Abstract:
A laser processing method for removing glass by melting, evaporation or ablation from sheet-like glass substrate for forming microscopic concavities and convexities. Diffraction grating and planar microlens array obtained thereby.
Abstract:
In order to eliminate the effect of water attack on silica optical fibres, the fibres are provided with a surface layer of silicon nitride or silicon oxynitride. The method proposed comprises direct nitridation. This may be achieved by adding a nitriding atmosphere to the drawing furnace gases (Fig. 1), or to the reactive gases (TiCl 4 and SiCl 4 ) incorporated in the flame of an oxyhydrogen torch (Fig. 2) for the formation of a compressive silica/titania layer on an optical fibre by a glass soot deposition and sintering process.
Abstract:
A method of incorporating within a glass optical waveguide a material of interest having a property of interest that would be neutralized by exposure to molten glass includes combining pieces of a light-transmissive first glass with the material of interest. The combined first glass and material of interest are shaped within a container and heated to a temperature sufficiently high to cause the glass pieces and material of interest to mutually coalesce and form a light-transmissive core rod, but not high enough that the first glass melts and neutralizes the property of interest. A cladding tube is heated and fused about the core rod to define a mono rod. An optical waveguide through which light propagates by internal reflection, and which incorporates the material of interest, is defined when the cladding tube comprises a glass that renders the cladding of lower refractive index than the core rod.
Abstract:
What is disclosed includes OD-doped synthetic silica glass capable of being used in optical elements for use in lithography below about 300 nm. OD-doped synthetic silica glass was found to have significantly lower polarization-induced birefringence value than non-OD-doped silica glass with comparable concentration of OH. Also disclosed are processes for making OD-dopes synthetic silica glasses, optical member comprising such glasses, and lithographic systems comprising such optical member. The glass is particularly suitable for immersion lithographic systems due to the exceptionally low polarization-induced birefringence values at about 193 nm.
Abstract:
Techniques for producing a glass structure having interconnected macroscopic pores, including providing a polymeric structure having interconnected macroscopic pores; providing polymerizable glass precursors; filling pores in the polymeric structure with the polymerizable glass precursors; polymerizing the polymerizable glass precursors to yield a filled polymeric structure; and decomposing the filled polymeric structure to produce a glass structure having interconnected macroscopic pores. Techniques for filling pores of such glass structure with a material having a high refractive index, and for then removing the glass structure. Structures can be produced having interconnected macroscopic pores and high refractive index contrasts, which can be used, for example, as photonic band gaps.
Abstract:
Techniques for producing a glass structure having interconnected macroscopic pores, employing steps of filling polymerizable glass precursors into pores in a polymeric structure having interconnected macroscopic pores; polymerizing the precursors; and decomposing the polymers to produce a glass oxide structure having interconnected macroscopic pores. Further techniques employ steps of exposing portions of a photosensitive medium including glass precursors to an optical interference pattern; polymerizing or photodeprotecting the exposed portions and removing unpolymerized or deprotected portions; and decomposing the polymerized or deprotected portions to produce a glass structure having interconnected macroscopic pores. Techniques for filling pores of such glass structure with a material having a high refractive index, and for then removing the glass structure. Structures can be produced having interconnected macroscopic pores and high refractive index contrasts, which can be used, for example, as photonic band gaps.
Abstract:
The present invention is directed to a fluorinated rare earth doped glass composition and method for making a glass-ceramic optical article therefrom, e.g. optical fiber waveguides, fiber lasers and active fiber amplifiers, having application in the 1300 nm and 1550 nm telecommunications windows. The inventive compositions include Pr3+ and/or Dy3+ in a concentration range of between 300-2,000 ppmw and Ag+ in a concentration range of between 500-2000 ppmw; or Er3+ in a concentration range of between 500-5,000 ppmw and Ag+ in a concentration range of between 0-2,000 ppmw. The monovalent silver ion provides an ionic charge balanced glass-ceramic crystal. These compositions exhibit reduced or absent rare earth ion clustering and fluorescence quenching effects in the presence of high concentrations of rare earth ion dopants.
Abstract:
A laser processing method for removing glass by melting, evaporation or ablation from sheet-like glass substrate for forming microscopic concavities and convexities. Diffraction grating and planar microlens array obtained thereby.
Abstract:
The present invention is directed to a fluorinated rare earth doped glass composition and method for making a glass-ceramic optical article therefrom, e.g. optical fiber waveguides, fiber lasers and active fiber amplifiers, having application in the 1300 nm and 1550 nm telecommunications windows. The inventive compositions include Pr3+ and/or Dy3+ in a concentration range of between 300-2,000 ppmw and Ag+ in a concentration range of between 500-2,000 ppmw; or Er3+ in a concentration range of between 500-5,000 ppmw and Ag+ in a concentration range of between 0-2,000 ppmw. The monovalent silver ion provides an ionic charge balanced glass-ceramic crystal. These compositions exhibit reduced or absent rare earth ion clustering and fluorescence quenching effects in the presence of high concentrations of rare earth ion dopants.
Abstract:
In order to eliminate the effect of water attack on silica optical fibres, the fibres are provided with a surface layer of silicon nitride or silicon oxynitride. The method proposed comprises direct nitridation. This may be achieved by adding a nitriding atmosphere to the drawing furnace gases, or to the reactive gases (TiCl.sub.4 and SiCl.sub.4) incorporated in the flame of an oxyhydrogen torch for the formation of a compressive silica/titania layer on an optical fibre by a glass soot deposition and sintering process.