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公开(公告)号：KR100725113B1
公开(公告)日：2007-06-04
申请号：KR1020050119254
申请日：2005-12-08
Applicant: 삼성전자주식회사
Abstract: A method of manufacturing a particle adsorbed sample wafer is provided to obtain a substrate with uniformly adsorbed particles by preventing the deposition or agglomeration of particle powder in a particle solution using an ultrasonic treatment. A particle solution(14) is formed by adding particle powder(10) into a predetermined solvent(12), wherein the predetermined solvent contains isopropyl alcohol of 0.5 to 10 volume%, hydrogen peroxide of 0.5 to 10 volume% and water. An ultrasonic treatment is performed on the particle solution. A wafer(18) is dipped into the particle solution in order to adsorb particles. Then, a drying process is performed on the wafer. The ultrasonic treatment is performed for 1 to 30 minutes.
Abstract translation: 提供一种制造颗粒吸附样品晶片的方法，以通过使用超声波处理防止颗粒粉末在颗粒溶液中的沉积或附聚来获得具有均匀吸附颗粒的基材。 通过将颗粒粉末（10）加入到预定溶剂（12）中形成颗粒溶液（14），其中预定溶剂包含0.5-10体积％的异丙醇，0.5-10体积％的过氧化氢和水。 对颗粒溶液进行超声波处理。 晶片（18）浸入颗粒溶液中以吸附颗粒。 然后，在晶片上进行干燥处理。 超声波处理进行1至30分钟。
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公开(公告)号：KR100512183B1
公开(公告)日：2005-09-02
申请号：KR1020040083684
申请日：2004-10-19
Applicant: 삼성전자주식회사
IPC: H01L21/304
Abstract: 반도체기판의 세정/건조 공정에 사용되는 웨이퍼 가이드를 제공한다. 이 웨이퍼 가이드는 수평면과 평행한 지지판넬 및 상기 지지판넬의 일면에 부착된 적어도 3개의 평행한 수직판넬들을 구비한다. 상기 수직 판넬들의 각각은 수직한 바디판넬 및 상기 바디 판넬의 상부면으로부터 상부로 연장된 복수개의 돌출부들을 갖는다. 상기 돌출부들 사이의 갭 영역들은 웨이퍼들을 홀딩하는 슬롯들의 역할을 한다. 상기 슬롯들의 측벽들은 평면적으로 보여질 때 볼록한 형태의 프로파일(convex shaped profile)을 갖고, 상기 슬롯들의 바닥면들 역시 상기 수직판넬들을 가로지르는 단면으로부터 보여질 때 볼록한 형태의 프로파일을 갖는다. 이에 따라, 상기 웨이퍼들 및 상기 웨이퍼 가이드 사이의 접촉면적을 최소화시키어 상기 웨이퍼들의 건조효율을 향상시킬 수 있다.
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公开(公告)号：KR100487541B1
公开(公告)日：2005-05-03
申请号：KR1020020053755
申请日：2002-09-06
Applicant: 삼성전자주식회사
IPC: H01L21/304
CPC classification number: H01L21/67326 , B65D25/103 , H01L21/67057 , Y10S134/902
Abstract: 반도체기판의 세정/건조 공정에 사용되는 웨이퍼 가이드를 제공한다. 이 웨이퍼 가이드는 수평면과 평행한 지지판넬 및 상기 지지판넬의 일면에 부착된 적어도 3개의 평행한 수직판넬들을 구비한다. 상기 수직 판넬들의 각각은 수직한 바디판넬 및 상기 바디 판넬의 상부면으로부터 상부로 연장된 복수개의 돌출부들을 갖는다. 상기 돌출부들 사이의 갭 영역들은 웨이퍼들을 홀딩하는 슬롯들의 역할을 한다. 상기 슬롯들의 측벽들은 평면적으로 보여질 때 볼록한 형태의 프로파일(convex shaped profile)을 갖고, 상기 슬롯들의 바닥면들 역시 상기 수직판넬들을 가로지르는 단면으로부터 보여질 때 볼록한 형태의 프로파일을 갖는다. 이에 따라, 상기 웨이퍼들 및 상기 웨이퍼 가이드 사이의 접촉면적을 최소화시키어 상기 웨이퍼들의 건조효율을 향상시킬 수 있다.
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公开(公告)号：KR1020050015222A
公开(公告)日：2005-02-21
申请号：KR1020030053953
申请日：2003-08-05
Applicant: 삼성전자주식회사
Inventor： 고용균
IPC: G03F7/32
Abstract: PURPOSE: Provided is a method for washing baffles in ashing equipment which eliminates contamination or discoloration of the baffles caused in common washing so that it removes photoresist with keeping high ashing rate, when eliminating the photoresist after etching process. CONSTITUTION: The method for washing the baffles in the ashing equipment comprises the steps of: (i) washing the baffles in desalted water; (ii) treating the washed baffles by heat; (iii) judging whether the treated baffles are contaminated or decolorized; and (iv) complete recovery washing process when the baffles are contaminated or decolorized.
