公开(公告)号：EP1580170A4

公开(公告)日：2011-12-28

申请号：EP03775963

申请日：2003-11-28

Applicant: SHINETSU QUARTZ PROD

Inventor： SATO TATSUHIRO ,  KAITOU TAKAHIRO ,  FUJINOKI AKIRA ,  KATO TOSHIYUKI ,  SEGAWA TOHRU; ,  YOSHIDA NOBUMASA

IPC: C03C3/06 ,  C03B8/04 ,  C03B19/14 ,  C03B20/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/20 ,  C03B2201/24 ,  C03C2201/02 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/26

Abstract: First of all, there is provided a production process of a synthetic quartz glass which has less impurity, has a high-temperature viscosity characteristic equal to or more than that of a natural quartz glass, and hardly deforms even in a high-temperature environment, and especially a production process of a highly heat resistant synthetic quartz glass which is free from the generation of bubbles and is dense. Secondly, there is provided a highly heat resistant synthetic quartz glass body which is easily obtained by the production process of the present invention, and especially a transparent or black quartz glass body which is free from the generation of bubbles, is dense, has high infrared absorption rate and emission rate, and has an extremely high effect for preventing diffusion of alkali metal. The process is a process of producing a highly heat resistant quartz glass body having an absorption coefficient at 245 nm of 0.05 cm−1 or more, and the silica porous body was subjected to a reduction treatment, followed by baking, thereby forming a dense glass body.

公开(公告)号：EP2118026A1

公开(公告)日：2009-11-18

申请号：EP08716965.2

申请日：2008-02-20

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： KUEHN, Bodo ,  OCHS, Stefan ,  WEBER, Juergen

IPC: C03B19/14

CPC classification number: C03B19/1453 ,  C03B2201/075 ,  C03B2201/10 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/24 ,  C03B2201/32 ,  C03B2201/34 ,  C03B2201/40 ,  C03C3/06 ,  C03C2201/10 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/32 ,  C03C2201/3411 ,  C03C2201/3441 ,  C03C2201/40 ,  G03F7/70958

Abstract: To provide an optical component of quartz glass for use in a projection objective for immersion lithography at an operating wavelength below 250 nm, which component is optimized for use with linearly polarized UV laser radiation and particularly with respect to compaction and birefringence induced by anisotropic density change, it is suggested according to the invention that the quartz glass should contain hydroxyl groups in the range of from 1 wtppm to 60 wtppm and chemically bound nitrogen, and that the mean hydrogen content of the quartz glass should be in the range of 5 x 1015 molecules/cm3 to 1 x 1017 molecules/cm3.

公开(公告)号：EP3280687A1

公开(公告)日：2018-02-14

申请号：EP16717757.5

申请日：2016-04-07

Applicant: Corning Incorporated

Inventor： BOOKBINDER, Dana Craig ,  LI, Ming-Jun ,  TANDON, Pushkar

IPC: C03C3/06 ,  C03C3/076 ,  C03C13/04 ,  C03B37/027

CPC classification number: G02B6/03694 ,  C03B37/018 ,  C03B37/027 ,  C03B2201/20 ,  C03B2201/24 ,  C03B2201/31 ,  C03B2203/222 ,  C03B2203/23 ,  C03B2203/24 ,  C03C3/06 ,  C03C3/076 ,  C03C13/045 ,  C03C13/046 ,  C03C25/1055 ,  C03C2201/11 ,  C03C2201/24 ,  C03C2201/31 ,  G02B6/02395 ,  G02B6/0281 ,  G02B6/03627 ,  G02B6/03644

Abstract: A single mode optical fiber having a core made from silica and less than or equal to about 11 weight % germania and having a maximum relative refractive index Δ1MAX. The optical fiber also has an inner cladding surrounding the core and having a minimum relative refractive index Δ2MIN, a first outer cladding surrounding the inner cladding and a second outer cladding surrounding the first outer cladding. The viscosity at 1650° C. of the second outer cladding minus the viscosity at 1650° C. of the first outer cladding is greater than 0.1e7 Poise, and Δ1MAX>Δ2MIN. The single mode optical fiber may also have an outer cladding surrounding the inner cladding made from silica or SiON. The first outer cladding has a maximum relative refractive index Δ3MAX, and Δ3MAX>Δ2MIN.

