and causing light rays having a wavelength of from about 170 to about 2000 nanometers to impinge upon the particles. The surface of the polar solution and the light rays an be disposed in an inert ambient. The surface and the particles in the polar solution can be agitated. An electrode 7 can be provided external to the polar solution to provide a positive charge on the particles in the polar solution. There is also provided a method of removing particles from a surface, comprising the steps of providing a vessel 1 having a polar composition 3 flowing therein, placing a surface 5 having particles thereon in the flowing polar composition, providing an electrode 7 electrically insulated from the surface and providing a positive charge on the electrode. The electrode 7 can be disposed external to the vessel 1. The polar composition 3 is preferably clean water.

    Photo-stimulated removal of trace metals
    39.
    发明公开
    Photo-stimulated removal of trace metals 失效
    追踪金属的激光去除

    公开(公告)号:EP0502356A3

    公开(公告)日:1993-03-10

    申请号:EP92102669.6

    申请日:1992-02-18

    CPC classification number: H01L21/02052 C23F4/00 H01L21/67057

    Abstract: Generally, and in one form of the invention, a method is presented for the photo-stimulated removal of trace metals 16 from a surface 11, comprising the steps of covering the surface 11 with an ambient species 14, exciting the trace metals 16 and/or the ambient species 14 by photo-stimulation sufficiently to allow reaction of the trace metals with the ambient species to form metal products, and removing the ambient species 14 and the metal products from the surface 11. Other methods are also disclosed.

    Photo-stimulated removal of trace metals
    40.
    发明公开
    Photo-stimulated removal of trace metals 失效
    Photo-aktiviertes Entfernen von Metallspuren。

    公开(公告)号:EP0502356A2

    公开(公告)日:1992-09-09

    申请号:EP92102669.6

    申请日:1992-02-18

    CPC classification number: H01L21/02052 C23F4/00 H01L21/67057

    Abstract: Generally, and in one form of the invention, a method is presented for the photo-stimulated removal of trace metals 16 from a surface 11, comprising the steps of covering the surface 11 with an ambient species 14, exciting the trace metals 16 and/or the ambient species 14 by photo-stimulation sufficiently to allow reaction of the trace metals with the ambient species to form metal products, and removing the ambient species 14 and the metal products from the surface 11.
    Other methods are also disclosed.

    Abstract translation: 通常,并且在本发明的一种形式中,提供了用于从表面11光激发除去痕量金属16的方法,包括以下步骤:用环境物质14覆盖表面11,激发微量金属16和/ 或环境物质14通过充分的光刺激使微量金属与环境物质反应形成金属产物,以及从表面11除去环境物质14和金属产物。还公开了其它方法。

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