Abstract translation: 目的：提供一种在灰化设备中清洗挡板的方法，消除了普通洗涤时导致的挡板的污染或变色，以便在蚀刻过程中消除光刻胶时，以保持高灰度率去除光致抗蚀剂。 构成：在灰化设备中洗涤挡板的方法包括以下步骤：（i）在脱盐水中洗涤挡板; （ii）通过加热处理洗涤的挡板; （iii）判断经处理的挡板是否被污染或脱色; 和（iv）当挡板被污染或脱色时，完全回收洗涤过程。
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公开(公告)号：KR100471190B1
公开(公告)日：2005-02-21
申请号：KR1020040083686
申请日：2004-10-19
Applicant: 삼성전자주식회사
IPC: H01L21/304
Abstract: 반도체기판의 세정/건조 공정에 사용되는 웨이퍼 가이드를 제공한다. 이 웨이퍼 가이드는 수평면과 평행한 지지판넬 및 상기 지지판넬의 일면에 부착된 적어도 3개의 평행한 수직판넬들을 구비한다. 상기 수직 판넬들의 각각은 수직한 바디판넬 및 상기 바디 판넬의 상부면으로부터 상부로 연장된 복수개의 돌출부들을 갖는다. 상기 돌출부들 사이의 갭 영역들은 웨이퍼들을 홀딩하는 슬롯들의 역할을 한다. 상기 돌출부들은 소수성 물질(hydrophobic material)로 이루어지고, 상기 수직한 바디 판넬은 친수성 물질(hydrophilic material)로 이루어진다.
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Patent Agency Ranking
公开(公告)号：KR1020040093652A
公开(公告)日：2004-11-06
申请号：KR1020040083684
申请日：2004-10-19
Applicant: 삼성전자주식회사
IPC: H01L21/304
CPC classification number: H01L21/68785
Abstract: PURPOSE: A wafer guide used for cleaning/drying processes of a semiconductor substrate is provided to minimize contact surface between wafers by forming roundly a sidewall and a bottom of a guide slot. CONSTITUTION: A wafer guide includes a support panel and at least two vertical panels attached to one side of the support panel. Each vertical panel has a body part and a plurality of protrusions(5a,5b,5c) for defining a plurality of slots. Both sidewalls(5s) and a bottom of each slot have convex shaped profiles. A central panel is located between the two vertical panels.
Abstract translation: 目的：提供用于半导体衬底的清洁/干燥工艺的晶片引导件，以通过圆形地形成引导槽的侧壁和底部来最小化晶片之间的接触表面。 构成：晶片引导件包括支撑面板和至少两个连接到支撑面板一侧的垂直面板。 每个垂直面板具有用于限定多个槽的主体部分和多个突起（5a，5b，5c）。 两个侧壁（5s）和每个槽的底部具有凸形轮廓。 中央面板位于两个垂直面板之间。
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公开(公告)号：KR1020040091607A
公开(公告)日：2004-10-28
申请号：KR1020040083688
申请日：2004-10-19
Applicant: 삼성전자주식회사
IPC: H01L21/304
CPC classification number: H01L21/02057 , H01L21/02052
Abstract: PURPOSE: Wafer guides used in a process for cleaning and drying a semiconductor substrate are provided to improve drying efficiency of wafers by minimizing a contact area between a wafer guide and the wafers and by uniformly controlling the intervals between the wafers while using an auxiliary wafer guide broader than a main wafer guide or a wafer aligning unit. CONSTITUTION: The main wafer guide(10) holds semiconductor wafers(63). The auxiliary wafer guide(61) has a width greater than that of the main wafer guide. The auxiliary wafer guide includes an auxiliary supporter and a pair of parallel wafer supporters. The auxiliary supporter has a width greater than that of the main wafer guide. The pair of parallel wafer supporters additionally hold the semiconductor wafers, positioned on both edges of the auxiliary supporter, respectively.
Abstract translation: 目的：提供用于清洁和干燥半导体衬底的工艺中的晶片引导件，以通过使晶片引导件和晶片之间的接触面积最小化并且通过在使用辅助晶片引导件的同时均匀地控制晶片之间的间隔来提高晶片的干燥效率 比主晶片引导件或晶片对准单元宽。 构成：主晶片引导件（10）保持半导体晶片（63）。 辅助晶片引导件（61）的宽度大于主晶片引导件的宽度。 辅助晶片引导件包括辅助支撑件和一对平行晶片支撑件。 辅助支架的宽度大于主晶片导轨的宽度。 该对平行晶片支架分别保持位于辅助支架的两个边缘上的半导体晶片。
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公开(公告)号：KR1020040071853A
公开(公告)日：2004-08-16
申请号：KR1020030007760
申请日：2003-02-07
Applicant: 삼성전자주식회사
IPC: G01N1/31
Abstract: PURPOSE: An apparatus for sampling chemical is provided to sample chemical while preventing chemical from being contaminated with ensuring safety of workers. CONSTITUTION: A chemical sampling apparatus includes a sampling line(102) connected to one side of a chemical bath(12) in order to allow a predetermined amount of chemical provided in the chemical bath(12) to flow. A first control valve is installed at the sampling line(102) for controlling chemical flowing through the sampling line(102). A collecting unit(150) collects chemical flowing through the sampling line(102). The collecting unit(150) includes a reagent bottle(150a) for receiving sampled chemical therein and a sealed sampling booth(150b) for receiving the reagent bottle(150a) therein. The sampling line(102) includes a pump for pumping chemical provided in the chemical booth into the sampling line(102).