公开(公告)号：EP1894896A1

公开(公告)日：2008-03-05

申请号：EP07114836.5

申请日：2007-08-23

Applicant: Heraeus Quarzglas GmbH & Co. KG ,  SHIN-ETSU QUARTZ PRODUCTS CO., LTD.

Inventor： Sato, Tatsuhiro

IPC: C03B19/01 ,  C03B19/09 ,  C03C3/06 ,  C03C3/112 ,  C03C4/20 ,  C03C6/04 ,  C03C6/06

CPC classification number: C03C1/00 ,  C03B19/063 ,  C03B32/005 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/24 ,  C03B2201/36 ,  C03C3/06 ,  C03C3/112 ,  C03C4/20 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2201/3411 ,  C03C2201/3435 ,  C03C2201/36

Abstract: In order to provide quartz glass which has excellent plasma corrosion resistance and can be used for semiconductor production, it is suggested to use a mixed quartz powder which is suitable for the production of the quartz glass. Furthermore, a production process for quartz glass using the quartz powder is provided. The mixed quartz glass powder containing from 0.1 to 20 mass % in total of two or more of dope elements, in which the dope element contains one or more of first elements selected from the group consisting of N, C and F and one or more of second elements selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, lanthanoids, and actinoids.

Abstract translation: 为了提供一种具有优异的等离子体的耐腐蚀性和可用于半导体生产的石英玻璃，建议使用混合石英粉所有这些是适合于生产的石英玻璃制成。 进一步，提供了用于使用所述石英粉的石英玻璃的制造方法。 混合石英玻璃粉末在总的两个或更多个，其中所述浓液元件包含一个或多个选自N，C和F以及一个或更多个的选择的第一元素的掺杂元素的含有0.1〜20质量％ 选自镁，钙，锶，钡，钪，Y，钛，锆，铪，镧系和锕的选择的第二元素。

公开(公告)号：EP1580170A1

公开(公告)日：2005-09-28

申请号：EP03775963.6

申请日：2003-11-28

Applicant: SHIN-ETSU QUARTZ PRODUCTS CO., LTD.

Inventor： SATO, Tatsuhiro Shin-Etsu Quartz Products Co., Ltd ,  KAITOU, Takahiro ,  FUJINOKI, Akira Shin-Etsu Quartz Products Co.,Ltd. ,  KATO, Toshiyuki Shin-Etsu Quartz Products Co.,Ltd. ,  SEGAWA, Tohru; Shin-Etsu Quartz Products Co., Ltd. ,  YOSHIDA,Nobumasa Shin-Etsu Quartz Products Co.Ltd.

IPC: C03B20/00 ,  C03B8/04 ,  C03C3/06

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/20 ,  C03B2201/24 ,  C03C2201/02 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/26

Abstract: First of all, there is provided a production process of a synthetic quartz glass which has less impurity, has a high-temperature viscosity characteristic equal to or more than that of a natural quartz glass, and hardly deforms even in a high-temperature environment, and especially a production process of a highly heat resistant synthetic quartz glass which is free from the generation of bubbles and is dense. Secondly, there is provided a highly heat resistant synthetic quartz glass body which is easily obtained by the production process of the present invention, and especially a transparent or black quartz glass body which is free from the generation of bubbles, is dense, has high infrared absorption rate and emission rate, and has an extremely high effect for preventing diffusion of alkali metal. The process is a process of producing a highly heat resistant quartz glass body having an absorption coefficient at 245 nm of 0.05 cm -1 or more, and the silica porous body was subjected to a reduction treatment, followed by baking, thereby forming a dense glass body.

公开(公告)号：US20180057391A1

公开(公告)日：2018-03-01

申请号：US15797061

申请日：2017-10-30

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Bodo KÜHN

IPC: C03C3/06 ,  G02B1/00 ,  C03B32/02 ,  G02B1/02 ,  C03B32/00 ,  C03B19/14 ,  C03C4/04

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B32/00 ,  C03B32/02 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/24 ,  C03C4/04 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2203/54 ,  C03C2204/00 ,  G02B1/00 ,  G02B1/02 ,  Y02P40/57

Abstract: An optical component made of synthetic quartz glass includes a glass structure substantially free of oxygen defect sites and having a hydrogen content of 0.1×1016 to 1.0×1018 molecules/cm3, an SiH group content of less than 2×1017 molecules/cm3, a hydroxyl group content of 0.1 to 100 wt. ppm, and an Active temperature of less than 1070° C. The optical component undergoes a laser-induced change in the refractive index in response to irradiation by a radiation with a wavelength of 193 nm using 5×109 pulses with a pulse width of 125 ns and a respective energy density of 500 μJ/cm2 at a pulse repetition frequency of 2000 Hz. The change totals a first measured value M193 nm when measured using the applied wavelength of 193 nm and a second measured value M633 nm when measured using a measured wavelength of 633 nm. The ratio M193 nm/M633 nm is less than 1.7.

