公开(公告)号：KR1020090013069A

公开(公告)日：2009-02-04

申请号：KR1020080073872

申请日：2008-07-29

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 야마모또다로오 ,  다께구찌히로후미 ,  오오꼬우찌아쯔시 ,  요시하라고오스께

IPC: H01L21/027

CPC classification number: H01L21/6715 ,  G03F7/3021

Abstract: A developing method, a developing device, and a storage medium are provided to suppress the instability of the developer supply to the substrate by using a classified developer nozzle. A resist is coated on a substrate. The substrate is horizontally maintained in the substrate holding support unit after the exposure. The developer is supplied from a first developer nozzle(41) while rotating the substrate around a plumb axis through the substrate holding support unit with a band shape. The developer is supplied to one of a central part and a peripheral part on the surface of the substrate by facing one end of the band region to the center of the substrate. A liquid layer of the developer is formed by moving the supply position of the developer from one of a central part and a peripheral part on the surface of the substrate to the other side.

Abstract translation: 提供显影方法，显影装置和存储介质，以通过使用分级的显影剂喷嘴来抑制显影剂供应到基板的不稳定性。 抗蚀剂涂覆在基材上。 在曝光之后，将基板水平地保持在基板保持支撑单元中。 显影剂从第一显影剂喷嘴（41）供应，同时使基板围绕铅垂轴旋转穿过具有带状的基板保持支撑单元。 通过将带区域的一端面对基板的中心，将显影剂供给到基板表面上的中心部分和周边部分之一。 通过将显影剂的供给位置从基板的表面上的中心部分和周边部分中的一个移动到另一侧来形成显影剂的液体层。

公开(公告)号：KR1020070056993A

公开(公告)日：2007-06-04

申请号：KR1020060118280

申请日：2006-11-28

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 요시하라고오스께 ,  나까무라쥰지 ,  다께구찌히로후미 ,  야마모또다로오

IPC: H01L21/027

CPC classification number: H01L21/67051 ,  H01L21/67253 ,  B08B3/02 ,  G03F7/40 ,  H01L21/02057

Abstract: A rinse processing method, a developing processing apparatus, and a recording medium for recording a control program read by computer are provided to reduce defects in a developing process by determining rapidly optimum rinsing conditions. A rinse processing method is used for developing an exposure pattern and rinsing a substrate. The rinse processing method includes a process for setting rinse processing conditions according to a surface state of the substrate, a process for measuring the surface state of the substrate, a process for selecting the corresponding rinse processing conditions according to the surface state of the measured substrate, and a process for performing a rinsing process under the rinse processing conditions.

Abstract translation: 提供一种用于记录由计算机读取的控制程序的冲洗处理方法，显影处理装置和记录介质，以通过确定快速最佳漂洗条件来减少显影过程中的缺陷。 冲洗处理方法用于显影曝光图案和漂洗基板。 冲洗处理方法包括根据基板的表面状态设定漂洗处理条件的处理，基板的表面状态的测定处理，根据测定的基板的表面状态选择相应的冲洗处理条件的处理 以及在漂洗处理条件下进行漂洗处理的工序。