Abstract translation: 目的：提供化学品取样装置，以防止化学品受到污染，确保工人的安全。 构成：化学取样装置包括连接到化学浴（12）的一侧的采样管（102），以便允许化学浴（12）中提供的预定量的化学品流动。 第一控制阀安装在采样管线（102）处，用于控制通过采样管线（102）的化学品流动。 收集单元（150）收集通过采样管线（102）的化学物流。 收集单元（150）包括用于接收取样的化学物质的试剂瓶（150a）和用于接收其中的试剂瓶（150a）的密封取样室（150b）。 采样管线（102）包括用于将设置在化学室中的化学品泵送到采样管线（102）中的泵。
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公开(公告)号：KR1020030062544A
公开(公告)日：2003-07-28
申请号：KR1020020002791
申请日：2002-01-17
Applicant: 삼성전자주식회사
Inventor： 고용균
IPC: H01L21/304
Abstract: PURPOSE: A method for cleaning a chemical filter is provided to reduce process defects caused by contaminant of a metal component existing in the filter by making mixed chemical pass through the filter wherein nitric acid, hydrogen peroxide and deionized water are mixed in a predetermined ratio. CONSTITUTION: Isopropyl alcohol flows to the inside of a circulation line in which the filter is installed to perform a cleaning process. The isopropyl alcohol having passed through the filter is drained to the outside of the circulation line. The drain of the isopropyl alcohol stops. The isopropyl alcohol is continuously circulated inside the circulation line so that the isopropyl alcohol continuously passes through the filter. The circulated isopropyl alcohol is drained and deionized water flows to the inside of the circulation line. The supply of the deionized water stops. The mixed chemical in which nitric acid and deionized water are mixed is filled in the circulation line. The filled mixed chemical is circulated inside the circulation line. The mixed chemical inside the circulation line is drained and the deionized water flows to the circulation line. The deionized water continuously flows until the mixed chemical component remaining inside the flowed deionized water becomes not greater than a predetermined reference value.
Abstract translation: 目的：提供一种清洁化学过滤器的方法，以通过使混合的化学品通过过滤器，以将硝酸，过氧化氢和去离子水以预定的比例混合，来减少由过滤器中存在的金属组分的污染物引起的工艺缺陷。 构成：异丙醇流入安装过滤器的循环管线的内部进行清洁过程。 通过过滤器的异丙醇被排出到循环管线的外部。 异丙醇的排水停止。 异丙醇在循环管线内连续循环，使异丙醇连续通过过滤器。 循环的异丙醇被排出，去离子水流入循环管线的内部。 去离子水的供应停止。 将混合有硝酸和去离子水的混合化学品填充在循环管线中。 填充的混合化学品在循环管线内循环。 排出循环管线内的混合化学物质，去离子水流入循环管线。 去离子水连续流动，直到残留在流动的去离子水中的混合化学成分变得不大于预定的参考值。
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公开(公告)号：KR1020010066373A
公开(公告)日：2001-07-11
申请号：KR1019990068082
申请日：1999-12-31
Applicant: 삼성전자주식회사
Inventor： 고용균
IPC: H01L21/68
Abstract: PURPOSE: A wafer cassette is to improve a manufacturing uniformity by housing all the wafers and performing a manufacturing process and prevent a danger of workers due to a chemical exposure. CONSTITUTION: The wafer cassette comprises a left-side cassette body(10) and a right-side cassette body(20). Slide grooves(12,22) for sliding a wafer are formed on the left-side cassette body and the right-side cassette body. Protrusions(14,24) for fixing and supporting the wafer are formed on the left-side cassette body and the right-side cassette body. A left/right width adjusting axis(30) is inserted in two adjusting axis insertion grooves(16,26) that are formed on each cassette body. The left/right width adjusting axis connects the left-side cassette body with the right-side cassette body. A projection is formed on one side of the left/right width adjusting axis. A diameter of the projection is greater than that of the left/right width adjusting axis.
Abstract translation: 目的：晶圆盒可通过容纳所有晶片并执行制造过程并防止由于化学暴露而导致的工人危险，从而提高制造均匀性。 构成：晶片盒包括左侧盒体（10）和右侧盒体（20）。 用于滑动晶片的滑槽（12,22）形成在左侧盒体和右侧盒体上。 用于固定和支撑晶片的突起（14,24）形成在左侧盒体和右侧盒体上。 左/右宽度调节轴（30）插入形成在每个盒体上的两个调节轴插入槽（16,26）中。 左/右宽度调节轴将左侧盒体与右侧盒体连接。 在左/右宽度调节轴的一侧上形成突起。 突起的直径大于左/右宽度调节轴的直径。
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