Abstract:
The present invention relates to a method for reducing natural oxide on a substrate, which includes a step of exposing a substrate to trimethyl aluminum (TMA) or dicyclopentadienyl magnesium (MgCp2) for predetermined hours.
Abstract:
PURPOSE: A solar cell and a manufacturing method thereof are provided to minimize surface loss due to the recombination of an electron-hole pair by increasing the lifetime of a fixed charge of a TiO2 layer after a high temperature plastic process. CONSTITUTION: A texturing structure is formed on the surface of a first conductive substrate(S210). A second conductive junction layer is formed on the first conductive substrate(S220). A front TiO2 layer is formed on the second conductive junction layer(S230). An anti-reflection layer is formed on the front TiO2 layer(S240). A front electrode and a rear electrode are formed(S250). [Reference numerals] (S210) Forming a texturing structure on the surface of a first conductive substrate; (S220) Forming a second conductive junction layer on the first conductive substrate; (S230) Forming a front TiO2 layer; (S240) Forming an anti-reflection layer; (S250) Forming a front electrode and a rear electrode
Abstract:
태양전지는기판, 제1 도전형반도체층, 진성반도체층, 제2 도전형반도체층, 제1 전극및 제2 전극을포함한다. 기판에는복수의나노구조물이형성되고, 나노구조물들을커버하도록제1 도전형반도체층이형성되고, 제1 도전형반도체층상에진성반도체층이형성되며, 진성반도체층상에제2 도전형반도체층이형성된다. 제1 전극은제2 도전형반도체층상에형성된다.
Abstract:
PURPOSE: A solar cell is provided to improve the electrical and optical characteristics of a conductive layer and a nanostructure by forming a nanostructure and then processing the nanostructure by plasma. CONSTITUTION: A solar cell comprises a substrate, a first conductive semiconductor layer, an intrinsic semiconductor layer(60), a second conductive semiconductor layer, a first electrode(80), and a second electrode. A plurality of nanostructures(40) is formed in the substrate. The first conductive semiconductor layer covers up the nanostructures. The intrinsic semiconductor layer is formed on the first conductive semiconductor layer. The second conductive semiconductor layer is formed on the intrinsic semiconductor layer. The first electrode is formed on the second conductive semiconductor layer.