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    Nonlinear optical silica material and nonlinear optical device
    32.
    发明公开
    Nonlinear optical silica material and nonlinear optical device 有权
    装置和由硅酸盐的非线性光学材料

    公开(公告)号：EP0977079A3

    公开(公告)日：2001-10-10

    申请号：EP99113808.2

    申请日：1999-07-14

    Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA

    Inventor： Nagashima, Tomonori ,  Nakamura, Naoki

    IPC: G02F1/355

    CPC classification number: G02F1/3555 ,  C03C3/06 ,  C03C3/076 ,  C03C3/11 ,  C03C2201/08 ,  C03C2201/12 ,  C03C2201/21

    Abstract: A nonlinear optical silica material mainly consisting of SiO 2 -GeO 2 to which hydrogen or halogen element X is added. Oxygen bonded to Ge contained in the nonlinear optical silica material is replaced by H or X, and one Ge has two Ge-O bonds and one Ge-H (or Ge-X) bond at Ge· points where nonlinearity is exhibited in the silica material. The Ge-H (or Ge-X) bond does not relate to a crystal network, so that when the polarity is oriented in order to exhibit nonlinearity at Ge·, an electric field to be applied can be lowered, and when a optical semiconductor hybrid element or the like is produced, other portions of the semiconductor elements can be prevented from being broken or degraded in performance. An insulating film can be interposed between the semiconductor substrate and the nonlinear optical silica film to prevent undesired impurities from dispersing into the semiconductor substrate and other elements and preventing a defect from being caused in the crystal of the substrate due to the silica film.

    Nonlinear optical silica material and nonlinear optical device
    33.
    发明公开
    Nonlinear optical silica material and nonlinear optical device 有权
    Vorrichtung und nichtlinear optisches Material aus Silikat

    公开(公告)号：EP0977079A2

    公开(公告)日：2000-02-02

    申请号：EP99113808.2

    申请日：1999-07-14

    Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA

    Inventor： Nagashima, Tomonori ,  Nakamura, Naoki

    IPC: G02F1/355

    CPC classification number: G02F1/3555 ,  C03C3/06 ,  C03C3/076 ,  C03C3/11 ,  C03C2201/08 ,  C03C2201/12 ,  C03C2201/21

    Abstract: A nonlinear optical silica material mainly consisting of SiO 2 -GeO 2 to which hydrogen or halogen element X is added. Oxygen bonded to Ge contained in the nonlinear optical silica material is replaced by H or X, and one Ge has two Ge-O bonds and one Ge-H (or Ge-X) bond at Ge· points where nonlinearity is exhibited in the silica material. The Ge-H (or Ge-X) bond does not relate to a crystal network, so that when the polarity is oriented in order to exhibit nonlinearity at Ge·, an electric field to be applied can be lowered, and when a optical semiconductor hybrid element or the like is produced, other portions of the semiconductor elements can be prevented from being broken or degraded in performance. An insulating film can be interposed between the semiconductor substrate and the nonlinear optical silica film to prevent undesired impurities from dispersing into the semiconductor substrate and other elements and preventing a defect from being caused in the crystal of the substrate due to the silica film.

    Abstract translation: 主要由添加了氢或卤素元素X的SiO 2 -GOO组成的非线性光学二氧化硅材料。 在非线性光学二氧化硅材料中包含的与Ge结合的氧被H或X替代，并且一个Ge在Ge处具有两个Ge-O键和一个Ge-H（或Ge-X）键。 在二氧化硅材料中显示出非线性的点。 Ge-H（或Ge-X）键与晶体网络无关，因此当极性取向以在Ge表现出非线性时，可以降低要施加的电场，而当光半导体 混合元件等，可以防止半导体元件的其它部分的性能破坏或劣化。 可以在半导体衬底和非线性光学二氧化硅膜之间插入绝缘膜，以防止不期望的杂质分散到半导体衬底和其它元件中，并且防止由于二氧化硅膜在衬底的晶体中引起缺陷。

