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公开(公告)号：KR1020100062935A
公开(公告)日：2010-06-10
申请号：KR1020090116798
申请日：2009-11-30
Applicant: (주)트리플코어스코리아
CPC classification number: H01J37/32229 , H01J37/32935 , H05H1/46 , H05H2001/4622
Abstract: PURPOSE: An atmosphere plasma generating apparatus and an atmospheric plasma generating method using the same are provided to improve a strengthening effect of a microwave reflected to a curved surface by forming a form of a waveguide end part into the curved surface. CONSTITUTION: An atmosphere plasma generating apparatus includes a waveguide(300) applied a microwave and a dielectric tube passing through the waveguide. The dielectric tube generates the plasma through a torch gas flowing therein. An end part of the waveguide is formed into a curved surface. The end part of the waveguide is movably formed. The end part of the waveguide has a dual wall structure of an outer wall and an inner wall. A means capable of transferring the inner wall is formed on the outer wall.
Abstract translation: 目的：提供一种气氛等离子体发生装置和使用其的大气等离子体产生方法，以通过将波导端部的形式形成为弯曲表面来提高反射到弯曲表面的微波的强化效果。 构成：气氛等离子体发生装置包括施加微波的波导管（300）和通过波导管的介电管。 电介质管通过其中流动的焊炬气产生等离子体。 波导的端部形成为曲面。 波导的端部可移动地形成。 波导的端部具有外壁和内壁的双壁结构。 在外壁上形成能够转移内壁的装置。
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公开(公告)号：KR1020100062715A
公开(公告)日：2010-06-10
申请号：KR1020080121474
申请日：2008-12-02
Applicant: (주)트리플코어스코리아
CPC classification number: H05H1/46 , G01R29/08 , H01J37/32229 , H05H1/0006 , H05H2001/4622
Abstract: PURPOSE: An atmospheric plasma generator and an atmospheric plasma generating method using the same are provided to reduce the costs of manufacturing an atmospheric plasma device by preventing the use of a pricey and complex device such as a 3-stub. CONSTITUTION: An atmospheric plasma generator comprises a waveguide(200) which receives a microwave, and a dielectric tube(210) which generates plasma through the waveguide. The length of the waveguide is adjustable. An end part(200a) of the waveguide is formed into a dual-wall structure with an inner wall and an exterior wall. A unit for transferring the inner wall is installed on the outer wall. An uneven side with a plurality of concave units is formed on the inner wall of the waveguide. The end part of the waveguide is transferred on the concave units of the uneven unit.
Abstract translation: 目的：提供一种使用其的大气等离子体发生器和大气等离子体产生方法，以通过防止使用诸如3管脚的昂贵且复杂的装置来降低制造大气等离子体装置的成本。 构成：大气等离子体发生器包括接收微波的波导管（200）和通过波导产生等离子体的电介质管（210）。 波导的长度可调。 波导的端部（200a）形成为具有内壁和外壁的双壁结构。 用于传送内壁的单元安装在外壁上。 在波导管的内壁上形成有多个凹部的不平坦侧。 波导的端部被传送到不均匀单元的凹形单元上。
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公开(公告)号：KR1020100059578A
公开(公告)日：2010-06-04
申请号：KR1020080118402
申请日：2008-11-26
Applicant: (주)트리플코어스코리아
CPC classification number: H05H1/46 , H05H2001/4622 , H05H2240/10
Abstract: PURPOSE: An atmospheric pressure plasma igniter and an atmospheric pressure plasma igniting method using the same are provided to prevent physical damages to the igniter resulting from plasma heat by transferring a firing rod to the inside and the outside of a dielectric tube. CONSTITUTION: An atmospheric pressure plasma igniter for turning reaction gas into plasma comprises a firing rod(310). The firing rod passes through a dielectric tube. The firing rod emits a thermo-electron according to a microwave which is applied in the dielectric tube. The igniter includes a means(300) for transferring the firing rod to the inside and the outside of the dielectric tube. The firing rod comprises metal.