公开(公告)号：US20160002092A1

公开(公告)日：2016-01-07

申请号：US14769382

申请日：2014-02-19

Applicant: HERAEUS QUARZGLAS GMBH & CO. KG

Inventor： Bodo KUEHN

IPC: C03C3/06 ,  G02B1/00 ,  C03B32/02 ,  C03C4/04 ,  C03B19/14

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B32/00 ,  C03B32/02 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/24 ,  C03C4/04 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2203/54 ,  C03C2204/00 ,  G02B1/00 ,  G02B1/02 ,  Y02P40/57

Abstract: An optical component made of synthetic quartz glass includes a glass structure substantially free of oxygen defect sites and having a hydrogen content of 0.1×1016 to 1.0×1018 molecules/cm3, an SiH group content of less than 2×1017 molecules/cm3, a hydroxyl group content of 0.1 to 100 wt. ppm, and an Active temperature of less than 1070° C. The optical component undergoes a laser-induced change in the refractive index in response to irradiation by a radiation with a wavelength of 193 nm using 5×109 pulses with a pulse width of 125 ns and a respective energy density of 500 μJ/cm2 at a pulse repetition frequency of 2000 Hz. The change totals a first measured value M193nm when measured using the applied wavelength of 193 nm and a second measured value M633nm when measured using a measured wavelength of 633 nm. The ratio M193nm/M633nm is less than 1.7.

Abstract translation: 由合成石英玻璃制成的光学部件包括基本上不含氧缺陷部位的玻璃结构，氢含量为0.1×1016〜1.0×1018分子/ cm3，SiH基含量小于2×1017分子/ cm3， 羟基含量为0.1〜100wt。 ppm，并且有效温度低于1070℃。光学组件响应于波长为193nm的辐射的照射，使用脉冲宽度为125的5×109脉冲对激光引起的折射率变化 ns，相应的能量密度为500μJ/ cm2，脉冲重复频率为2000Hz。 当使用193nm的施加波长测量时，该变化达到第一测量值M193nm，并且当使用633nm的测量波长测量时，该变化达到第二测量值M633nm。 M193nm / M633nm的比例小于1.7。

公开(公告)号：US20100091360A1

公开(公告)日：2010-04-15

申请号：US12449790

申请日：2008-02-20

Applicant: Bodo Kuehn ,  Stefan Ochs ,  Juergen Weber

Inventor： Bodo Kuehn ,  Stefan Ochs ,  Juergen Weber

IPC: G02B13/14 ,  C03C17/00 ,  G02B1/02

CPC classification number: C03B19/1453 ,  C03B2201/075 ,  C03B2201/10 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/24 ,  C03B2201/32 ,  C03B2201/34 ,  C03B2201/40 ,  C03C3/06 ,  C03C2201/10 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/32 ,  C03C2201/3411 ,  C03C2201/3441 ,  C03C2201/40 ,  G03F7/70958

Abstract: To provide an optical component of quartz glass for use in a projection objective for immersion lithography at an operating wavelength below 250 nm, which component is optimized for use with linearly polarized UV laser radiation and particularly with respect to compaction and birefringence induced by anisotropic density change, it is suggested according to the invention that the quartz glass should contain hydroxyl groups in the range of from 1 wtppm to 60 wtppm and chemically bound nitrogen, and that the mean hydrogen content of the quartz glass should be in the range of 5×1015 molecules/cm to 1×1017 molecules/cm3.