    Optical fiber
    35.
    发明专利
    Optical fiber 有权
    光纤

    公开(公告)号：JP2013061620A

    公开(公告)日：2013-04-04

    申请号：JP2012047010

    申请日：2012-03-02

    Applicant: Sumitomo Electric Ind Ltd ,  住友電気工業株式会社

    Inventor： HIRANO MASAAKI ,  HARUNA TETSUYA ,  TAMURA YASUAKI ,  YAMAMOTO YOSHINORI

    IPC: G02B6/036

    CPC classification number: G02B6/02219 ,  C03B2201/07 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/31 ,  C03B2201/50 ,  C03B2203/22 ,  C03B2203/23 ,  C03C3/06 ,  C03C13/045 ,  C03C2201/08 ,  G02B6/03611

    Abstract: PROBLEM TO BE SOLVED: To provide an optical fiber which is suitably used as an optical transmission path of an optical communication system and can improve an OSNR.SOLUTION: In an optical fiber which has a core portion and a cladding portion, when an effective cross section is represented by Aeff and a mode field diameter is represented by MFD, a k value represented by k=4Aeff/(πMFD) is 1.08 or more, wavelength dispersion is +19.0 ps/nm/km or more and +21.9 ps/nm/km or less, and the mode field diameter MFD is 10.3 μm or more and 13.0 μm or less, at a wavelength of 1,550 nm. When a position in the radial direction of which a refractive index becomes the minimum value Nin the core portion is represented by r, a position in the radial direction of which a refractive index becomes the maximum value Nin the core portion is represented by r, and a radius of the core portion is represented by r, the relationship becomes r

    Abstract translation: 要解决的问题：提供适合用作光通信系统的光传输路径的光纤，并且可以提高OSNR。 解决方案：在具有芯部分和包层部分的光纤中，当有效截面用Aeff表示并且模场直径由MFD表示时，由k = 4Aeff /（πMFD 2 ）为1.08以上，波长色散为+19.0ps / nm / km以上，+ 21.9ps / nm / km以下，模场直径MFD为10.3μm， 在1550nm波长处为13.0μm以下。 当折射率成为芯部的最小值N 1 的径向位置由r 1 2 的径向位置由r 2 < SB>，并且芯部的半径由r 3 表示，关系变为r 1 2 3 ，R = r 3 / r 2 大于1.0和5.4或更小，并且最大值N 2之间的特定折射率差Δ 12 芯部的折射率的最小值N 1 为0.05％以上。 版权所有（C）2013，JPO＆INPIT

    Production of quartz glass
    39.
    发明专利
    Production of quartz glass 失效
    石墨玻璃生产

    公开(公告)号：JPS6126523A

    公开(公告)日：1986-02-05

    申请号：JP14485284

    申请日：1984-07-12

    Applicant: Seiko Epson Corp

    Inventor： TOKI MOTOYUKI ,  KANBE SADAO ,  MIYASHITA SATORU ,  TAKEUCHI TETSUHIKO

    IPC: C01B33/152 ,  C03B8/02 ,  C03B19/12 ,  C03B20/00 ,  C03C3/06

    CPC classification number: C03C3/06 ,  C03B19/12 ,  C03C2201/08 ,  C03C2201/24 ,  C03C2203/22 ,  C03C2203/26 ,  C03C2203/54

    Abstract: PURPOSE:To obtain quartz glass having improved heat resistance with few air bubbles, by charging a dry gel into a sintering furnace and a halide or ammonia compound together in the sol-gel method using a metal alkoxide as a raw material. CONSTITUTION:At least a metal alkoxide, e.g. silicon ethoxide, or ultrafine powdery silica as a raw material is used to synthesize quartz glass at a low temperature by the sol-gel method. A dry gel is charged into a sintering furnace in sintering the dry gel, and a halide, e.g. CCl4, or ammonia compound, e.g. (NH4)2SO4, is charged thereinto at the same time. Thus, the aimed transparent and homogeneous quartz glass usable in optical applications or applications requiring heat resistance is produced easily at a low cost.

    Abstract translation: 目的：使用金属醇盐作为原料，通过以溶胶 - 凝胶法将干凝胶加入烧结炉和卤化物或氨化合物中获得耐热性差，气泡少的石英玻璃。 构成：至少金属醇盐，例如， 硅氧烷或超细粉二氧化硅为原料，通过溶胶 - 凝胶法在低温下合成石英玻璃。 将干燥的凝胶装入烧结炉中以烧结干凝胶，并将卤化物 CCl4或氨化合物，例如 （NH 4）2 SO 4，同时加入。 因此，可以容易地以低成本制造可用于光学应用或需要耐热性的应用的目标透明和均匀的石英玻璃。

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