Abstract translation: 目的：提供大气压等离子体点火器和使用其的大气压等离子体点火方法，以通过将击发棒传送到电介质管的内部和外部来防止由等离子体热引起的点火器的物理损伤。 构成：将反应气体转化为等离子体的大气压等离子体点火器包括击发杆（310）。 发射杆穿过介质管。 发射棒根据施加在电介质管中的微波发射热电子。 点火器包括用于将发射杆传送到电介质管的内部和外部的装置（300）。 射击杆包括金属。
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公开(公告)号：KR1020100023363A
公开(公告)日：2010-03-04
申请号：KR1020080082078
申请日：2008-08-21
Applicant: (주)트리플코어스코리아
IPC: H01L21/302
CPC classification number: B08B7/0035
Abstract: PURPOSE: A semiconductor device cleaning method and a device thereof are provided to extend the life of equipment by effectively removing an organic material or an inorganic material condensed in superannuated semiconductor device parts. CONSTITUTION: A surface processing liquid flows into a first inlet line(520) for processing the surface of semiconductor device parts. A reaction chamber(500) is connected to the inlet line. A second inlet line(530) flows plasma cleaning gas to the reaction chamber. A plasma generating device lets gas for the plasma cleaning be the plasma. The semiconductor device parts are plasma-cleaned in the reaction chamber. The surface processing liquid is an acid solution.
Abstract translation: 目的：提供半导体器件清洗方法及其装置，通过有效地除去在超级半导体器件部件中冷凝的有机材料或无机材料来延长设备的使用寿命。 构成：表面处理液体流入用于处理半导体器件部件表面的第一入口管线（520）。 反应室（500）连接到入口管线。 第二入口管线（530）将等离子体清洗气体流入反应室。 等离子体产生装置使用于等离子体清洗的气体是等离子体。 半导体器件部件在反应室中被等离子体清洁。 表面处理液是酸溶液。
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公开(公告)号：KR101909429B1
公开(公告)日：2018-10-18
申请号：KR1020120012022
申请日：2012-02-06
Applicant: (주)트리플코어스코리아
IPC: H01L21/67 , H01L21/205
Abstract: 반도체공정시스템용가스파우더처리장치및 방법이제공된다. 본발명의일 실시예에따른반도체공정시스템용가스파우더처리장치는공정가스가유입되어반응하는공정챔버(110) 및상기공정챔버(110)에진공을인가하기위한펌프(120)를구비한반도체공정시스템용가스파우더처리장치로, 상기장치는상기공정챔버로부터배출되는배기가스가유입되는반응챔버(111); 상기반응챔버(111) 내에구비되어, 상기반응챔버(111) 내온도를상승시키는히팅블록((113); 상기반응챔버(111) 내에서상기배기가스반응에따라형성된파우더가포집되는쿨링블록(117); 및상기포집된파우더를가스화시키기위한플로린계라디칼을상기반응챔버(111) 내로공급하기위한플라즈마공급원(115)을포함한다.
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Patent Agency Ranking
公开(公告)号：KR20180066572A
公开(公告)日：2018-06-19
申请号：KR20160167567
申请日：2016-12-09
Applicant: (주)트리플코어스코리아
Inventor： KIM IK NYUN , AN JAE YUN , EUM MIN HEUM
IPC: H01L21/02 , H01L21/3065 , H01L21/67
CPC classification number: H01L21/02046 , H01L21/0234 , H01L21/3065 , H01L21/67046 , H01L21/67242
Abstract: 본발명은파우더흡착방지장치가구비된배기모듈에관한것으로서, 공정챔버(10)와플라즈마스크러버(200) 사이에연결되어상기공정챔버로부터발생된폐 가스를상기플라즈마스크러버로전달하는배기모듈에있어서, 상기배기모듈(100)은, 진공펌프(20)와상기플라즈마스크러버(200) 사이를연결하는배기관(102); 상기배기관(102)의내부에순차적으로설치되며, 퍼지가스를배출하는다수의퍼지가스공급관(110); 및상기퍼지가스공급관을통한퍼지가스의배출순서를컨트롤하는제어부(120);를포함하며, 상기퍼지가스공급관을통해배출되는퍼지가스에의해상기배기모듈내부의압력이증가하여파우더의퇴적및 흡착이방지되는효과가있다.
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公开(公告)号：KR1020170011462A
公开(公告)日：2017-02-02
申请号：KR1020150104120
申请日：2015-07-23
Applicant: (주)트리플코어스코리아
Abstract: 공정챔버로부터발생한배기가스를처리하기위하여상기공정챔버의배기라인과연결되어플라즈마반응이발생하는반응기및 상기반응기로처리가스를공급하기위한처리가스유입라인을플라즈마가스스크러버운전방법으로, 상기공정챔버의운전시작전 0.5 내지 1.5초전 플라즈마를생성시키는단계; 및상기공정챔버의운전시작과동시또는이후상기플라즈마가스스크러버의반응기로처리가스를유입시키는단계를포함하는것을특징으로하는플라즈마가스스크러버운전방법이제공된다.