Abstract translation: 为了提供石英玻璃的光学部件，用于在250nm以下的工作波长下用于浸没式光刻的投影物镜，该成分被优化用于线偏振UV激光辐射，特别是关于由各向异性密度变化引起的压实和双折射 根据本发明，建议石英玻璃应含有1〜60重量ppm的羟基和化学键合的氮，石英玻璃的平均氢含量应在5×1015的范围内 分子/ cm至1×1017分子/ cm 3。

公开(公告)号：US20080039310A1

公开(公告)日：2008-02-14

申请号：US11865289

申请日：2007-10-01

Applicant: Hideaki HAYASHI ,  Akio Koike ,  Mitsuhiro Kawata ,  Naoki Sugimoto ,  Shinya Kikugawa ,  Kenji Yamada

Inventor： Hideaki HAYASHI ,  Akio Koike ,  Mitsuhiro Kawata ,  Naoki Sugimoto ,  Shinya Kikugawa ,  Kenji Yamada

IPC: C03B19/00

CPC classification number: C03C3/06 ,  C03B19/1415 ,  C03B19/1438 ,  C03B2201/32 ,  C03B2201/34 ,  C03B2201/40 ,  C03B2207/32 ,  C03B2207/34 ,  C03C23/0095 ,  C03C2201/24 ,  C03C2201/32 ,  C03C2201/3405 ,  C03C2201/3411 ,  C03C2201/3417 ,  C03C2201/40 ,  C03C2203/44 ,  C03C2203/54

Abstract: To provide quartz-type glass for a microlithographic projection exposure apparatus, which contains at least 51 mass % of SiO2 and which further contains at least one member selected from the group consisting of lanthanum, aluminum, hafnium, nitrogen, scandium, yttrium and zirconium. It is a material which is useful for an illumination system for a microlithographic projection exposure apparatus or as a projection object lens and has a refractive index at 248 nm larger than 1.508 of quartz glass and a refractive index at 193 nm larger than 1.560 of quartz glass and which can be small-sized.

Abstract translation: 为了提供含有至少51质量％的SiO 2的微光刻投影曝光装置的石英型玻璃，还含有选自镧，铝，铪等的至少一种， 氮，钪，钇和锆。 它是一种用于微光刻投影曝光装置的照明系统或投影物镜并且具有大于1.508的石英玻璃的248nm的折射率和大于石英玻璃的1.560的193nm的折射率的材料 并且可以是小尺寸的。

公开(公告)号：US20060059948A1

公开(公告)日：2006-03-23

申请号：US10535935

申请日：2003-11-28

Applicant: Tatsuhiro Sato ,  Takahiro Kaitou ,  Akira Fujinoki ,  Toshiyuki Kato ,  Tohru Segawa ,  Nobumasa Yoshida

Inventor： Tatsuhiro Sato ,  Takahiro Kaitou ,  Akira Fujinoki ,  Toshiyuki Kato ,  Tohru Segawa ,  Nobumasa Yoshida

IPC: C03C25/64

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/20 ,  C03B2201/24 ,  C03C2201/02 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/26

Abstract: First of all, there is provided a production process of a synthetic quartz glass which has less impurity, has a high-temperature viscosity characteristic equal to or more than that of a natural quartz glass, and hardly deforms even in a high-temperature environment, and especially a production process of a highly heat resistant synthetic quartz glass which is free from the generation of bubbles and is dense. Secondly, there is provided a highly heat resistant synthetic quartz glass body which is easily obtained by the production process of the present invention, and especially a transparent or black quartz glass body which is free from the generation of bubbles, is dense, has high infrared absorption rate and emission rate, and has an extremely high effect for preventing diffusion of alkali metal. The process is a process of producing a highly heat resistant quartz glass body having an absorption coefficient at 245 nm of 0.05 cm−1 or more, and the silica porous body was subjected to a reduction treatment, followed by baking, thereby forming a dense glass body.

Abstract translation: 首先，提供了杂质少，具有等于或高于天然石英玻璃的高温粘度特性的合成石英玻璃的制造方法，即使在高温环境下也几乎不变形， 特别是高度耐热的合成石英玻璃的生产过程，其不产生气泡并且致密。 其次，提供了通过本发明的制造方法容易获得的高耐热性合成石英玻璃体，特别是不产生气泡的透明或黑色石英玻璃体，具有高红外 吸收率和排放率，对防止碱金属的扩散具有极高的效果。 该方法是生产具有245nm的吸收系数为0.05cm -1以上的高耐热性石英玻璃体的工序，对二氧化硅多孔体进行还原处理，其次是 烘烤，从而形成致密的玻璃体。