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公开(公告)号：KR101645813B1
公开(公告)日：2016-08-05
申请号：KR1020140138523
申请日：2014-10-14
Applicant: (주)트리플코어스코리아
Abstract: 본발명은플라즈마처리장치에관한것으로서, 더욱상세하게는플라즈마챔버에구비되는오링의손상을최소화하는플라즈마처리장치에관한것이다. 본발명에의하면, 내부에플라즈마가형성되는공간을제공하고제1 단부에형성된제1 개방부를구비하는챔버부재; 상기챔버부재의외주면으로부터바깥으로연장되고상기제1 단부쪽을향하는제1 접촉면; 상기제1 개방부를폐쇄하도록상기챔버부재에결합되고, 상기제1 개방부를막는제1 덮개판부와, 상기제1 덮개판부로부터돌출되어서상기챔버부재의외주면을외부에서감싸고그 내면에끝단으로갈수록상기챔버부재의외주면으로부터더 멀어지도록경사진부분이형성된제1 측벽부를구비하는제1 커버부재; 상기챔버부재의외주면, 상기제1 접촉면및 상기제1 측벽부의내면에서경사진부분과밀착하는제1 오링부재; 및상기제1 측벽부의내면, 상기챔버부재의외주면및 상기제1 오링부재의외주면이연결되어서형성된공간을채우는제1 충전부재를포함하는플라즈마처리장치가제공된다.
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公开(公告)号：KR1020160043821A
公开(公告)日：2016-04-22
申请号：KR1020140138524
申请日：2014-10-14
Applicant: (주)트리플코어스코리아
CPC classification number: H01J23/20 , H01J25/50 , H01J2223/18 , H01J2225/50
Abstract: 본발명은효율저하, 과열등의문제없이용량을임의조정할수 있도록하는가변용량마그네트론에관한것으로, 상기가변용량마그네트론은양극바디; 상기양극바디의내부에위치되어, 상기양극바디와함께양극부를구성하는복수개의배인; 상기양극바디의축상에위치하여상기배인의선단면과일정한작용공간을형성하며열전자를방출하는필라멘트; 상기양극바디의내부에위치되어, 상기작용공간에자속을형성시키는상부영구자석과하부영구자석; 및상기양극바디의외부에위치되어, 상기작용공간에형성되는자속을증가시키기위한보조자석을포함할수 있다.
Abstract translation: 本发明涉及一种可变容量的磁控管，其容量可根据需要无问题地控制，例如效率降低，过热等。 可变容量磁控管可以包括：正极截面; 多个叶片，位于正极本体的内侧，与正极本体一起构成正极单元; 位于正极体的轴线上的长丝相对于叶片的前表面形成预定的动作空间，并且发射热量; 位于所述阳极体内的上永磁体和下永磁体，并在所述活动空间内产生磁通量; 以及辅助磁体，其位于阳极体的外部并增加在激活空间中形成的磁通量。
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公开(公告)号：KR101609474B1
公开(公告)日：2016-04-05
申请号：KR1020140138522
申请日：2014-10-14
Applicant: (주)트리플코어스코리아
IPC: H01L21/205 , H01L21/02
CPC classification number: H01L21/3065 , H01J37/3244 , H01L21/02046 , H01L21/67034
Abstract: 화학기상증착장치가스처리시스템으로, 화학기상증착장치의공정챔버(110); 상기공정챔버(110) 후단에연결된플라즈마진공스크러버(120); 상기플라즈마진공스크러버(120)의후단에연결된펌프(130); 및상기펌프(130) 후단에연결된습식스크러버(140)를포함하며, 상기플라즈마진공스크러버(120)는상기공정챔버(110)로부터유입되는배기가스가세정가스인경우에만상기배기가스를플라즈마처리하는것을특징으로하는화학기상증착장치가스처리시스템이제공된다.
Abstract translation: 本发明公开了一种处理来自化学气相沉积设备的气体的系统，包括：化学气相沉积设备的处理室（110）; 连接到处理室（110）的后端的等离子体真空洗涤器（120）; 连接到真空等离子体洗涤器（120）的后端的泵（130）; 以及连接到所述泵（130）的后端的湿式洗涤器（140）。 当从处理室（110）引入的排气是清洁气体时，等离子体真空洗涤器（120）对废气进行等离子体处理。 根据本发明，可以根据化学气相沉积设备的室的环境使湿式洗涤器的效率最大化。
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